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Träfflista för sökning "WFRF:(Sun Jie 1977) ;pers:(Xu C.)"

Search: WFRF:(Sun Jie 1977) > Xu C.

  • Result 1-10 of 12
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1.
  • Dong, Y. B., et al. (author)
  • High Light Extraction Efficiency AlGaInP LEDs With Proton Implanted Current Blocking Layer
  • 2016
  • In: IEEE Electron Device Letters. - : Institute of Electrical and Electronics Engineers (IEEE). - 0741-3106 .- 1558-0563. ; 37:10, s. 1303-1306
  • Journal article (peer-reviewed)abstract
    • Improving light extraction efficiency is the key issue for light-emitting diodes (LEDs). Nowadays, a vertical structure design dominates LEDs. However, the light from the active region just below the p-electrode is severely blocked by the metal contact. In this letter, we use proton implantation with a depth all the way to the active region to turn the part beneath the p-pad insulating, which constitutes the most-effective-ever current blocking method. Earlier particle implantation studies never reached the device active region. Our experimental results show that the H+-implanted LEDs improve the light output power by 75% compared with non-implanted counterparts and the light intensity increases by 64.48%. By virtue of indium tin oxide current spreading film, the increase in working voltage is negligible. Analyzing the reverse leakage current, the side effect associated with the implantation is limited to an acceptable range. Numerical simulation is performed to support the experiment. Our results represent a new and simple method for solving the light blocking problem in vertical LEDs, without introducing the seemingly existing severe implantation damage to the device structure.
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2.
  • Dong, Y. B., et al. (author)
  • Transfer-free, lithography-free, and micrometer-precision patterning of CVD graphene on SiO 2 toward all-carbon electronics
  • 2018
  • In: APL Materials. - : AIP Publishing. - 2166-532X. ; 6:2
  • Journal article (peer-reviewed)abstract
    • A method of producing large area continuous graphene directly on SiO 2 by chemical vapor deposition is systematically developed. Cu thin film catalysts are sputtered onto the SiO 2 and pre-patterned. During graphene deposition, high temperature induces evaporation and balling of the Cu, and the graphene "lands onto" SiO 2 . Due to the high heating and growth rate, continuous graphene is largely completed before the Cu evaporation and balling. 60 nm is identified as the optimal thickness of the Cu for a successful graphene growth and μm-large feature size in the graphene. An all-carbon device is demonstrated based on this technique.
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3.
  • Guo, W., et al. (author)
  • Rapid chemical vapor deposition of graphene on liquid copper
  • 2016
  • In: Synthetic Metals. - : Elsevier BV. - 0379-6779. ; 216, s. 93-97
  • Journal article (peer-reviewed)abstract
    • Molten copper is used to catalyze the graphene synthesis by chemical vapor deposition. The Cu has no grains above melting temperature, which is favorable for graphene growth. Using a vertical cold wall system, the deposition rate is drastically increased as compared with common hot-wall tube furnaces, pushing the method one step forward towards applications. A molybdenum-graphite Joule heater is used to avoid mechanical deformation of the carrier foil for the catalyst to ease the subsequent processes. The rapid deposition makes it possible to observe graphene growth on liquid Cu even at low pressure, where severe Cu evaporation simultaneously occurs.
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4.
  • Liu, Lihui, 1985, et al. (author)
  • A Mechanism for Highly Efficient Electrochemical Bubbling Delamination of CVD-Grown Graphene from Metal Substrates
  • 2016
  • In: Advanced Materials Interfaces. - : Wiley. - 2196-7350. ; 3:8
  • Journal article (peer-reviewed)abstract
    • In most cases, transfer of chemical-vapor-deposited 2D materials from metallic foil catalysts onto a target substrate is the most necessary step for their promising fundamental studies and applications. Recently, a highly efficient and nondestructive electrochemical delamination method has been proposed as an alternative to the conventional etching transfer method, which alleviates the problem of cost and environment pollution because it eliminates the need to etch away the metals. Here, the mechanism of the electrochemical bubbling delamination process is elucidated by studying the effect of the various electrolytes on the delamination rate. A capacitor-based circuit model is proposed and confirmed by the electrochemical impedance spectroscopy results. A factor of 27 decrease in the time required for complete graphene delamination from the platinum cathodes is found when increasing the NaOH ratio in the electrolyte solution. The opposite trend is observed for delamination at the anode. The surface screening effect induced by nonreactive ions in the vicinity of the electrodes plays a key role in the delamination efficiency. The analysis is generic and can be used as a guideline to describe and design the electrochemical delamination of other 2D materials from their metal catalysts as well.
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5.
  • Liu, Q., et al. (author)
  • High responsivity sensing of unfocused laser and white light using graphene photodetectors grown by chemical vapor deposition
  • 2016
  • In: Optical Materials Express. - 2159-3930. ; 6:7, s. 2158-2164
  • Journal article (peer-reviewed)abstract
    • Graphene photodetectors grown by chemical vapor deposition are fabricated for unfocused laser and white light sensing. The unfocused light enlarges the illuminated graphene area and mimics the real-life sensing conditions, yielding a responsivity of 104 mA/W at room temperature without enhancing absorbance by waveguide and plasmonics. The devices are based on positive photoconductivity from the electron-hole photocarrier pairs and the bolometric-effect-induced negative photoconductivity. The buried off-center local gate induces a net internal potential in the graphene. The relative strength of the two photoconductivities depends on the gate voltage. The technology is scalable, which is a step ahead toward real applications.
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6.
  • Sun, Jie, 1977, et al. (author)
  • Electrochemical Bubbling Transfer of Graphene Using a Polymer Support with Encapsulated Air Gap as Permeation Stopping Layer
  • 2016
  • In: Journal of Nanomaterials. - : Hindawi Limited. - 1687-4129 .- 1687-4110. ; 2016
  • Journal article (peer-reviewed)abstract
    • Electrochemical bubbling transfer of graphene is a technique with high industrial potential due to its scalability, time- and cost-effectiveness, and ecofriendliness. However, the graphene is often damaged due to the turbulence and the trapped bubbles formed by the direct H2O and H+ permeation through the supporting polymer. We invent a graphene mechanical support of polyethylene terephthalate foil/plastic frame/poly(methyl methacrylate) sandwich, with an encapsulated air gap as the permeation stopping layer. The graphene damage is drastically reduced, as confirmed by the morphology and structural and electrical characterization, ultimately improving the controllability/reproducibility of the bubbling transfer of graphene and other two-dimensional materials.
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7.
  • Sun, Jie, 1977, et al. (author)
  • Mechanism of Electrochemical Delamination of Two-Dimensional Materials from Their Native Substrates by Bubbling
  • 2015
  • In: Sensors. - : MDPI AG. - 1424-8220. ; 15:12, s. 31811-31820
  • Journal article (peer-reviewed)abstract
    • A capacitor-based circuit model is proposed to explain the electrochemical delamination of two-dimensional materials from their native substrates where produced gas bubbles squeeze into the interface. The delamination is actually the electric breakdown of the capacitor formed between the solution and substrate. To facilitate the procedure, the backside of the ubstrate has to be shielded so that the capacitor breakdown voltage can be reached. The screening effect can be induced either by nonreactive ions around the electrode or, more effectively, by an undetachable insulator. This mechanism serves as a guideline for the surface science and applications involving the bubbling delamination.
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8.
  • Sun, Jie, 1977, et al. (author)
  • Synthesis Methods of Two-Dimensional MoS2: A Brief Review
  • 2017
  • In: Crystals. - : MDPI AG. - 2073-4352. ; 7:7, s. Article no 198 -
  • Research review (peer-reviewed)abstract
    • Molybdenum disulfide (MoS2) is one of the most important two-dimensional materials after graphene. Monolayer MoS2 has a direct bandgap (1.9 eV) and is potentially suitable for post-silicon electronics. Among all atomically thin semiconductors, MoS2's synthesis techniques are more developed. Here, we review the recent developments in the synthesis of hexagonal MoS2, where they are categorized into top-down and bottom-up approaches. Micromechanical exfoliation is convenient for beginners and basic research. Liquid phase exfoliation and solutions for chemical processes are cheap and suitable for large-scale production; yielding materials mostly in powders with different shapes, sizes and layer numbers. MoS2 films on a substrate targeting high-end nanoelectronic applications can be produced by chemical vapor deposition, compatible with the semiconductor industry. Usually, metal catalysts are unnecessary. Unlike graphene, the transfer of atomic layers is omitted. We especially emphasize the recent advances in metalorganic chemical vapor deposition and atomic layer deposition, where gaseous precursors are used. These processes grow MoS2 with the smallest building-blocks, naturally promising higher quality and controllability. Most likely, this will be an important direction in the field. Nevertheless, today none of those methods reproducibly produces MoS2 with competitive quality. There is a long way to go for MoS2 in real-life electronic device applications.
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9.
  • Xu, K., et al. (author)
  • GaN nanorod light emitting diodes with suspended graphene transparent electrodes grown by rapid chemical vapor deposition
  • 2013
  • In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 103:22, s. 5-
  • Journal article (peer-reviewed)abstract
    • Ordered and dense GaN light emitting nanorods are studied with polycrystalline graphene grown by rapid chemical vapor deposition as suspended transparent electrodes. As the substitute of indium tin oxide, the graphene avoids complex processing to fill up the gaps between nanorods and subsequent surface flattening and offers high conductivity to improve the carrier injection. The as-fabricated devices have 32% improvement in light output power compared to conventional planar GaN-graphene diodes. The suspended graphene remains electrically stable up to 300 degrees C in air. The graphene can be obtained at low cost and high efficiency, indicating its high potential in future applications.
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10.
  • Xu, K., et al. (author)
  • Graphene GaN-Based Schottky Ultraviolet Detectors
  • 2015
  • In: IEEE Transactions on Electron Devices. - : Institute of Electrical and Electronics Engineers (IEEE). - 1557-9646 .- 0018-9383. ; 62:9, s. 2802-2808
  • Journal article (peer-reviewed)abstract
    • Graphene GaN-based Schottky ultraviolet detectors are fabricated. The monolayer graphene is grown by chemical vapor deposition. The graphene is much more transparent than metals, as confirmed by the fact that our devices retain their high responsivity up to 360-nm wavelength (corresponding to the band edge absorption of GaN). Importantly, by virtue of the tunable work function of graphene, the graphene GaN Schottky barrier height can be greatly enlarged. The built-in field is enhanced, and the detector performance is improved. The current ratio with and without luminescence is up to 1.6 x 10(4). The characteristic time constants of the devices are in the order of a few milliseconds. The device open-circuit voltage and short-circuit current are also increased. At last, special type Schottky devices consisting of GaN nanorods or surface-etched GaN are prepared for complementary study. It is found although the dry etching induced surface defects lead to an increase in the dark current, and these carrier traps also greatly contribute to the photoconductivity under luminescence, resulting in extraordinarily large responsivity (up to 360 A/W at -6 V).
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