| 1. |
- Cao, Han, et al.
(författare)
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Fabrication of 10 nm enclosed nanofluidic channels
- 2002
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 81:1, s. 174-176
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Tidskriftsartikel (refereegranskat)abstract
- We made uniform arrays of nanometer scale structures using nanoimprint lithography over large areas (100 mm wafers). The nanofluidic channels were further narrowed and sealed by techniques that are based on nonuniform deposition. The resulting sealed channels have a cross section as small as 10 nm by 50 nm, of great importance for confining biological molecules into ultrasmall spaces. These techniques can be valuable fabrication tools for Nanoelectromechanical Systems and Micro/Nano Total Analysis Systems.
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| 2. |
- Cao, Han, et al.
(författare)
-
Gradient nanostructures for interfacing microfluidics and nanofluidics
- 2002
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 81:16, s. 3058-3060
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Tidskriftsartikel (refereegranskat)abstract
- It is difficult to introduce long genomic DNA molecules into nanometer scale fluidic channels directly from the macroscale world because of the steep entropic barrier caused by necessary stretching of the polymer. We present a very simple technique using optical lithography to fabricate continuous spatial gradient structures which smoothly narrow the cross section of a volume from the micron to the nanometer length scale, greatly reducing the local entropic barrier to nanochannel entry. This technique, diffraction gradient lithography, can be very valuable for the fabrication of micro/nano total analysis systems.
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| 3. |
- Tegenfeldt, Jonas O., et al.
(författare)
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Near-field scanner for moving molecules
- 2001
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Ingår i: Physical Review Letters. - 0031-9007. ; 86:7, s. 1378-1381
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Tidskriftsartikel (refereegranskat)abstract
- A new technology that provides high optical resolution as well as very high data rates for moving molecules is presented. An important aspect of the device is the dependence of both the near-field radiation pattern and the far-field transmission of a thin slit on the polarization of the incident light.
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| 4. |
- Wei, C. H., et al.
(författare)
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Polarization dependence of light intensity distribution from nanometer metallic slits
- 2003
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Ingår i: CLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics : Photonics Lights Innovation, from Nano-Structures and Devices to Systems and Networks, Proceedings - Photonics Lights Innovation, from Nano-Structures and Devices to Systems and Networks, Proceedings. - 0780377664 ; 2
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Konferensbidrag (refereegranskat)abstract
- In this work, the near-field and far-field electric magnetic (EM) wave distributions of metallic slits was observed using tapered fiber probe and modelled using finite difference time domain (FDTD) computer simulations. The EM wave field distribution from rectangular slits with widths 100 nm, 300 nm, and 500 nm was mapped with excitation wavelength λ = 532 nm. λ/2 can be considered a characteristic length for the problem. From the experiments and FDTD simulation, E⊥ wave is found to be governed by the surface plasmon wave (SPW) which results in ill near field pattern and cannot be confined in the slit. On the contrary, E∥ wave has a well-shaped field distribution and can be confined in the slit.
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