| 1. |
- Maximov, Ivan, et al.
(author)
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Investigation of polymethylmethacrylate resist residues using photoelectron microscopy
- 2002
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In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. - : American Vacuum Society. - 1071-1023 .- 1520-8567 .- 0734-211X. ; 20:3, s. 1139-1142
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Conference paper (peer-reviewed)abstract
- Quantitative photoelectron spectromicroscopy has been used to study polymethylmethacrylate (PMMA) resist residues on SiO2 surfaces after electron beam exposure and resist development, It was found that correctly exposed and developed PMMA leaves residues with an average thickness of about 1 nm. Higher exposure doses result in the decrease in film thickness, but with residues of about 0.5 mn. The technique can be applied as a powerful tool for surface and interface quality control in technology of electronic devices.
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| 2. |
- Forchheimer, Daniel, et al.
(author)
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Molecularly selective nanopatterns using nanoimprint lithography : A label-free sensor architecture
- 2011
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In: Journal of Vacuum Science and Technology B. - : AVS Science and Technology Society. - 2166-2746 .- 2166-2754. ; 29:1
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Journal article (peer-reviewed)abstract
- Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity.
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| 3. |
- Ling, TGI, et al.
(author)
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Fa-brication and characterization of a molecular adhesive layer for micro- and nanofabricated electrochemical electrodes
- 2003
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In: Microelectronic Engineering. - 1873-5568. ; 67-8, s. 887-892
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Journal article (peer-reviewed)abstract
- In the microelectronics industry, gold electrodes on silicon dioxide are produced using an adhesive layer of chromium or titanium. This method is applicable whenever a dry environment is present. However, when such an electrode is exposed to an electrolyte a galvanic cell is formed and the less noble metal will dissolve and eventually destroy the electrode. We describe here how a monolayer of mercaptopropyl-trimethoxysilane (MPTS) can be used as an adhesive. The layer can be structured lithographically making gold electrodes in the micro- and nano-range applicable for use in electrochemistry. The properties of the MPTS layer were investigated with photoelectron microscopy, atomic force microscopy and the electrochemical performance of the gold electrodes was determined by cyclic voltammetry. (C) 2003 Elsevier Science B.V. All rights reserved.
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| 4. |
- Suyatin, Dmitry, et al.
(author)
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Nano-Schottky contacts realized by bottom-up technique
- 2010
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In: INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings. - Piscataway, N.J. : IEEE Press. - 9781424435432 ; , s. 252-253
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Conference paper (peer-reviewed)abstract
- Properties of nanostructures realized by bottom-up techniques are often different from their bulk counterparts. Here we present a study of a nano-Schottky contact formed at the interface between a gold catalytic particle and an epitaxially grown GaxIn1-xAs/InAs nanowire. Selective electrical connections formed to the catalytic particle on one side and to the InAs segment on the other side allowed electrical and optical characterization of the formed junction. We demonstrate that the heterostructure region adjacent to the catalytic particle may act as an ultra-small volume unipolar photodetector with potentially ultra-fast response.
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| 5. |
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| 6. |
- Zakharov, Alexei, et al.
(author)
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Quantative photoelectron spectromicroscopy for investigation of PMMA resist residues
- 2002
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In: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Conference paper (peer-reviewed)abstract
- We show that photoelectron spectroscopy (PES) due to its surface sensitivity can be used as a straightforward method to quantify the PMMA resist residues which remain on SiO2 surfaces after electron beam exposure and resist development. The attenuation of the SiO2 valence band and Si2p photoelectrons has been measured by using a photoelectron microscope and it has been found that correctly exposed and developed PMMA resist leaves residues with an average thickness of about 0.7 nm. Higher exposure doses result in decrease of the film thickness, but still with residues of about 0.5 nm. The technique can be applied as a powerful tool for surface and interface quality control in technology of electronic devices
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| 7. |
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| 8. |
- Ehn, Andreas, et al.
(author)
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Electrochemical Investigation of Nickel Pattern Electrodes in H-2/H2O and CO/CO2 Atmospheres
- 2010
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In: Journal of the Electrochemical Society. - : The Electrochemical Society. - 0013-4651. ; 157:11, s. 1588-1596
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Journal article (peer-reviewed)abstract
- In this study, nickel pattern electrodes were electrochemically investigated in a three-electrode setup, operating both with H-2/H2O and CO/CO2 atmospheres. Heating introduced structural differences in the nickel layer among the pattern electrodes, which appear to affect the electrode performance. Both dense and porous nickel pattern electrodes were formed by heating. Holes appeared in the nickel layer of the porous pattern electrodes, where the open cavity triple phase boundaries exhibited different limiting processes than open triple phase boundary electrodes of the dense electrode. As the temperature was raised in the experiment, the electrodes stabilized, with a degraded behavior that seemed to be strongly coupled to the structural changes in the electrode. It was possible to compare literature results with high temperature impedance measurements in H-2/H2O presented here, while new results at lower temperatures in H-2/H2O are also presented. Impedance spectroscopy measurements were performed, and the gas dependence of the polarization resistance was observed as the mixture ratios and temperatures were varied in both atmospheres. A positive relation between the polarization resistance and the partial pressure of CO was determined for the dense nickel pattern electrode, which agrees with previous results using nickel point electrodes. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3484091] All rights reserved.
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| 9. |
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| 10. |
- Beck, Marc, et al.
(author)
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Fabrication and characterization of a molecular adhesive layer for micro- and nanofabricated electrochemical electrodes
- 2002
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In: 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science.
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Conference paper (peer-reviewed)abstract
- When making nanoelectrodes for applications in liquid cells it is plausible that the less noble metal layer may be negatively affected, i.e. it will be etched away leading to very unstable conditions during operation. Here we describe a dry method to produce such a molecular layer consisting of mercaptopropyltriethoxysilane (MPTS) making it possible to controllable and reproducibly form a covalently bound monolayer of MPTS to the SiO2 surface. From Photoelectron Spectroscopy measurements we could conclude that the layer thickness corresponds to a monolayer. We have electrochemically characterized such electrodes by cyclic voltammetry. Furthermore, we have successfully patterned such layers at both micro- and nanometer scale showing the possibilities to fabricate chemically selective and active areas that may be used in various applications
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