Spectroscopic ellipsometry characterization of electrochromic tungsten oxide and nickel oxide thin films made by sputter deposition

• Electrochromic films of tungsten oxide and nickel oxide were made by reactive dc magnetron sputtering and were characterized by X-ray diffraction, Rutherford backscattering spectrometry, scanning electron microscopy, and atomic force microscopy. The optical properties were investigated in detail by spectroscopic ellipsometry and spectrophotometry, using a multiple-sample approach. The W oxide film was modeled as a homogeneous isotropic layer, whereas the Ni oxide film was modeled as an anisotropic layer with the optical axis perpendicular to the surface. Parametric models of the two layers were then used to derive complex refractive index in the 300-1700-nm-range, film thickness, and surface roughness. A band gap of 3.15 eV was found for the W oxide film, using a Tauc-Lorentz parameterization. For the Ni oxide film, taken to have direct optical transitions, band gaps along the optical axis, perpendicular to it, and in an isotropic intermediate layer at the bottom of the film were found to be 3.95, 3.97, and 3.63 eV, respectively. Parameterization for the Ni oxide was made by use of the Lorentz model.

Ämnesord

NATURVETENSKAP  -- Fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)

Nyckelord

ellipsometry

electrochromic

tungsten oxide

nickel oxide

Surfaces and interfaces

Ytor och mellanytor

Optics

Optik

Teknisk fysik med inriktning mot fasta tillståndets fysik

Engineering Science with specialization in Solid State Physics

TECHNOLOGY

Steel Forming and Surface Engineering

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)