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Investigations of s...
Investigations of sol-gel ZnO films nanostructured by reactive ion beam etching for broadband anti-reflection
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- Visser, Dennis (författare)
- KTH,Tillämpad fysik
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- Ye, Z. (författare)
- KTH,Tillämpad fysik
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Prajapati, C. S. (författare)
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Bhat, N. (författare)
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Anand, S. (författare)
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(creator_code:org_t)
- 2017-09-14
- 2017
- Engelska.
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Ingår i: ECS Journal of Solid State Science and Technology. - : Electrochemical Society. - 2162-8769 .- 2162-8777. ; 6:9, s. P653-P659
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- A novel ZnO dry etching approach is introduced using reactive ion beam etching of thick sol-gel ZnO layers for controlled nanodisk/nanocone array fabrication. In this approach the same system can be used for the colloidal lithography mask (silica particles) size reduction by a fluorine-based chemistry and etching of the ZnO nanostructures by a CH4/H2/Ar chemistry. This resulted in a ZnO:SiO2 etch selectivity of ~3.4 and etch rate of ~56 nm/min. Thick sol-gel ZnO layers, nanodisk arrays and (truncated) nanocone arrays were fabricated and their optical properties analyzed by finite-difference time-domain simulations and spectrally-resolved total/specular reflectivity measurements. The demonstrated broadband omnidirectional anti-reflection, controlled nanostructure period/geometry and low absorption in the visible-NIR spectrum makes these sol-gel ZnO nanostructures very interesting for many optoelectronic applications, including photovoltaics.
Ämnesord
- NATURVETENSKAP -- Fysik -- Annan fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Other Physics Topics (hsv//eng)
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