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Characterisation of...
Abstract
Ämnesord
Stäng
- High temperature annealing in air has been applied as an effective ex-situ surface treatment for the alpha-Al2O3(0001) substrates used in molecular beam epitaxy (MBE) growth of III-nitrides. The method is based on the criterion that atomically smooth surface of terrace-and-step like structure, which is considered to be crucial in obtaining a high quality epilayer, could be produced upon high temperature annealing. The annealed surface was mostly studied by atomic force microscopy (AFM) imaging. In this work, the effects of high temperature annealing on the surface morphology, crystalline quality, optical quality and surface reconstruction behaviour of alpha-Al2O3(0001) substrates were fully studied using AFM, triple-axis high resolution X-ray diffraction (THRXRD), spectroscopic ellipsometry (SE) and insitu reflection high-energy electron diffraction (RHEED). A new strategy, H-2 thermal cleaning at 1100 degrees C followed by O-2 annealing at 1300 degrees C was proposed as an efficient surface treatment for alpha-Al2O3 (0001) substrates for MBE growth.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- AFM
- Atomically smooth surface
- Characterisation
- Crystalline quality
- Efficient surface
- Ex situ
- High quality
- High resolution X ray diffraction
- High-temperature annealing
- III-nitrides
- In-situ
- MBE growth
- New strategy
- Optical qualities
- Thermal cleaning
- Surfaces and interfaces
- Ytor och mellanytor
Publikations- och innehållstyp
- ref (ämneskategori)
- kon (ämneskategori)