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13 nm high-efficien...
13 nm high-efficiency nickel-germanium soft x-ray zone plates
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- Reinspach, Julia (författare)
- KTH,Biomedicinsk fysik och röntgenfysik
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- Lindblom, Magnus (författare)
- KTH,Biomedicinsk fysik och röntgenfysik
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- Bertilson, Michael (författare)
- KTH,Biomedicinsk fysik och röntgenfysik
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- von Hofsten, Olov (författare)
- KTH,Biomedicinsk fysik och röntgenfysik
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- Hertz, Hans M. (författare)
- KTH,Biomedicinsk fysik och röntgenfysik
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- Holmberg, Anders (författare)
- KTH,Biomedicinsk fysik och röntgenfysik
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(creator_code:org_t)
- American Vacuum Society, 2011
- 2011
- Engelska.
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Ingår i: Journal of Vacuum Science & Technology B. - : American Vacuum Society. - 1071-1023 .- 1520-8567. ; 29:1, s. 011012-
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Zone plates are used as objectives for high-resolution x-ray microscopy. Both high resolution and high diffraction efficiency are crucial parameters for the performance of the lens. In this article, the authors demonstrate the fabrication of high-resolution soft x-ray zone plates with improved diffraction efficiency by combining a nanofabrication process for high resolution with a process for high diffraction efficiency. High-resolution Ni zone plates are fabricated by applying cold development of electron-beam-patterned ZEP 7000 in a trilayer-resist process combined with Ni-electroplating. High-diffraction-efficiency Ni-Ge zone plates are realized by fabricating the Ni zone plate on a Ge film and then using the finished zone plate as etch mask for anisotropic CHF3 reactive ion etching into the underlying Ge, resulting in a Ni-Ge zone plate with improved aspect ratio and zone plate efficiency. Ni-Ge zone plates with 13 nm outermost zone width composed of 35 nm Ni on top of 45 nm Ge were fabricated. For comparable Ni and Ni-Ge zone plates with an outermost zone width of 15 nm, the diffraction efficiency was measured to be 2.4% and 4.3%, respectively, i.e., an enhancement of a factor of 2.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Annan teknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Other Engineering and Technologies (hsv//eng)
Nyckelord
- Crucial parameters
- Etch mask
- Ge films
- High efficiency
- High resolution
- Nanofabrication process
- Resist process
- Soft X-ray
- Trilayers
- X ray microscopy
- Zone plates
- Aspect ratio
- Diffraction efficiency
- Fabrication
- Germanium
- Optical instruments
- Reactive ion etching
- X ray diffraction
- X rays
- Engineering physics
- Teknisk fysik
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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