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Foundations of phys...
Foundations of physical vapor deposition with plasma assistance
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- Gudmundsson, Jon Tomas, 1965- (författare)
- KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.
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- Anders, Andre (författare)
- Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany.;Univ Leipzig, Felix Bloch Inst Solid State Phys, Linnestr 5, D-04103 Leipzig, Germany.
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- von Keudell, Achim (författare)
- Ruhr Univ Bochum, Inst Expt Phys 2, Bochum, Germany.
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(creator_code:org_t)
- 2022-09-19
- 2022
- Engelska.
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Ingår i: Plasma sources science & technology. - : IOP Publishing. - 0963-0252 .- 1361-6595. ; 31:8, s. 083001-
- Relaterad länk:
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https://urn.kb.se/re...
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visa fler...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by physical means, followed by deposition of those atoms on a nearby surface to form a thin film or coating. Various approaches and techniques are applied to release the atoms including thermal evaporation, electron beam evaporation, ion-driven sputtering, laser ablation, and cathodic arc-based emission. Some of the approaches are based on a plasma discharge, while in other cases the atoms composing the vapor are ionized either due to the release of the film-forming species or they are ionized intentionally afterward. Here, a brief overview of the various PVD techniques is given, while the emphasis is on sputtering, which is dominated by magnetron sputtering, the most widely used technique for deposition of both metallic and compound thin films. The advantages and drawbacks of the various techniques are discussed and compared.
Ämnesord
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- physical vapor deposition
- magnetron sputtering
- cathodic arc deposition
- ion beam deposition
- sputtering
- pulsed laser deposition
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