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Electrochemical etc...
Electrochemical etching of n-type silicon based on carrier injection from a back side p-n junction
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- Badel, Xavier (författare)
- KTH,Mikroelektronik och informationsteknik, IMIT
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- Linnros, Jan (författare)
- KTH,Mikroelektronik och informationsteknik, IMIT
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(creator_code:org_t)
- The Electrochemical Society, 2003
- 2003
- Engelska.
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Ingår i: Electrochemical and solid-state letters. - : The Electrochemical Society. - 1099-0062 .- 1944-8775. ; 6:6, s. C79-C81
- Relaterad länk:
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http://scitation.aip...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- A technique for electrochemical etching of n-type silicon in aqueous hydrofluoric acid is presented. This technique differs from photoelectrochemical etching because the holes (positive carriers) needed for the dissolution reaction to occur, are not photogenerated. The principle developed here is to inject these positive carriers using a p-n junction under forward bias formed at the back side of the sample. Drift-diffusion of holes through the wafer thickness allows a chemical dissolution reaction at the interface with the electrolyte. To enable holes diffusing through the wafer the minority carrier lifetime must be sufficiently high making the technique well adapted for high resistivity silicon. However, extension to low resistivity wafers has been achieved. Results show the possibility of forming pore arrays and diverse 3D structures.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- Carrier concentration
- Diffusion in solids
- Dissolution
- Electric conductivity of solids
- Electrochemistry
- Etching
- Hydrofluoric acid
- Interfaces (materials)
- Positive ions
- Substrates
- Aqueous hydrofluoric acid
- Carrier injection
- Electrochemical etching
- Photoelectrochemical etching
- Radiation imaging detector
- Silicon pore arrays
- Silicon wafers
- Electrophysics
- Elektrofysik
Publikations- och innehållstyp
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- art (ämneskategori)
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