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Elimination of mult...
Elimination of multimode effects in a silicon-on-insulator etched diffraction grating demultiplexer with bi-level taper structure
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- Dai, Daoxin (författare)
- KTH,Alfvénlaboratoriet
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- He, Jian (författare)
- KTH,Alfvénlaboratoriet
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He, Sailing (författare)
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(creator_code:org_t)
- 2005
- 2005
- Engelska.
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Ingår i: IEEE Journal of Selected Topics in Quantum Electronics. - 1077-260X .- 1558-4542. ; 11:2, s. 439-443
- Relaterad länk:
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https://urn.kb.se/re...
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visa fler...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Multimode effects in the free propagation region (FPR) of an etched diffraction grating (EDG) demultiplexer based on silicon-on-insulator are analyzed. The insertion loss and the crosstalk increase due to these undesired multimode effects. A bi-level taper structure between the FPR and the input/output waveguides is proposed. It is shown that such a taper structure can reduce the multimode effects to an almost negligible level. At the same time, the 3-dB passband width is enlarged by increasing the rib width. No additional fabrication process is needed for an EDG with such a design.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- air slot
- crosstalk
- etched diffraction grating (EDG)
- insertion loss
- multimode effect
- silicon-on-insulator (SOI)
- taper
- Electronics
- Elektronik
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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