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Simulation and elec...
Simulation and electrical characterization of GaN/SiC and AlGaN/SiC heterodiodes
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Danielsson, Erik (författare)
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- Zetterling, Carl-Mikael (författare)
- KTH,Integrerade komponenter och kretsar
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- Östling, Mikael (författare)
- KTH,Integrerade komponenter och kretsar
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Breitholtz, B. (författare)
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Linthicum, K. (författare)
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Thomson, D. B. (författare)
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Nam, O. -H (författare)
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Davis, R. F. (författare)
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(creator_code:org_t)
- 1999
- 1999
- Engelska.
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Ingår i: Materials Science & Engineering. - 0921-5107 .- 1873-4944. ; 61-62, s. 320-324
- Relaterad länk:
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http://www.scopus.co...
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https://urn.kb.se/re...
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Abstract
Ämnesord
Stäng
- Heterojunctions on SiC is an area in rapid development, especially GaN/SiC and AlGaN/SiC heterojunctions. The heterojunction can improve the performance considerably for BJTs and FETs. In this work heterojunction diodes have been manufactured and characterized. The structure was a GaN or AlGaN n-type region on top of a 6H-SiC p-type substrate. Two different approaches of growing the n-type region were tested. The GaN was grown with the MBE technique using a polycrystalline GaN buffer, whereas the AlGaN was grown with CVD and an AlN buffer. The AlGaN had an aluminum mole fraction of around 0.1. Mesa structures were formed using Cl2 RIE of GaN/AlGaN, which showed good selectivity on 6H-SiC (about 1:6). A Ti metallization with subsequent RTA was used as contact to GaN and AlGaN, and the contact to 6H-SiC was liquid InGa. Both I-V and C-V measurements were performed on the heterojunction diode. The ideality factor of the diodes, doping concentration of the SiC, and the band alignment of the heterojunction were extracted. © 1999 Elsevier Science S.A.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- Chemical vapor deposition
- Current voltage characteristics
- Metallizing
- Molecular beam epitaxy
- Polycrystalline materials
- Rapid thermal annealing
- Reactive ion etching
- Semiconducting aluminum compounds
- Semiconducting gallium compounds
- Semiconductor device structures
- Semiconductor diodes
- Silicon carbide
- Aluminum gallium nitride
- Gallium nitride
- Heterojunctions
Publikations- och innehållstyp
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- art (ämneskategori)
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