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Substantial differe...
Substantial difference in target surface chemistry between reactive dc and high power impulse magnetron sputtering
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- Greczynski, Grzegorz (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Rhein Westfal TH Aachen, Germany
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- Mraz, S. (författare)
- Rhein Westfal TH Aachen, Germany
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- Schneider, J. M. (författare)
- Rhein Westfal TH Aachen, Germany
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visa fler...
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- Hultman, Lars (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten
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visa färre...
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(creator_code:org_t)
- 2018-01-12
- 2018
- Engelska.
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Ingår i: Journal of Physics D. - : IOP PUBLISHING LTD. - 0022-3727 .- 1361-6463. ; 51:5
- Relaterad länk:
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https://liu.diva-por... (primary) (Raw object)
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https://iopscience.i...
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- The nitride layer formed in the target race track during the deposition of stoichiometric TiN thin films is a factor 2.5 thicker for high power impulse magnetron sputtering (HIPIMS), compared to conventional dc processing (DCMS). The phenomenon is explained using x-ray photoelectron spectroscopy analysis of the as-operated Ti target surface chemistry supported by sputter depth profiles, dynamic Monte Carlo simulations employing the TRIDYN code, and plasma chemical investigations by ion mass spectrometry. The target chemistry and the thickness of the nitride layer are found to be determined by the implantation of nitrogen ions, predominantly N+ and N-2(+) for HIPIMS and DCMS, respectively. Knowledge of this method-inherent difference enables robust processing of high quality functional coatings.
Ämnesord
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Nyckelord
- HIPIMS; HPPMS; TiN; XPS; magnetron sputtering; target poisoning; target chemistry
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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