Fullerene-like B C N thin films a computational andexperimental study

Hellgren, NiklasIntel Corporation, Portland Technology Development, RA3-301, 5200 NE Elam Young Parkway, Hillsboro, OR 97124, USA (författare)

Ab initio calculations show that the energy cost for incorporating lattice defects such as pentagons and heptagons is significantly reduced for BCN compared to BN, thus promoting bending of basal planes in these compounds. Boron–carbon–nitride (Bsingle bondCsingle bondN) thin films with a fullerene-like (FL) microstructure were then deposited by dual cathode magnetron sputtering from C and B4C targets. Up to 1 μm thick films were grown at a total gas pressure of 3 mTorr (0.4 Pa) in varying Ar/N2 ratios, and substrate temperatures between 225 and 350 °C. Compositional and microstructural studies were performed using RBS, SEM and HREM, respectively. Depending on the deposition condition, ternary BxCyNz films with fullerene-like microstructure could be prepared in agreement with the calculations within the composition range 0 ≤ x ≤ 53, 15 ≤ y ≤ 62, and 24 ≤ z ≤ 50 at.%. Fullerene-like structures also tend to form at lower temperatures in the case of BCN compared to CN. Nanoindentation measurements show that all BxCyNz films exhibited a highly elastic response independent of elemental composition. In addition, the calculations suggest a driving force for C and BN phase separation.

Ab initio calculations; Fullerene-like materials; BCN compounds; Thin films Reactive magnetron sputtering
NATURAL SCIENCES
NATURVETENSKAP

Berlind, Torun,1965-Linköpings universitet,Tillämpad optik,Tekniska högskolan(Swepub:liu)torbe21 (författare)
Gueorguiev, Gueorgui K.Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)guegu96 (författare)
Johansson, Mats P.Linköpings universitet,Institutionen för fysik, kemi och biologi,Tekniska högskolan(Swepub:liu)matjo02 (författare)
Stafström, SvenLinköpings universitet,Institutionen för fysik, kemi och biologi,Tekniska högskolan(Swepub:liu)svest87 (författare)
Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)larhu75 (författare)
Intel Corporation, Portland Technology Development, RA3-301, 5200 NE Elam Young Parkway, Hillsboro, OR 97124, USATillämpad optik (creator_code:org_t)

Av författaren/redakt...: Hellgren, Niklas; Berlind, Torun, ...; Gueorguiev, Gueo ...; Johansson, Mats ...; Stafström, Sven; Hultman, Lars

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.