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Thermal Stability a...
Thermal Stability and Phase Transformations of γ-/Amorphous-Al2O3 Thin Films
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- Eklund, Per, 1977- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Sridharan, M. (författare)
- Interdisciplinary Nanoscience Center (iNANO) and Department of Physics and Astronomy, University of Aarhus, DK-800 Aarhus C, Denmark
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- Singh, G. (författare)
- Interdisciplinary Nanoscience Center (iNANO) and Department of Physics and Astronomy, University of Aarhus, DK-800 Aarhus C, Denmark
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- Bottiger, Jorgen (författare)
- Interdisciplinary Nanoscience Center (iNANO) and Department of Physics and Astronomy, University of Aarhus, DK-800 Aarhus C, Denmark
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(creator_code:org_t)
- 2009-03-17
- 2009
- Engelska.
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Ingår i: Plasma processes and polymers. - : Wiley. - 1612-8850. ; 6:1, s. 907-911
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Magnetron-sputtered Al2O3 thin films were annealed in ambient air. The phase compositions of the as-deposited Al2O3 films were (i) fully amorphous, (ii) nanocrystalline γ-Al2O3 in an amorphous Al2O3 matrix, and (iii) fully crystalline γ. For all samples, annealing to 1 100-1 150 °C resulted in a transformation to α-alumina. The transformation paths depend on the phase fraction of γ in the as-deposited films. For amorphous films and films with low initial γ fraction, the intermediate phase θ-Al2O3 appeared in the range of 1 000-1 100 °C. For predominantly crystalline γ-Al2O3 as-deposited films no intermediate Al2O3 phases were observed, indicating a direct γ-to-α phase transformation at ≈1 100 °C.
Nyckelord
- annealing
- atomic force microscopy (AFM)
- faceting
- sputtering
- X-ray diffraction (XRD)
- NATURAL SCIENCES
- NATURVETENSKAP
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