Sökning: onr:"swepub:oai:DiVA.org:liu-71503" >
The role of backsca...
The role of backscattered energetic atoms in film growth in reactive magnetron sputtering of chromium nitride
-
- Sarakinos, Kostas (författare)
- Institute of Physics (IA), Aachen University of Technology, Germany
-
- Alami, J. (författare)
- Aachen University of Technology, Germany
-
- Karimi, P. M. (författare)
- Aachen University of Technology, Germany
-
visa fler...
-
- Severin, D. (författare)
- Aachen University of Technology, Germany
-
- Wuttig, M. (författare)
- Aachen University of Technology, Germany
-
visa färre...
-
(creator_code:org_t)
- 2007-01-19
- 2007
- Engelska.
-
Ingår i: Journal of Physics D. - : Institute of Physics. - 0022-3727 .- 1361-6463. ; 40:3, s. 778-785
- Relaterad länk:
-
https://urn.kb.se/re...
-
visa fler...
-
https://doi.org/10.1...
-
visa färre...
Abstract
Ämnesord
Stäng
- In this work the impact of backscattered energetic atoms on film growth in reactive sputtering of CrNx (x less than= 1) is manifested. We use film and plasma characterization techniques, as well as simulations in order to study the dynamics of the target-discharge-film interactions. The results show that the primary bombarding species of the growing film are N-2(+) plasma ions, which are neutralized and backscattered by the target in the form of atomic N. It is shown that the backscattered N atoms have energies which are significantly higher than those of other bombarding species, i.e. the backscattered Ar atoms, the sputtered atoms and the plasma ions. Moreover, it is found that CrN films exhibit compressive stresses of 2.6 GPa and a density close to the bulk value. We attribute these properties to the bombardment by backscattered energetic atoms, in particular N. Pure Cr films are also studied for reference.
Nyckelord
- TECHNOLOGY
- TEKNIKVETENSKAP
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
Hitta via bibliotek
Till lärosätets databas