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Atomic Layer Deposi...
Atomic Layer Deposition of Ruthenium Films on Strontium Titanate
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- Kukli, Kaupo (författare)
- University of Helsinki
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- Kemell, Marianna (författare)
- University of Helsinki
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- Lu, Jun (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Hultman, Lars (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Riedel, Stefan (författare)
- Fraunhofer Centre for Nanoelect Technology
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- Sundqvist, Jonas (författare)
- Fraunhofer Centre Nanoelect Technology
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- Ritala, Mikko (författare)
- University of Helsinki
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- Leskela, Markku (författare)
- University of Helsinki
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(creator_code:org_t)
- American Scientific Publishers, 2011
- 2011
- Engelska.
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Ingår i: Journal of Nanoscience and Nanotechnology. - : American Scientific Publishers. - 1533-4880 .- 1533-4899. ; 11:9, s. 8378-8382
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Atomic layer deposition of ruthenium on SrTiO(3) layers was investigated using (C(2)H(5)C(5)H(4)) center dot (NC(4)H(4))Ru and air as precursors. For comparison, the growth was studied also on ZrO(2) films and SiO(2)/Si surfaces. Deposition temperature was 325 degrees C. Using rather short but intense air pulses, smooth and uniform Ru films were deposited on SrTiO(3). The films were crystallized at early stages of the growth. The nucleation density and rate on SrTiO(3) were notably lower compared to that on ZrO(2) and SiO(2), but the physical qualities including the film conductivity were considerably enhanced after reaching Ru film thickness around 10 nm.
Nyckelord
- Atomic Layer Deposition
- Ruthenium
- Nucleation
- Imaging
- TECHNOLOGY
- TEKNIKVETENSKAP
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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