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Comparative charact...
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Khartsev, SergiyKTH,Mikroelektronik och informationsteknik, IMIT,Department of Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, Sweden
(författare)
Comparative characteristics of Na0.5K0.5NbO 3 films on Pt by pulsed laser deposition and magnetron sputtering
- Artikel/kapitelEngelska2003
Förlag, utgivningsår, omfång ...
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2010-06-18
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Informa UK Limited,2003
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printrdacarrier
Nummerbeteckningar
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LIBRIS-ID:oai:DiVA.org:ltu-6188
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https://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-6188URI
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https://doi.org/10.1080/714040729DOI
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https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-23055URI
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Språk:engelska
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Sammanfattning på:engelska
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Ämneskategori:ref swepub-contenttype
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Ämneskategori:art swepub-publicationtype
Anmärkningar
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Validerad; 2003; 20100108 (andbra)
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QC 20100525
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Ferroelectric Na0.5K0.5NbO3 (NKN) thin films were grown on the Pt80Ir20 polycrystalline substrates by pulsed laser deposition (PLD) and radio frequency-magnetron sputtering (RF) technique using the same stoichiometric Na0.5K 0.5NbO3 ceramic target. X-ray diffraction proved both PLD- and RF-made Na0.5K0.5NbOj/Pt80Ir20 films are single phase and have preferential c-axis orientation. Temperature dependence of dielectric permittivity reveals the presence of two phase transitions around 210 and 410°C. Capacitance vs. applied voltage C-V @ 100 kHz, I-V, and P-E hysteresis characteristics recorded for the vertical capacitive structures yielded loss tan δ = 0.026 and 0.016, tunability about 44.5 and 30% @ 100 kV/cm, Ohmic resistivity 6.7 × 1012 Ω·cm and 0.2 × 1012 Ω·cm, remnant polarization 11.7 and 9.7 μC/cm2, coercive field 28.0 and 94.6 kV/cm for PLD- and RF-films, respectively. Piezoelectric test carried out in hydrostatic conditions showed piezoelectric coefficient dH = 21 for PLD-NKN and 15 pC/N for RF-NKN film.
Ämnesord och genrebeteckningar
Biuppslag (personer, institutioner, konferenser, titlar ...)
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Grishin, AlexDepartment of Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, Sweden
(författare)
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Andrèasson, JohannaLuleå tekniska universitet
(författare)
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Koh, J-HElectric and Magnetic Devices Research Group, Electrotechnology Research Institute, Changwon, South Korea
(författare)
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Song, J-SElectric and Magnetic Devices Research Group, Electrotechnology Research Institute, Changwon, South Korea
(författare)
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Grishin, Alexander M.KTH,Mikroelektronik och informationsteknik, IMIT(Swepub:kth)u179x9xt
(författare)
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KTHMikroelektronik och informationsteknik, IMIT
(creator_code:org_t)
Sammanhörande titlar
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Ingår i:Integrated Ferroelectrics: Informa UK Limited55, s. 769-7791058-45871607-8489
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