Comparative characteristics of Na0.5K0.5NbO 3 films on Pt by pulsed laser deposition and magnetron sputtering

Khartsev, SergiyKTH,Mikroelektronik och informationsteknik, IMIT,Department of Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, Sweden (författare)

Validerad; 2003; 20100108 (andbra)
QC 20100525
Ferroelectric Na0.5K0.5NbO3 (NKN) thin films were grown on the Pt80Ir20 polycrystalline substrates by pulsed laser deposition (PLD) and radio frequency-magnetron sputtering (RF) technique using the same stoichiometric Na0.5K 0.5NbO3 ceramic target. X-ray diffraction proved both PLD- and RF-made Na0.5K0.5NbOj/Pt80Ir20 films are single phase and have preferential c-axis orientation. Temperature dependence of dielectric permittivity reveals the presence of two phase transitions around 210 and 410°C. Capacitance vs. applied voltage C-V @ 100 kHz, I-V, and P-E hysteresis characteristics recorded for the vertical capacitive structures yielded loss tan δ = 0.026 and 0.016, tunability about 44.5 and 30% @ 100 kV/cm, Ohmic resistivity 6.7 × 1012 Ω·cm and 0.2 × 1012 Ω·cm, remnant polarization 11.7 and 9.7 μC/cm2, coercive field 28.0 and 94.6 kV/cm for PLD- and RF-films, respectively. Piezoelectric test carried out in hydrostatic conditions showed piezoelectric coefficient dH = 21 for PLD-NKN and 15 pC/N for RF-NKN film.

TEKNIK OCH TEKNOLOGIER Materialteknik Annan materialteknik hsv//swe
ENGINEERING AND TECHNOLOGY Materials Engineering Other Materials Engineering hsv//eng
K-factor
Leakage current
Na0.5K0.5NbO3 (NKN) films
Piezoelectric coefficient dH
Pulsed laser deposition (PLD)
RF-magnetron sputtering
Tunability
Engineering Materials
Materialteknik

Grishin, AlexDepartment of Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, Sweden (författare)
Andrèasson, JohannaLuleå tekniska universitet (författare)
Koh, J-HElectric and Magnetic Devices Research Group, Electrotechnology Research Institute, Changwon, South Korea (författare)
Song, J-SElectric and Magnetic Devices Research Group, Electrotechnology Research Institute, Changwon, South Korea (författare)
Grishin, Alexander M.KTH,Mikroelektronik och informationsteknik, IMIT(Swepub:kth)u179x9xt (författare)
KTHMikroelektronik och informationsteknik, IMIT (creator_code:org_t)

Ingår i:Integrated Ferroelectrics: Informa UK Limited55, s. 769-7791058-45871607-8489

Av författaren/redakt...: Khartsev, Sergiy; Grishin, Alex; Andrèasson, Joha ...; Koh, J-H; Song, J-S; Grishin, Alexand ...

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TEKNIK OCH TEKNOLOGIER: TEKNIK OCH TEKNO ...; och Materialteknik; och Annan materialte ...

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