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Characterisation of...
Characterisation of a liquid-xenon jet laser-plasma extreme-ultraviolet source
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- Hansson, B. A. M. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Hemberg, O. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Hertz, Hans M. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Berglund, Magnus (författare)
- Roy. Inst. of Technology/Albanova, Sweden
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- Choi, H. J. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Jacobsson, Björn (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Janin, E. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Mosesson, Sofia (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Rymell, L. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Thoresen, J. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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- Wilner, M. (författare)
- KTH,Fysik,Roy. Inst. of Technology/Albanova, Sweden
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(creator_code:org_t)
- AIP Publishing, 2004
- 2004
- Engelska.
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Ingår i: Review of Scientific Instruments. - : AIP Publishing. - 0034-6748 .- 1089-7623. ; 75:6, s. 2122-2129
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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https://urn.kb.se/re...
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Abstract
Ämnesord
Stäng
- A liquid-xenon-jet laser-plasma source for extreme-ultraviolet (EUV) and soft-x-ray generation has been characterized. Being a source candidate for EUV lithography (EUVL), we especially focus on parameters important for the integration of the source in EUVL systems. The deep-ultraviolet (DUV) out-of-band radiation (=120–400 nm) was quantified, to within a factor of two, using a flying-circus tool together with a transmission-grating spectrograph resulting in a total DUV conversion efficiency (CE) of ~0.33%/2sr. The size and the shape of the xenon plasma was investigated using an in-band-only EUV microscope, based on a spherical Mo/Si multilayer mirror and a charge-coupled device detector. Scalability of the source size from 20–270 µm full width at half maximum was shown. The maximum repetition-rate sustainable by the liquid-xenon-jet target was simulated by a double-pulse experiment indicating feasibility of >17 kHz operation. The xenon-ion energy distribution from the plasma was determined in a time-of-flight experiment with a Faraday-cup detector showing the presence of multi-kilo-electron-volt ions. Sputtering of silicon witness plates exposed to the plasma was observed, while a xenon background of >1 mbar was shown to eliminate the sputtering. It is concluded that the source has potential to meet the requirements of future EUVL systems.
Ämnesord
- NATURVETENSKAP -- Fysik -- Fusion, plasma och rymdfysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Fusion, Plasma and Space Physics (hsv//eng)
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Nyckelord
- molybdenum
- silicon
- multilayers
- plasma jets
- ultraviolet lithography
- ultraviolet radiation effects
- time of flight spectra
- plasma production by laser
- ultraviolet sources
- Plasma physics
- Plasmafysik
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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Till lärosätets databas
- Av författaren/redakt...
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Hansson, B. A. M ...
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Hemberg, O.
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Hertz, Hans M.
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Berglund, Magnus
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Choi, H. J.
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Jacobsson, Björn
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visa fler...
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Janin, E.
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Mosesson, Sofia
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Rymell, L.
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Thoresen, J.
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Wilner, M.
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visa färre...
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Review of Scient ...
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Mälardalens universitet
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