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Sökning: onr:"swepub:oai:DiVA.org:uu-135658" > Structure and Magne...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003244naa a2200433 4500
001oai:DiVA.org:uu-135658
003SwePub
008101207s2010 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-1356582 URI
024a https://doi.org/10.1166/jnn.2010.25942 DOI
040 a (SwePub)uu
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Kapaklis, Vassilios,d 1978-u Uppsala universitet,Materialfysik4 aut0 (Swepub:uu)vaska415
2451 0a Structure and Magnetic Properties of hcp and fcc Nanocrystalline Thin Ni Films and Nanoparticles Produced by Radio Frequency Magnetron Sputtering
264 1b American Scientific Publishers,c 2010
338 a print2 rdacarrier
520 a We report on the growth of thin Ni films by radio frequency magnetron sputtering in Ar-plasma. The growth temperature was about 350 K and the films were deposited on various substrates such as glass, silicon, sapphire and alumina. The thickness of the thinnest films was estimated by the appearance of Kiessig fringes up to about 2 theta = 8 degrees in the small-angle X-ray diffraction pattern, as expected for high-quality atomically-flat thin films. With the help of this, a quartz balance system was calibrated and used for measuring the thickness of thicker samples with an accuracy of better than 5%. Structural characterization via X-ray diffraction and high resolution transmission electron microscopy revealed an Ar-gas pressure window, where single phase hcp Ni films may be grown. The magnetic response of the Ni films was checked at room temperature via a newly established and fully automatic polar magneto-optic Kerr effect magnetometer. The hcp films show no magnetic response. Interestingly, the magnetic saturation field of fcc films deposited at low Ar pressure is comparable to the one of bulk Ni, while the one of fcc films deposited at high Ar pressures is decreased, revealing the presence of residual strain in the films. Finally, it is shown that it is possible to form films which contain magnetic Ni fcc nanoparticles in a non-magnetic hcp matrix, i.e., a system interesting for technological applications demanding a single Ni target for its production.
650 7a NATURVETENSKAPx Fysik0 (SwePub)1032 hsv//swe
650 7a NATURAL SCIENCESx Physical Sciences0 (SwePub)1032 hsv//eng
653 a Nanoscale Thin Film Structure and Morphology
653 a Magnetic Properties of Mono layers and Thin Films
653 a X-ray Diffraction
653 a Nickel
653 a Physics
653 a Fysik
653 a TECHNOLOGY
653 a TEKNIKVETENSKAP
700a Pappas, Spiridon D.4 aut
700a Poulopoulos, Panagiotis4 aut
700a Trachylis, Dimitrios4 aut
700a Schweiss, Peter4 aut
700a Politis, Constantin4 aut
710a Uppsala universitetb Materialfysik4 org
773t Journal of Nanoscience and Nanotechnologyd : American Scientific Publishersg 10:9, s. 6024-6028q 10:9<6024-6028x 1533-4880x 1533-4899
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-135658
8564 8u https://doi.org/10.1166/jnn.2010.2594

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