Sökning: onr:"swepub:oai:DiVA.org:uu-320931" > Unprecedented therm...
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000 | 03003naa a2200433 4500 | |
001 | oai:DiVA.org:uu-320931 | |
003 | SwePub | |
008 | 170427s2017 | |||||||||||000 ||eng| | |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-3209312 URI |
024 | 7 | a https://doi.org/10.1080/21663831.2016.12339142 DOI |
040 | a (SwePub)uu | |
041 | a engb eng | |
042 | 9 SwePub | |
072 | 7 | a ref2 swepub-contenttype |
072 | 7 | a art2 swepub-publicationtype |
100 | 1 | a Baben, Moritz tou Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.;GTT Technol, Herzogenrath, Germany.4 aut |
245 | 1 0 | a Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering |
264 | c 2016-09-23 | |
264 | 1 | b TAYLOR & FRANCIS INC,c 2017 |
338 | a electronic2 rdacarrier | |
520 | a Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas-solid paraequilibrium defining chemical composition and thus point defect concentration. Weshow that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti, Al) Nx, the industrial benchmark coating for wear protection, can be increased from 800 degrees C to unprecedented 1200 degrees C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films. | |
650 | 7 | a TEKNIK OCH TEKNOLOGIERx Materialteknik0 (SwePub)2052 hsv//swe |
650 | 7 | a ENGINEERING AND TECHNOLOGYx Materials Engineering0 (SwePub)2052 hsv//eng |
653 | a TiAlN | |
653 | a thin films | |
653 | a hard coatings | |
653 | a vacancies | |
653 | a thermodynamics | |
700 | 1 | a Hans, Marcusu Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.4 aut |
700 | 1 | a Primetzhofer, Danielu Uppsala universitet,Tillämpad kärnfysik4 aut0 (Swepub:uu)danpr521 |
700 | 1 | a Evertz, Simonu Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.4 aut |
700 | 1 | a Ruess, Holgeru Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.4 aut |
700 | 1 | a Schneider, Jochen M.u Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.4 aut |
710 | 2 | a Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.;GTT Technol, Herzogenrath, Germany.b Rhein Westfal TH Aachen, Mat Chem, D-52074 Aachen, Germany.4 org |
773 | 0 | t Materials Research Lettersd : TAYLOR & FRANCIS INCg 5:3, s. 158-169q 5:3<158-169x 2166-3831 |
856 | 4 | u https://uu.diva-portal.org/smash/get/diva2:1091596/FULLTEXT01.pdfx primaryx Raw objecty fulltext:print |
856 | 4 | u https://www.tandfonline.com/doi/pdf/10.1080/21663831.2016.1233914?needAccess=true |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-320931 |
856 | 4 8 | u https://doi.org/10.1080/21663831.2016.1233914 |
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