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Top-bottom gate cou...
Top-bottom gate coupling effect on low frequency noise in a Schottky junction gated silicon nanowire field-effect transistor
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- Chen, Xi (författare)
- Uppsala universitet,Fasta tillståndets elektronik
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- Chen, Si, 1982- (författare)
- Uppsala universitet,Fasta tillståndets elektronik
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- Solomon, Paul (författare)
- IBM Corp, Div Res, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
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- Zhang, Zhen, 1979- (författare)
- Uppsala universitet,Fasta tillståndets elektronik
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(creator_code:org_t)
- 2019
- 2019
- Engelska.
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Ingår i: IEEE Journal of the Electron Devices Society. - 2168-6734. ; 7, s. 696-700
- Relaterad länk:
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https://doi.org/10.1...
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https://ieeexplore.i...
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https://uu.diva-port... (primary) (Raw object)
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Abstract
Ämnesord
Stäng
- In this letter, strong low frequency noise (LFN) reduction is observed when the buried oxide (BOX)/silicon interface of a Schottky junction gated silicon nanowire field-effect transistor (SJGFET) is depleted by a substrate bias. Such LFN reduction is mainly attributed to the dramatic reduction in Coulomb scattering when carriers are pushed away from the interface. The BOX/silicon interface depletion can also be achieved by sidewall Schottky junction gates in a narrow channel SJGFET, leading to an optimal LFN performance without the need of any substrate bias.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- Teknisk fysik med inriktning mot elektronik
- Engineering Science with specialization in Electronics
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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