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Influence of Metal ...
Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr) Films
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- Shu, Rui, 1990- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping 581 83, Sweden
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- Lundin, Daniel, 1980- (författare)
- Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Univ Paris Saclay, France,Plasma and Coatings Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, Linköping 581 83, Sweden;Laboratoire de Physique des Gaz et Plasmas—LPGP, UMR 8578 CNRS, Université Paris Saclay, Orsay Cedex 91405, France
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- Xin, Binbin, 1989- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping 581 83, Sweden
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- Sortica, Mauricio A. (författare)
- Uppsala universitet,Tandemlaboratoriet,Uppsala Univ, Sweden,The Tandem Laboratory, Uppsala University, Uppsala 75120, Sweden
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- Primetzhofer, Daniel (författare)
- Uppsala universitet,Tillämpad kärnfysik,Tandemlaboratoriet,Uppsala Univ, Sweden; Uppsala Univ, Sweden,The Tandem Laboratory, Uppsala University, Uppsala 75120, Sweden;Department of Physics and Astronomy, Uppsala University, Uppsala 75120, Sweden
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- Magnuson, Martin, 1965- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping 581 83, Sweden
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- Le Febvrier, Arnaud, Assistant Professor, 1986- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping 581 83, Sweden
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- Eklund, Per, Docent, 1977- (författare)
- Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping 581 83, Sweden
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(creator_code:org_t)
- 2021-05-19
- 2021
- Engelska.
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Ingår i: ACS APPLIED ELECTRONIC MATERIALS. - : American Chemical Society (ACS). - 2637-6113. ; 3:6, s. 2748-2756
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Multicomponent or high-entropy ceramics show unique combinations of mechanical, electrical, and chemical properties of importance in coating applications. However, generalizing controllable thin-film processes for these complex materials remains a challenge. Here, understoichiometric (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr, 0.12 <= x <= 0.30) films were deposited on Si(100) substrates at 400 degrees C by reactive magnetron sputtering using single elemental targets. The influence of ion energy during film growth was investigated by varying the negative substrate bias voltage from similar to 10 V (floating potential) to 130 V. The nitrogen content for the samples determined by elastic recoil detection analysis varied from 34.9 to 43.8 at. % (0.12 <= x <= 0.30), and the metal components were near-equimolar and not affected by the bias voltage. On increasing the substrate bias, the phase structures of (TiZrTaMe)N1-x (Me = Hf, Nb, or Mo) films evolved from a polycrystalline fcc phase to a (002) preferred orientation along with a change in surface morphology from faceted triangular features to a dense and smooth structure with nodular mounds. All the four series of (TiZrTaMe)N1-x (Me = Hf, Nb, Mo, or Cr) films exhibited increasing intrinsic stress with increasing negative bias. The maximum compressive stress reached similar to 3.1 GPa in Hf- and Cr-containing films deposited at -130 V. The hardness reached a maximum value of 28.0 +/- 1.0 GPa at a negative bias >= 100 V for all the four series of films. The effect of bias on the mechanical properties of (TiNbZrMe)N1-x films can thus guide the design of protective high-entropy nitride films.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology (hsv//eng)
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Nyckelord
- high-entropy alloy
- understoichiometry
- texture
- residual stress
- hardness
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Till lärosätets databas
- Av författaren/redakt...
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Shu, Rui, 1990-
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Lundin, Daniel, ...
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Xin, Binbin, 198 ...
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Sortica, Maurici ...
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Primetzhofer, Da ...
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Magnuson, Martin ...
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Le Febvrier, Arn ...
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Eklund, Per, Doc ...
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- Om ämnet
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- TEKNIK OCH TEKNOLOGIER
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TEKNIK OCH TEKNO ...
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och Materialteknik
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och Annan materialte ...
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- NATURVETENSKAP
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NATURVETENSKAP
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och Kemi
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och Materialkemi
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- TEKNIK OCH TEKNOLOGIER
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TEKNIK OCH TEKNO ...
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och Materialteknik
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- TEKNIK OCH TEKNOLOGIER
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TEKNIK OCH TEKNO ...
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och Nanoteknik
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- NATURVETENSKAP
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NATURVETENSKAP
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och Fysik
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och Den kondenserade ...
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ACS APPLIED ELEC ...
- Av lärosätet
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Uppsala universitet
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Linköpings universitet