Sökning: onr:"swepub:oai:DiVA.org:uu-68816" >
CHEMICAL-VAPOR-DEPO...
CHEMICAL-VAPOR-DEPOSITION OF TIO AND TI2O3 FROM TICL4/H-2/CO2 GAS-MIXTURES
-
- FREDRIKSSON, E (författare)
- Uppsala universitet
-
- CARLSSON, JO (författare)
- Uppsala universitet
-
(creator_code:org_t)
- ELSEVIER SCIENCE SA LAUSANNE, 1995
- Engelska 160-169 s.
-
Ingår i: SURFACE & COATINGS TECHNOLOGY. - : ELSEVIER SCIENCE SA LAUSANNE. ; 73:3
- Relaterad länk:
-
https://urn.kb.se/re...
Abstract
Ämnesord
Stäng
- Chemical vapour deposition of TiO and Ti2O3 from TiCl4/H-2/CO2 gas mixtures was studied. A temperature of 1000 degrees C and pressures in the range (13-6.7) x 10(3) Pa were utilized. Mainly silica was used as substrate material and in the case of Ti2O3 (
Nyckelord
- CHEMICAL VAPOR DEPOSITION; TIO; TI2O3; TICL4/H-2/CO2 PROCESS; TITANIUM-OXIDES; THIN-FILMS
Publikations- och innehållstyp
- vet (ämneskategori)
- ovr (ämneskategori)