Atomic layer epitaxy of tungsten oxide films using oxyfluorides as metal precursors

• Atomic layer epitaxy (ALE) of WO3 from WF6 and H2O has been studied. These precursors were found to yield very low deposition rates. This was attributed to a poor adsorption of WF6 on the oxide surface. Attempts to increase the adsorption of the metal so

Ämnesord

NATURVETENSKAP  -- Kemi -- Oorganisk kemi (hsv//swe)

NATURAL SCIENCES  -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)

Nyckelord

CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; SURFACE-CHEMISTRY; GROWTH; SELECTIVITY; TANTALUM; KINETICS

Inorganic chemistry

Oorganisk kemi

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