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LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00004308naa a2200553 4500
001oai:research.chalmers.se:3ca93755-030e-4c0f-a32e-04073c22619d
003SwePub
008171007s2016 | |||||||||||000 ||eng|
009oai:DiVA.org:ri-68183
009oai:DiVA.org:liu-132236
020 a 9781467391344
024a https://doi.org/10.1109/CPEM.2016.75405162 DOI
024a https://research.chalmers.se/publication/2456492 URI
024a https://urn.kb.se/resolve?urn=urn:nbn:se:ri:diva-681832 URI
024a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-1322362 URI
040 a (SwePub)cthd (SwePub)rid (SwePub)liu
041 a engb eng
042 9 SwePub
072 7a kon2 swepub-publicationtype
072 7a ref2 swepub-contenttype
100a He, Hans,d 1989u RISE,Mätteknik,Chalmers, Sweden4 aut0 (Swepub:ri)hanshe@ri.se
2451 0a Fabrication of graphene quantum hall resistance standard in a cryogen-Table-Top system
264 1b Institute of Electrical and Electronics Engineers Inc.c 2016
520 a We have demonstrated quantum Hall resistance measurements with metrological accuracy in a relatively easy to use and compact cryogen-free system operating at a temperature of around 3.8 K and magnetic field below 5 T. This advance in technology is due to the unique properties of epitaxial graphene on silicon carbide (SiC) which lifts the stringent requirements for quantum hall effect seen in conventional semiconductors. This paper presents the processes involved in fabrication and characterization of metrologically viable epitaxial graphene samples.
650 7a TEKNIK OCH TEKNOLOGIERx Elektroteknik och elektronik0 (SwePub)2022 hsv//swe
650 7a ENGINEERING AND TECHNOLOGYx Electrical Engineering, Electronic Engineering, Information Engineering0 (SwePub)2022 hsv//eng
650 7a TEKNIK OCH TEKNOLOGIERx Materialteknik0 (SwePub)2052 hsv//swe
650 7a ENGINEERING AND TECHNOLOGYx Materials Engineering0 (SwePub)2052 hsv//eng
650 7a TEKNIK OCH TEKNOLOGIERx Elektroteknik och elektronikx Annan elektroteknik och elektronik0 (SwePub)202992 hsv//swe
650 7a ENGINEERING AND TECHNOLOGYx Electrical Engineering, Electronic Engineering, Information Engineeringx Other Electrical Engineering, Electronic Engineering, Information Engineering0 (SwePub)202992 hsv//eng
653 a measurement standards
653 a Graphene
653 a quantum hall effect
653 a microfabrication
653 a Epitaxial layers
700a Janssen, Tjbmu National Physical Laboratory (NPL),NPL National Physical Laboratory, UK,National Phys Lab, England4 aut
700a Rozhko, S.u National Physical Laboratory (NPL),NPL National Physical Laboratory, UK,National Phys Lab, England4 aut
700a Tzalenchuk, A.Y.u Royal Holloway University of London,National Physical Laboratory (NPL),NPL National Physical Laboratory, UK; University of London, UK,National Phys Lab, England; Royal Holloway University of London, England4 aut
700a Lara Avila, Samuel,d 1983u Chalmers tekniska högskola,Chalmers University of Technology,Chalmers University of Technology, Sweden4 aut0 (Swepub:cth)larsavil
700a Yakimova, Rositsau Linköpings universitet,Halvledarmaterial,Tekniska fakulteten4 aut0 (Swepub:liu)rosia15
700a Kubatkin, Sergey,d 1959u Chalmers tekniska högskola,Chalmers University of Technology,Chalmers University of Technology, Sweden4 aut0 (Swepub:cth)kubatkin
710a RISEb Mätteknik4 org
773t 2016 Conference on Precision Electromagnetic Measurements, CPEM 2016; The Westin OttawaOttawa; Canada; 10-15 July 2016d : Institute of Electrical and Electronics Engineers Inc.g , s. Art no 7540516-q <Art no 7540516-z 9781467391344
773t CPEM 2016 - Conference on Precision Electromagnetic Measurements, Conference Digestd : Institute of Electrical and Electronics Engineers Inc.g , s. Art no 7540516-q <Art no 7540516-
856u http://dx.doi.org/10.1109/CPEM.2016.7540516y FULLTEXT
8564 8u https://doi.org/10.1109/CPEM.2016.7540516
8564 8u https://research.chalmers.se/publication/245649
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:ri:diva-68183
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-132236

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