Growth characterization of vertically aligned carbon nanofibers on top of TiN buffer layer for nanoelectromechanical devices

• Initial growth of vertically aligned carbon nanofibers (VACNFs) from Ni catalyst seeds in the range of 40 to 100 nm as fabricated using hole-mask colloidal lithography on top of reactively sputtered TiN is studied. We observe that the initial growth conditions could cause a growth mode transition from base-type to tip-type. We attribute this transition to a change in the crystallographic orientation of the Ni catalyst seeds induced by initial growth conditions. A convenient method to deposit stoichiometric TiN films is also presented.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Annan teknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Other Engineering and Technologies (hsv//eng)

NATURVETENSKAP  -- Fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

Nyckelord

Titanium nitride

Growth

VACNF

Vertucally aligned carbon nanojiber

Plasma enhanced CVD

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