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Träfflista för sökning "WFRF:(Mendels D.) "

Search: WFRF:(Mendels D.)

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1.
  • Nag, Abhishek, et al. (author)
  • Origin of the Spin-Orbital Liquid State in a Nearly J=0 Iridate Ba3ZnIr2O9
  • 2016
  • In: Physical Review Letters. - : American Physical Society. - 0031-9007 .- 1079-7114. ; 116:9
  • Journal article (peer-reviewed)abstract
    • We show using detailed magnetic and thermodynamic studies and theoretical calculations that the ground state of Ba3ZnIr2O9 is a realization of a novel spin-orbital liquid state. Our results reveal that Ba3ZnIr2O9 with Ir5+ (5d(4)) ions and strong spin-orbit coupling (SOC) arrives very close to the elusive J = 0 state but each Ir ion still possesses a weak moment. Ab initio density functional calculations indicate that this moment is developed due to superexchange, mediated by a strong intradimer hopping mechanism. While the Ir spins within the structural Ir2O9 dimer are expected to form a spin-orbit singlet state (SOS) with no resultant moment, substantial frustration arising from interdimer exchange interactions induce quantum fluctuations in these possible SOS states favoring a spin-orbital liquid phase down to at least 100 mK.
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2.
  • Gourgon, C., et al. (author)
  • Benchmarking of 50 nm features in thermal nanoimprint
  • 2007
  • In: Journal of Vacuum Science and Technology B. - : American Vacuum Society. - 1520-8567. ; 25:6, s. 2373-2378
  • Journal article (peer-reviewed)abstract
    • The objective of this benchmarking is to establish a comparison of several tools and processes used in thermal NIL with Si stamps at the nanoscale among the authors' laboratories. The Si stamps have large arrays of 50 nm dense lines and were imprinted in all these laboratories in a similar to 100 nm thick mr-18010E film. Other materials, such as mr-17010E, were also tested. Good patterns were obtained and some limitations were identified. Reducing the pressure to 15 bars enables the printing of 50 nm structures without pulling them off. At higher pressures, some bending effects resulting in pattern deformation were observed. It was proven that a pressure of 1.5 bars is sufficient to imprint perfect 50 nm lines. The influence of the antiadhesive layer and mold design has been characterized by the demonstration of pulled off lines in some cases. Moreover, it has been shown that the scatterometry method is particularly useful for the characterization of 50 nm lines and that the residual layer thickness corresponds to the theoretical estimate as long as the lines are well defined. One process was demonstrated which combines high reproducibility with high throughput, achieving a cycle time of 2 min. (c) 2007 American Vacuum Society.
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