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| 2. |
- Ali, Sharafat, et al.
(author)
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Novel transparent Mg-Si-O-N thin films with high hardness and refractive index
- 2016
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In: Vacuum. - : Elsevier BV. - 0042-207X .- 1879-2715. ; 131, s. 1-4
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Journal article (peer-reviewed)abstract
- There is an increasing demand for glass materials with better mechanical and optical properties for display and electronic applications. This paper describes the deposition of novel thin films of Mg-Si-O-N onto float glass substrates. Amorphous thin films in the Mg-Si-O-N system with high nitrogen and magnesium contents were deposited by reactive RF magnetron co-sputtering from Mg and Si targets in Ar/N2/O2 gas mixtures. The thin films studied span an unprecedented range of compositions up to 45 at% Mg and 80 at% N out of cations and anions respectively. Thin films in the Mg-Si-O-N system were found to be homogeneous and transparent in the visible region. Mechanical properties like hardness (H) and reduced elastic modulus (Er) show high values, up to 21 GPa and 166 GPa respectively. The refractive index (1.87-2.00) increases with increasing magnesium and nitrogen contents.
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| 3. |
- Ali, Sharafat, Associate Professor, 1976-, et al.
(author)
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Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering
- 2019
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In: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 372:25, s. 9-15
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Journal article (peer-reviewed)abstract
- In this work, amorphous thin films in Mg-Si-O-N system typically containing >15 at.% Mg and 35 at.% N were prepared in order to investigate especially the dependence of optical and mechanical properties on Mg composition. Reactive RF magnetron co-sputtering from magnesium and silicon targets were used for the deposition of Mg-Si-O-N thin films. Films were deposited on float glass, silica wafers and sapphire substrates in an Ar, N2 and O2 gas mixture. X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, spectroscopic ellipsometry, and nanoindentation were employed to characterize the composition, surface morphology, and properties of the films. The films consist of N and Mg contents up to 40 at.% and 28 at.%, respectively and have good adhesion to substrates and are chemically inert. The thickness and roughness of the films increased with increasing content of Mg. Both hardness (16–21 GPa) and reduced elastic modulus (120–176 GPa) are strongly correlated with the amount of Mg content. The refractive index up to 2.01 and extinction coefficient up to 0.18 were found to increase with Mg content. The optical band gap (3.1–4.3) decreases with increasing the Mg content. Thin film deposited at substrate temperature of 100 °C shows a lower value of hardness (10 GPa), refractive index (1.75), and higher values of reduced elastic modulus (124 GPa) as compared to the thin film deposited at 310 °C and 510 °C respectively, under identical synthesis parameters.
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| 5. |
- Ali, Sharafat, 1976-, et al.
(author)
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Synthesis and characterization of the mechanical and optical properties of Ca-Si-O-N thin films deposited by RF magnetron sputtering
- 2017
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In: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 315, s. 88-94
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Journal article (peer-reviewed)abstract
- Ca-Si-O-N thin films were deposited on commercial soda-lime silicate float glass, silica wafers and sapphire substrates by RF magnetron co-sputtering from Ca and Si targets in an Ar/N-2/O-2 gas mixture. Chemical composition, surface morphology, hardness, reduced elastic modulus and optical properties of the films were investigated using X-ray photoelectron spectroscopy, scanning electron microscopy, nanoindentation, and spectroscopic ellipsometry. It was found that the composition of the films can be controlled by the Ca target power, predominantly, and by the reactive gas flow. Thin films in the Ca-Si-O-N system are composed of N and Ca contents up to 31 eq. % and 60 eq. %, respectively. The films thickness ranges from 600 to 3000 nm and increases with increasing Ca target power. The films surface roughness varied between 2 and 12 nm, and approximately decreases with increasing power of Ca target. The hardness (4-12 GPa) and reduced elastic modulus (65-145 GPa) of the films increase and decrease with the N and Ca contents respectively. The refractive index (1.56-1.82) is primarily dictated by the N content. The properties are compared with findings for bulk glasses in the Ca-Si-(Al)-O-N systems, and it is concluded that Ca-Si-O-N thin films have higher values of hardness, elastic modulus and refractive index than bulk glasses of similar composition. (C) 2017 Elsevier B.V. All rights reserved.
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| 6. |
- Ali, Sharafat, 1976-, et al.
(author)
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Thin films in M-Si-O-N thin systems
- 2017
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In: 44th International Conference on Metallurgical Coating and Thin Films (ICMCTF), San Diego, CA, USA, 24-28 Apr 2017.
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Conference paper (peer-reviewed)
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| 7. |
- Alijan Farzad Lahiji, Faezeh
(author)
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Epitaxy of oxide and nitride thin films grown by magnetron sputtering
- 2023
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Licentiate thesis (other academic/artistic)abstract
- The need for electronic devices with new functionalities has caused research to move in a way to design and utilize materials with high-performance thermoelectricity, widely used in batteries, sensors, and electronic devices. Two-dimensional materials (2D) with unique structures and remarkable properties have been identified to fabricate oxide heteroepitaxy. The growth of heteroepitaxy has been focused on the growth of high-quality films on single crystalline substrates. The preferred orientation and the crystallization of the materials with thin or two-dimensional structures require an understanding of epitaxy. In epitaxial growth, using a specific, well- defined substrate with lattice constants close to that film is decisive in controlling the film orientation with high epitaxial quality. The electrical, optical, magnetic, and structural properties of the film are strongly determined by the texture and its epitaxial alignment. The majority of studies report epitaxial growth on Si and sapphire with different crystallographic orientations. The family of NaCl-structured materials covers a variety of nitrides and oxides broadly used in science and technology that have been epitaxially grown on monocrystalline Si and sapphire (Al2O3). In this thesis, the structure and optical properties of NiO are investigated as functions of oxygen content on Si(100) and c-Al2O3 using pulsed dc reactive magnetron sputtering. It is found that NiO with cubic structure is a single phase with predominant orientation along (111) on both substrates. It is fiber textured on Si(100), while twin domain epitaxy is achieved on c-Al2O3. The growth of two cases of metal oxide and nitride films (NiO and CrN) with rock-salt (NaCl) structure is also demonstrated on r-plane sapphire. It is revealed that the NaCl-structured materials NiO and CrN grow with a tilted orientation relative to the substrate. This characterization and analysis of the epitaxy, crystallography, and growth modes yield a single and identical epitaxial relationship of these two cubic materials on r-plane sapphire, in contrast to earlier studies on NaCl-structured materials on r-plane sapphire, indicating several different orientation relationships. The results advance the understanding of growth modes and unusual epitaxial relationships of two cases of metal oxide and nitride films with rock-salt (NaCl) structure broadly used in science and technology on r-plane sapphire.
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| 8. |
- Alijan Farzad Lahiji, Faezeh, et al.
(author)
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Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
- 2023
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In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. - : A V S AMER INST PHYSICS. - 0734-2101 .- 1520-8559. ; 41:6
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Journal article (peer-reviewed)abstract
- NiO thin films with varied oxygen contents are grown on Si(100) and c-Al2O3 at a substrate temperature of 300 degrees C using pulsed dc reactive magnetron sputtering. We characterize the structure and optical properties of NiO changes as functions of the oxygen content. NiO with the cubic structure, single phase, and predominant orientation along (111) is found on both substrates. X-ray diffraction and pole figure analysis further show that NiO on the Si(100) substrate exhibits fiber-textured growth, while twin domain epitaxy was achieved on c-Al2O3, with NiO(111) k Al2O3(0001) and NiO[1 (1) over bar0]k Al2O3[10 (1) over bar0] or NiO[(1) over bar 10]k Al2O3[2 (1) over bar(1) over bar0] epitaxial relationship. The oxygen content in NiO films did not have a significant effect on the refractive index, extinction coefficient, and absorption coefficient. This suggests that the optical properties of NiO films remained unaffected by changes in the oxygen content.
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| 9. |
- Alijan Farzad Lahiji, Faezeh, et al.
(author)
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Unusual tilted growth and epitaxial relationship of NaCl B1-structured NiO and CrN on r-plane Al2O3
- 2024
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In: Journal of Applied Physics. - : American Institute of Physics Inc.. - 0021-8979 .- 1089-7550. ; 135:6
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Journal article (peer-reviewed)abstract
- Epitaxial NiO and CrN thin films were deposited on a single-crystal Al2O3(11¯02) (r-plane sapphire) using magnetron sputtering. The two materials were intentionally deposited into two different deposition chamber designs and under different conditions (temperature, pressure, gases, and energy of sputtered particles). Despite the differences in the deposition condition and material system, both materials had the same feature with uncommon tilted epitaxial growth. Through an in-depth x-ray diffraction analysis of the NaCl (B1)-structured materials on r-plane sapphire, the full twin domain epitaxial relations were determined and can be described as (110)NaCl(B1)∥(44¯03)Al2O3 and [11¯2]NaCl(B1)∥[1¯1¯20]Al2O3. This relationship differs from the previously observed orientation of (100)NaCl(B1)∥(11¯02)Al2O3 and [100]NaCl(B1)∥[101¯0]Al2O3. These results are of general relevance for the growth of the extended NaCl (B1)-structured cubic material family onto a r-plane sapphire substrate where similar epitaxial growth can be expected.
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| 10. |
- Du, Yong, et al.
(author)
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Flexible n-Type Tungsten Carbide/Polylactic Acid Thermoelectric Composites Fabricated by Additive Manufacturing
- 2018
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In: Coatings. - : MDPI AG. - 2079-6412. ; 8:1
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Journal article (peer-reviewed)abstract
- Flexible n-type tungsten carbide/polylactic acid (WC/PLA) composites were fabricated by additive manufacturing and their thermoelectric properties were investigated. The preparation of an n-type polymer-based thermoelectric composite with good stability in air atmosphere via additive manufacturing holds promise for application in flexible thermoelectric devices. For WC/PLA volume ratios varying from similar to 33% to 60%, the electrical conductivity of the composites increased from 10.6 to 42.2 S/cm, while the Seebeck coefficients were in the range -11 to -12.3 V/K. The thermal conductivities of the composites varied from similar to 0.2 to similar to 0.28 Wamp;lt;boldamp;gt;mamp;lt;/boldamp;gt;-1amp;lt;boldamp;gt;Kamp;lt;/boldamp;gt;-1 at similar to 300 K.
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