| 1. |
- Lorenz, M. W., et al.
(author)
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Carotid Intima-Media Thickness Progression and Risk of Vascular Events in People With Diabetes: Results From the PROG-IMT Collaboration
- 2015
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In: Diabetes Care. - : American Diabetes Association. - 0149-5992 .- 1935-5548. ; 38:10, s. 1921-1929
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Journal article (peer-reviewed)abstract
- OBJECTIVECarotid intima-media thickness (CIMT) is a marker of subclinical organ damage and predicts cardiovascular disease (CVD) events in the general population. It has also been associated with vascular risk in people with diabetes. However, the association of CIMT change in repeated examinations with subsequent CVD events is uncertain, and its use as a surrogate end point in clinical trials is controversial. We aimed at determining the relation of CIMT change to CVD events in people with diabetes.RESEARCH DESIGN AND METHODSIn a comprehensive meta-analysis of individual participant data, we collated data from 3,902 adults (age 33-92 years) with type 2 diabetes from 21 population-based cohorts. We calculated the hazard ratio (HR) per standard deviation (SD) difference in mean common carotid artery intima-media thickness (CCA-IMT) or in CCA-IMT progression, both calculated from two examinations on average 3.6 years apart, for each cohort, and combined the estimates with random-effects meta-analysis.RESULTSAverage mean CCA-IMT ranged from 0.72 to 0.97 mm across cohorts in people with diabetes. The HR of CVD events was 1.22 (95% CI 1.12-1.33) per SD difference in mean CCA-IMT, after adjustment for age, sex, and cardiometabolic risk factors. Average mean CCA-IMT progression in people with diabetes ranged between -0.09 and 0.04 mm/year. The HR per SD difference in mean CCA-IMT progression was 0.99 (0.91-1.08).CONCLUSIONSDespite reproducing the association between CIMT level and vascular risk in subjects with diabetes, we did not find an association between CIMT change and vascular risk. These results do not support the use of CIMT progression as a surrogate end point in clinical trials in people with diabetes.
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| 3. |
- Geneid, A., et al.
(author)
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Union of the European Phoniatricians position statement on the exit strategy of phoniatric and laryngological services: staying safe and getting back to normal after the peak of coronavirus disease 2019 (issued on 25th May 2020)
- 2020
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In: Journal of Laryngology and Otology. - : CAMBRIDGE UNIV PRESS. - 0022-2151 .- 1748-5460. ; 134:8, s. 661-664
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Journal article (peer-reviewed)abstract
- Background The following position statement from the Union of the European Phoniatricians, updated on 25th May 2020 (superseding the previous statement issued on 21st April 2020), contains a series of recommendations for phoniatricians and ENT surgeons who provide and/or run voice, swallowing, speech and language, or paediatric audiology services. Objectives This material specifically aims to inform clinical practices in countries where clinics and operating theatres are reopening for elective work. It endeavours to present a current European view in relation to common procedures, many of which fall under the aegis of aerosol generating procedures. Conclusion As evidence continues to build, some of the recommended practices will undoubtedly evolve, but it is hoped that the updated position statement will offer clinicians precepts on safe clinical practice.
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| 5. |
- Austgen, M, et al.
(author)
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Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering : process characteristics and resulting film properties
- 2011
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In: Journal of Physics D. - : IOP Publishing. - 0022-3727 .- 1361-6463. ; 44:34, s. 345501-
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Journal article (peer-reviewed)abstract
- The deposition rate of reactively sputtered Al(2)O(3) coatings is demonstrated to increase by 80% upon tungsten doping of the used aluminium target. This effect is based on the recoil of the sputtering species at implanted dopants below the target surface and is termed sputter yield amplification. For the investigation of this effect, a novel type of magnetron sputter deposition system is employed that facilitates serial co-sputtering. In this technique doping of the elementary target is enabled by a dynamic sputtering process from an auxiliary cathode. In our case, the rotating aluminium target is dynamically coated with tungsten from this auxiliary cathode. Since the primary target rotates, the auxiliary cathode is placed in series with the primary erosion zone. The deposition rate of Al(2)O(3) can be considerably increased in this process already for very low concentrations of approximately 1% of tungsten in the resulting film. A characterization of the dynamics of reactive sputtering as a function of target rotation speed is performed.
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| 6. |
- Kubart, Tomas, 1977-, et al.
(author)
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Modelling of sputtering yield amplification effect in reactive deposition of oxides
- 2010
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In: Surface & Coatings Technology. - : Elsevier BV. - 0257-8972 .- 1879-3347. ; 204:23, s. 3882-3886
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Journal article (peer-reviewed)abstract
- Many reactive sputter deposition applications require high deposition rates. The primary limiting parameters in magnetron sputtering are the target power dissipation and sputtering yields of the target elements. In reactive deposition of oxides, the deposition rate is of particular interest due to the low sputtering yield of most commonly used oxides. Traditional high rate techniques rely on a feedback control of the oxygen partial pressure to prevent formation of oxide on the target and hence enable operation in the transition area. An alternative approach, based on target doping, is presented in this paper.By doping the sputtering target with heavy elements, it is possible to substantially enhance the sputtering yield and hence the deposition rate. Simulations of the partial sputtering yield values for aluminium from doped targets sputtered in reactive atmosphere have been carried out. The Monte Carlo based TRIDYN computer code has been used for simulations. The program has been used to find out optimum alloying conditions to obtain maximum partial sputtering yield for deposition of Al2O3. Our simulations indicate that the sputtering yield amplification in reactive sputtering may lead to much higher relative deposition rate increase than in a nonreactive case. The highest relative increase may be achieved in the transition region but substantial increase is predicted also in the oxide mode.
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| 7. |
- Kubart, Tomas, et al.
(author)
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Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
- 2012
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In: Surface & Coatings Technology. - : Elsevier BV. - 0257-8972 .- 1879-3347. ; 206:24, s. 5055-5059
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Journal article (peer-reviewed)abstract
- Serial magnetron co-sputtering can be used to increase the deposition rate in reactive deposition of thin films. The increase in deposition rate is achieved by sputtering yield amplification through doping the sputtering target by a heavy element. The dopant is introduced by means of sputtering from an auxiliary target onto a rotating primary magnetron. During sputtering of the primary target, the dopant is implanted into the target surface. Here we present a model describing the serial co-sputtering technique. The model is based on the binary collision approximation and takes into account the dynamical sputtering and mixing at the target surface. As an example, W and Bi doping in reactive sputter deposition of Al2O3 is analyzed. W is shown to be very efficient dopant which can increase the deposition rate for oxide up to 100% with 1.6 at.% of W in the resulting coating. Doping by Bi is not very effective due to the low surface binding energy of Bi. The simulations show that sputtering yield amplification can be realized in the serial co-sputtering setup with rotating magnetrons.
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| 10. |
- Severin, D, et al.
(author)
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Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target
- 2009
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In: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 105:9, s. 093302-
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Journal article (peer-reviewed)abstract
- We present a method to eliminate hysteresis effects and to increase the deposition rate for the reactive sputtering of metal oxides. This is achieved by using a ceramic nitride target in an argon-oxygen atmosphere. Although the use of a ceramic nitride target leads to pronounced changes of the processing characteristics, incorporation of nitrogen into the growing film is very small. These observations can be theoretically predicted using an extension of Berg's model [S. Berg and T. Nyberg, Thin Solid Films 476, 215 (2005)] to two different reactive gases and a compound target.
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