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1.	Badel, Xavier, et al. (author) Metallized and oxidized silicon macropore arrays filled with a scintillator for CCD-based X-ray imaging detectors 2004 In: IEEE Transactions on Nuclear Science. - : IEEE. - 0018-9499 .- 1558-1578. ; 51:3, s. 1001-1005, s. 1006-1010 Journal article (peer-reviewed)abstract Silicon charge-coupled devices (CCDs) covered with a scintillating film are now available on the market for use in digital medical imaging. However, these devices could still be improved in terms of sensitivity and especially spatial resolution by coating the CCD with an array of scintillating waveguides. In this paper, such waveguides were fabricated by first etching pores in silicon, then performing metallization or oxidation of the pore walls and finally filling the pores with CsI(TI). The resulting structures were observed using scanning electron microscopy and tested under X-ray exposure. Theoretical efficiencies of macropore arrays filled with CsI(TI) were also calculated, indicating that the optimal pore depth for metallized macropore arrays is about 80 mum while it is around 350 mum for oxidized ones. This result, together with the roughness of the metal coating, explains why lower SNR values were measured with the metallized macropores. Indeed, the macropore arrays had depths in the range of 210-390 mum, which is favorable to oxidized structures.

Badel, Xavier, et al. (author)
Metallized and oxidized silicon macropore arrays filled with a scintillator for CCD-based X-ray imaging detectors
2004
In: IEEE Transactions on Nuclear Science. - : IEEE. - 0018-9499 .- 1558-1578. ; 51:3, s. 1001-1005, s. 1006-1010
Journal article (peer-reviewed)abstract
- Silicon charge-coupled devices (CCDs) covered with a scintillating film are now available on the market for use in digital medical imaging. However, these devices could still be improved in terms of sensitivity and especially spatial resolution by coating the CCD with an array of scintillating waveguides. In this paper, such waveguides were fabricated by first etching pores in silicon, then performing metallization or oxidation of the pore walls and finally filling the pores with CsI(TI). The resulting structures were observed using scanning electron microscopy and tested under X-ray exposure. Theoretical efficiencies of macropore arrays filled with CsI(TI) were also calculated, indicating that the optimal pore depth for metallized macropore arrays is about 80 mum while it is around 350 mum for oxidized ones. This result, together with the roughness of the metal coating, explains why lower SNR values were measured with the metallized macropores. Indeed, the macropore arrays had depths in the range of 210-390 mum, which is favorable to oxidized structures.

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