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Search: WFRF:(Xia Ni)

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2.
  • Beal, Jacob, et al. (author)
  • Robust estimation of bacterial cell count from optical density
  • 2020
  • In: Communications Biology. - : Springer Science and Business Media LLC. - 2399-3642. ; 3:1
  • Journal article (peer-reviewed)abstract
    • Optical density (OD) is widely used to estimate the density of cells in liquid culture, but cannot be compared between instruments without a standardized calibration protocol and is challenging to relate to actual cell count. We address this with an interlaboratory study comparing three simple, low-cost, and highly accessible OD calibration protocols across 244 laboratories, applied to eight strains of constitutive GFP-expressing E. coli. Based on our results, we recommend calibrating OD to estimated cell count using serial dilution of silica microspheres, which produces highly precise calibration (95.5% of residuals <1.2-fold), is easily assessed for quality control, also assesses instrument effective linear range, and can be combined with fluorescence calibration to obtain units of Molecules of Equivalent Fluorescein (MEFL) per cell, allowing direct comparison and data fusion with flow cytometry measurements: in our study, fluorescence per cell measurements showed only a 1.07-fold mean difference between plate reader and flow cytometry data.
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4.
  • Schael, S, et al. (author)
  • Precision electroweak measurements on the Z resonance
  • 2006
  • In: Physics Reports. - : Elsevier BV. - 0370-1573 .- 1873-6270. ; 427:5-6, s. 257-454
  • Research review (peer-reviewed)abstract
    • We report on the final electroweak measurements performed with data taken at the Z resonance by the experiments operating at the electron-positron colliders SLC and LEP. The data consist of 17 million Z decays accumulated by the ALEPH, DELPHI, L3 and OPAL experiments at LEP, and 600 thousand Z decays by the SLID experiment using a polarised beam at SLC. The measurements include cross-sections, forward-backward asymmetries and polarised asymmetries. The mass and width of the Z boson, m(Z) and Gamma(Z), and its couplings to fermions, for example the p parameter and the effective electroweak mixing angle for leptons, are precisely measured: m(Z) = 91.1875 +/- 0.0021 GeV, Gamma(Z) = 2.4952 +/- 0.0023 GeV, rho(l) = 1.0050 +/- 0.0010, sin(2)theta(eff)(lept) = 0.23153 +/- 0.00016. The number of light neutrino species is determined to be 2.9840 +/- 0.0082, in agreement with the three observed generations of fundamental fermions. The results are compared to the predictions of the Standard Model (SM). At the Z-pole, electroweak radiative corrections beyond the running of the QED and QCD coupling constants are observed with a significance of five standard deviations, and in agreement with the Standard Model. Of the many Z-pole measurements, the forward-backward asymmetry in b-quark production shows the largest difference with respect to its SM expectation, at the level of 2.8 standard deviations. Through radiative corrections evaluated in the framework of the Standard Model, the Z-pole data are also used to predict the mass of the top quark, m(t) = 173(+10)(+13) GeV, and the mass of the W boson, m(W) = 80.363 +/- 0.032 GeV. These indirect constraints are compared to the direct measurements, providing a stringent test of the SM. Using in addition the direct measurements of m(t) and m(W), the mass of the as yet unobserved SM Higgs boson is predicted with a relative uncertainty of about 50% and found to be less than 285 GeV at 95% confidence level. (c) 2006 Elsevier B.V. All rights reserved.
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5.
  • Tang, Ting-Ting, et al. (author)
  • Impaired thymic export and apoptosis contribute to regulatory T-cell defects in patients with chronic heart failure.
  • 2011
  • In: PLoS ONE. - : Public Library of Science (PLoS). - 1932-6203 .- 1932-6203. ; 6:9, s. e24272-
  • Journal article (peer-reviewed)abstract
    • Animal studies suggest that regulatory T (T(reg)) cells play a beneficial role in ventricular remodeling and our previous data have demonstrated defects of T(reg) cells in patients with chronic heart failure (CHF). However, the mechanisms behind T(reg-)cell defects remained unknown. We here sought to elucidate the mechanism of T(reg-)cell defects in CHF patients.
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6.
  • Du, Chun-Xia, et al. (author)
  • Efficient 1.54 µm light emission from Si/SiGe/Si : Er
  • 2001
  • In: Materials Science & Engineering. - 0921-5107 .- 1873-4944. ; 81:1-3, s. 105-108
  • Journal article (peer-reviewed)abstract
    • Si/SiGe/Si:Er:O-heterojunction bipolar transistor (HBT)-type light emitting devices with Er3+ ions incorporated in the collector region have been fabricated using layered structures prepared by differential molecular beam epitaxy (MBE). Intense light emission at 1.54 µm has been observed at room temperature by hot electron impact excitation at rather low injection current and applied voltage. Separate controls of the injection current and bias voltage make it possible to perform detailed electroluminescence (EL) studies that can not be done with conventional Si:Er light emitting diodes (LEDs). Saturation of the EL intensity occurs at very low current densities indicating a 100-fold increase of the effective excitation cross-section for Si/SiGe/Si:Er:O-HBTs compared with Si:Er-LEDs. © 2001 Elsevier Science B.V.
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7.
  • Du, Chun-Xia, et al. (author)
  • Electroluminescence studies of Er and SiO co-doped Si layers prepared by molecular beam epitaxy
  • 2000
  • In: Optical materials (Amsterdam). - 0925-3467 .- 1873-1252. ; 14:3, s. 259-265
  • Journal article (peer-reviewed)abstract
    • Er/O co-doped Si light emitting diodes (LEDs) have been fabricated using layer structures prepared by molecular beam epitaxy (MBE). The Er/O doping was realized by sublimation of elemental Er and silicon monoxide simultaneously with Si during MBE growth. Intense Er-related electroluminescence (EL) at 1.54 mu m was observed at room temperature from p(+)-SiGe/i-SiGe-Si/Si:Er/n(+)-Si LEDs by electron impact excitation under reverse bias. It has been found that the EL intensity was increased with increasing growth temperature of the Si:Er/O layer in the range of 430-575 degrees C. The electrical pumping power dependence of EL intensity has been studied. An excitation cross section value of similar to 1 x 10(-16) cm(2) was estimated based on the experimental data and model fitting. The EL decay behavior under various injection and bias conditions has been studied by time-resolved EL measurements. The overall luminescence decay time is found to strongly depend on the injection parameters. Two types of de-excitation mechanisms due to Auger energy transfer to free carriers introduced by either dopant ionization or carrier injection have been discussed. Both Auger processes play an important role in reduction of the EL intensity when there is a high density of carriers with excited Er ions. (C) 2000 Elsevier Science B.V. All rights reserved.
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8.
  • Du, Chun-Xia, et al. (author)
  • Si/SiGe/Si : Er
  • 2001
  • In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 78:12, s. 1697-1699
  • Journal article (peer-reviewed)abstract
    • Si/SiGe/Si:Er:O heterojunction bipolar transistor (HBT) type light-emitting devices with Er3+ ions incorporated in the collector region have been fabricated using a layered structure grown by differential molecular-beam epitaxy. Electroluminescence measurements on processed light-emitting HBTs can be performed in either constant driving current mode or constant applied bias mode, which is an important advantage over conventional Si:Er light-emitting diodes. Intense room-temperature light emission at the Er3+ characteristic wavelength of 1.54 µm has been observed at low driving current density, e.g., 0.1 A cm-2, and low applied bias, e.g., 3 V, across the collector and emitter. © 2001 American Institute of Physics.
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9.
  • Du, Chun-Xia, et al. (author)
  • Si/SiGe/Si : Er : O light-emitting transistors prepared by differential molecular-beam epitaxy
  • 2001
  • In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 78:12, s. 1697-1699
  • Journal article (peer-reviewed)abstract
    • Si/SiGe/Si:Er:O heterojunction bipolar transistor (HBT) type light-emitting devices with Er3+ ions incorporated in the collector region have been fabricated using a layered structure grown by differential molecular-beam epitaxy. Electroluminescence measurements on processed light-emitting HBTs can be performed in either constant driving current mode or constant applied bias mode, which is an important advantage over conventional Si:Er light-emitting diodes. Intense room-temperature light emission at the Er3+ characteristic wavelength of 1.54 mum has been observed at low driving current density, e.g., 0.1 A cm(-2), and low applied bias, e.g., 3 V, across the collector and emitter. (C) 2001 American Institute of Physics.
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10.
  • Duteil, F., et al. (author)
  • Er/O doped Si1-xGex alloy layers grown by MBE
  • 2001
  • In: Optical materials (Amsterdam). - 0925-3467 .- 1873-1252. ; 17:1-2, s. 131-134
  • Conference paper (other academic/artistic)abstract
    • Silicon-based light emitting diodes (LEDs) containing an Er/O-doped Si1-xGex active layer have been studied. The structures were grown by molecular beam epitaxy (MBE), with Er and O concentrations of 5 × 1019 and 1 × 1020 cm-3, respectively, using Er and silicon monoxide sources. The microstructure has been studied by X-ray diffraction (XRD) and cross-sectional transmission electron microscopy, and it is found that Er/O-doped Si0.92Ge0.08 layers of high crystalline quality, can be obtained. Electroluminescence (EL) measurements have been performed on reverse-biased Er/O doped diodes both from the surface and from the edge and the emission at 1.54 µm associated with the Er3+ ions has been studied at 300 K and lower temperatures. To evaluate the possibility to use a Si1-xGex layer for waveguiding in Si-based optoelectronics, studies of the refractive index n of strained Si1-xGex as a function of the Ge concentration have been done by spectroscopic ellipsometry in the range 0.3-1.7 µm. At 1.54 µm the refractive index increases monotonically with the Ge concentration up to n = 3.542 for a Ge concentration of 21.3%. © 2001 Elsevier Science B.V.
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