1. |
- Persson, P. O.Å., et al.
(author)
-
Tuning composition in graded AlGaN channel HEMTs toward improved linearity for low-noise radio-frequency amplifiers
- 2023
-
In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 122:15
-
Journal article (peer-reviewed)abstract
- Compositionally graded channel AlGaN/GaN high electron mobility transistors (HEMTs) offer a promising route to improve device linearity, which is necessary for low-noise radio-frequency amplifiers. In this work, we demonstrate different grading profiles of a 10-nm-thick AlxGa1-xN channel from x = 0 to x = 0.1 using hot-wall metal-organic chemical vapor deposition (MOCVD). The growth process is developed by optimizing the channel grading and the channel-to-barrier transition. For this purpose, the Al-profiles and the interface sharpness, as determined from scanning transmission electron microscopy combined with energy-dispersive x-ray spectroscopy, are correlated with specific MOCVD process parameters. The results are linked to the channel properties (electron density, electron mobility, and sheet resistance) obtained by contactless Hall and terahertz optical Hall effect measurements coupled with simulations from solving self-consistently Poisson and Schrödinger equations. The impact of incorporating a thin AlN interlayer between the graded channel and the barrier layer on the HEMT properties is investigated and discussed. The optimized graded channel HEMT structure is found to have similarly high electron density (∼9 × 10 12 cm-2) as the non-graded conventional structure, though the mobility drops from ∼ 2360 cm2/V s in the conventional to ∼ 960 cm2/V s in the graded structure. The transconductance gm of the linearly graded channel HEMTs is shown to be flatter with smaller g m ′ and g m ″ as compared to the conventional non-graded channel HEMT implying improved device linearity.
|
|
2. |
- Paskova, T., et al.
(author)
-
Strain-free low-defect-density bulk GaN with nonpolar orientations
- 2006
-
In: MRS Proceedings. - : Springer Science and Business Media LLC. - 1946-4274.
-
Conference paper (peer-reviewed)abstract
- Bulk GaN sliced in bars along (11-20) and (1-100) planes from a boule grown in the [0001] direction by HVPE was confirmed as strain free material with a low dislocation density by using several characterization techniques. The high-structural quality of the material allows photoluminescence studies of free excitons, principal donor bound excitons and their twoelectron satellites with regard to the optical selection rules. Raman scattering study of the bulk GaN with nonpolar orientations allows a direct access to the active phonon modes and a direct determination of their strain-free positions.
|
|
3. |
- Armakavicius, Nerijus, 1989-, et al.
(author)
-
Electron effective mass in GaN revisited: New insights from terahertz and mid-infrared optical Hall effect
- 2024
-
In: APL Materials. - : AIP Publishing. - 2166-532X. ; 12:2
-
Journal article (peer-reviewed)abstract
- Electron effective mass is a fundamental material parameter defining the free charge carrier transport properties, but it is very challenging to be experimentally determined at high temperatures relevant to device operation. In this work, we obtain the electron effective mass parameters in a Si-doped GaN bulk substrate and epitaxial layers from terahertz (THz) and mid-infrared (MIR) optical Hall effect (OHE) measurements in the temperature range of 38-340 K. The OHE data are analyzed using the well-accepted Drude model to account for the free charge carrier contributions. A strong temperature dependence of the electron effective mass parameter in both bulk and epitaxial GaN with values ranging from (0.18 +/- 0.02) m(0) to (0.34 +/- 0.01) m(0) at a low temperature (38 K) and room temperature, respectively, is obtained from the THz OHE analysis. The observed effective mass enhancement with temperature is evaluated and discussed in view of conduction band nonparabolicity, polaron effect, strain, and deviations from the classical Drude behavior. On the other hand, the electron effective mass parameter determined by MIR OHE is found to be temperature independent with a value of (0.200 +/- 0.002) m(0). A possible explanation for the different findings from THz OHE and MIR OHE is proposed. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/)
|
|
4. |
|
|
5. |
|
|
6. |
- Bartos, I., et al.
(author)
-
Electron band bending of polar, semipolar and non-polar GaN surfaces
- 2016
-
In: Journal of Applied Physics. - : AMER INST PHYSICS. - 0021-8979 .- 1089-7550. ; 119:10, s. 105303-
-
Journal article (peer-reviewed)abstract
- The magnitudes of the surface band bending have been determined by X-ray photoelectron spectroscopy for polar, semipolar, and non-polar surfaces of wurtzite GaN crystals. All surfaces have been prepared from crystalline GaN samples grown by the hydride-vapour phase epitaxy and separated from sapphire substrates. The Ga 3d core level peak shifts have been used for band bending determination. Small band bending magnitudes and also relatively small difference between the band bendings of the surfaces with opposite polarity have been found. These results point to the presence of electron surface states of different amounts and types on surfaces of different polarity and confirm the important role of the electron surface states in compensation of the bound surface polarity charges in wurtzite GaN crystals. (C) 2016 AIP Publishing LLC.
|
|
7. |
|
|
8. |
- Darakchieva, Vanya, 1971-, et al.
(author)
-
Anisotropic strain and phonon deformation potentials in GaN
- 2007
-
In: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 75:19, s. 195217-
-
Journal article (peer-reviewed)abstract
- We report optical phonon frequency studies in anisotropically strained c -plane- and a -plane-oriented GaN films by generalized infrared spectroscopic ellipsometry and Raman scattering spectroscopy. The anisotropic strain in the films is obtained from high-resolution x-ray diffraction measurements. Experimental evidence for splitting of the GaN E1 (TO), E1 (LO), and E2 phonons under anisotropic strain in the basal plane is presented, and their phonon deformation potentials c E1 (TO), c E1 (LO), and c E2 are determined. A distinct correlation between anisotropic strain and the A1 (TO) and E1 (LO) frequencies of a -plane GaN films reveals the a A1 (TO), b A1 (TO), a E1 (LO), and b E1 (LO) phonon deformation potentials. The a A1 (TO) and b A1 (TO) are found to be in very good agreement with previous results from Raman experiments. Our a A1 (TO) and a E1 (LO) phonon deformation potentials agree well with recently reported theoretical estimations, while b A1 (TO) and b E1 (LO) are found to be significantly larger than the theoretical values. A discussion of the observed differences is presented. © 2007 The American Physical Society.
|
|
9. |
- Darakchieva, Vanya, et al.
(author)
-
Effect of anisotropic strain on phonons in a-plane and c-plane GaN layers
- 2007
-
In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 300:1, s. 233-238
-
Journal article (peer-reviewed)abstract
- We have studied phonons in two types of anisotropically strained GaN films: c-plane GaN films grown on a-plane sapphire and a-plane GaN films grown on r-plane sapphire. The anisotropic strain in the films is determined by high-resolution X-ray diffraction (HRXRD) in different measuring geometries and the phonon parameters have been assessed by generalized infrared spectroscopic ellipsometry (GIRSE). The effect of strain anisotropy on GaN phonon frequencies is presented and the phonon deformation potentials aA1 (TO), bA1 (TO), cE1 (TO) and cE1 (LO) are determined. © 2006 Elsevier B.V. All rights reserved.
|
|
10. |
- Delgado Carrascon, Rosalia, 1987-, et al.
(author)
-
Hot-Wall MOCVD for High-Quality Homoepitaxy of GaN : Understanding Nucleation and Design of Growth Strategies
- 2022
-
In: Crystal Growth & Design. - : American Chemical Society (ACS). - 1528-7483 .- 1528-7505. ; 22:12, s. 7021-7030
-
Journal article (peer-reviewed)abstract
- Thick GaN layers with a low concentration of defects are the key to enable next-generation vertical power electronic devices. Here, we explore hot-wall metalorganic chemical vapor deposition (MOCVD) for the development of GaN homoepitaxy. We propose a new approach to grow high quality homoepitaxial GaN in N2-rich carrier gas and at a higher supersaturation as compared to heteroepitaxy. We develop a low temperature GaN as an optimum nucleation scheme based on the evolution and thermal stability of the GaN surface under different gas compositions and temperatures. Analysis in the framework of nucleation theory of homoepitaxial layers simultaneously grown on GaN templates on SiC and on hydride vapor phase epitaxy GaN substrates is presented. We show that residual strain and screw dislocation densities affect GaN nucleation and subsequent growth leading to distinctively different morphologies of GaN homoepitaxial layers grown on GaN templates and native substrates, respectively. The established comprehensive picture provides a guidance for designing strategies for growth conditions optimization in GaN homoepitaxy. GaN with atomically flat and smooth epilayer surfaces with a root-mean-square roughness value as low as 0.049 nm and low background carbon concentration of 5.3 x 1015 cm-3 has been achieved. It is also shown that there is no generation of additional dislocations during homoepitaxial growth. Thus, our results demonstrate the potential of the hot-wall MOCVD technique to deliver high-quality GaN material for vertical power devices.
|
|
11. |
- Gil, B., et al.
(author)
-
Internal structure of the neutral donor-bound exciton complex in cubic zinc-blende and wurtzite semiconductors
- 2007
-
In: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 75:8
-
Journal article (peer-reviewed)abstract
- We calculate the fine structure splitting of the near band edge donor-bound excitons in major cubic semiconductors using an approach inspired by an earlier one that consists in replacing the Morse potential by a Kratzer one, in order to account for the repulsion between the donor and the hole. A regular trend is observed when plotting the computed results in terms of donor binding energies for all these semiconductors. Second, we extend the method to wurtzite semiconductors, namely CdS, GaN, and ZnO. The previously reported trend is found again, but enriched with the strong anisotropy of the dispersion relations in the valence band of these semiconductors. We end up in addressing a quantitative interpretation of the fine structure splitting of the donor bound exciton complex which includes the jj coupling between the valence band Bloch and the envelope nonrigid rotator hole states. © 2007 The American Physical Society.
|
|
12. |
- Gogova, Daniela, et al.
(author)
-
Epitaxial growth of β -Ga 2 O 3 by hot-wall MOCVD
- 2022
-
In: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5, s. 055022-055022
-
Journal article (peer-reviewed)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and highperformance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth ofβ-Ga2O3. Epitaxial β-Ga2O3 layers at high growth rates (above 1 μm/h), at low reagent flows, and at reduced growth temperatures(740 ○C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. Thehot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial β-Ga2O3 layers are demonstrated with a 201 ¯rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) ¯ β-Ga2O3 substrates, indicative ofsimilar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be furtherexplored for the fabrication of β-Ga2O3
|
|
13. |
- Gogova, Daniela, 1967-, et al.
(author)
-
Epitaxial growth of β-Ga2O3 by hot-wall MOCVD
- 2022
-
In: AIP Advances. - : AIP Publishing. - 2158-3226. ; 12:5
-
Journal article (peer-reviewed)abstract
- The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth of beta-Ga2O3. Epitaxial beta-Ga2O3 layers at high growth rates (above 1 mu m/h), at low reagent flows, and at reduced growth temperatures (740 degrees C) are demonstrated. A high crystalline quality epitaxial material on a c-plane sapphire substrate is attained as corroborated by a combination of x-ray diffraction, high-resolution scanning transmission electron microscopy, and spectroscopic ellipsometry measurements. The hot-wall MOCVD process is transferred to homoepitaxy, and single-crystalline homoepitaxial beta-Ga2O3 layers are demonstrated with a 201 rocking curve width of 118 arc sec, which is comparable to those of the edge-defined film-fed grown (201) beta-Ga2O3 substrates, indicative of similar dislocation densities for epilayers and substrates. Hence, hot-wall MOCVD is proposed as a prospective growth method to be further explored for the fabrication of beta-Ga2O3.
|
|
14. |
|
|
15. |
|
|
16. |
- Knight, Sean Robert, et al.
(author)
-
Room temperature two-dimensional electron gas scattering time, effective mass, and mobility parameters in AlxGa1−xN/GaN heterostructures (0.07 ≤ x ≤ 0.42)
- 2023
-
In: Journal of Applied Physics. - : American Institute of Physics Inc.. - 0021-8979 .- 1089-7550. ; 134:18
-
Journal article (peer-reviewed)abstract
- Al xGa 1−xN/GaN high-electron-mobility transistor (HEMT) structures are key components in electronic devices operating at gigahertz or higher frequencies. In order to optimize such HEMT structures, understanding their electronic response at high frequencies and room temperature is required. Here, we present a study of the room temperature free charge carrier properties of the two-dimensional electron gas (2DEG) in HEMT structures with varying Al content in the Al xGa 1−xN barrier layers between x=0.07 and x=0.42. We discuss and compare 2DEG sheet density, mobility, effective mass, sheet resistance, and scattering times, which are determined by theoretical calculations, contactless Hall effect, capacitance-voltage, Eddy current, and cavity-enhanced terahertz optical Hall effect (THz-OHE) measurements using a low-field permanent magnet (0.6 T). From our THz-OHE results, we observe that the measured mobility reduction from x=0.13 to x=0.42 is driven by the decrease in 2DEG scattering time, and not the change in effective mass. For x<0.42, the 2DEG effective mass is found to be larger than for electrons in bulk GaN, which in turn, contributes to a decrease in the principally achievable mobility. From our theoretical calculations, we find that values close to 0.3 m0 can be explained by the combined effects of conduction band nonparabolicity, polarons, and hybridization of the electron wavefunction through penetration into the barrier layer.
|
|
17. |
- Monemar, Bo, et al.
(author)
-
Effect of an (Al,In)N insertion layer on the radiative emission properties of (In,Ga)N/GaN multiple quantum well structures
- 2007
-
In: Physica Status Solidi (a) applications and materials science. - : Wiley. - 1862-6300 .- 1862-6319. ; 204:1, s. 304-308
-
Journal article (peer-reviewed)abstract
- As an effort to investigate new techniques to reduce the effect of the strong internal polarization fields in (In,Ga)N/GaN quantum well (QW) structures we have studied the influence of inserting a thin wide band-gap AI(0 95)In(0.05)N interlayer inside the QWs, in order to modify the potential and increase the electron-hole overlap. A strong reduction of the decay times of the photoluminescence (PL) was observed in this case at all temperatures up to 300 K, without a strong reduction in PL intensity. The tunneling electron-hole transition across the interlayer is observed to be dominant at room temperature for high excitation conditions. (c) 2007 WILEYNCH Verlag GmbH & Co. KGaA, Weinheim.
|
|
18. |
- Monemar, Bo, et al.
(author)
-
Optical characterization of III-nitrides
- 2002
-
Conference paper (peer-reviewed)abstract
- Recent developments in material properties of GaN and related heterostructure combinations are reviewed, with emphasis on optical data. We discuss recent polarized photoluminescence (PL) data on the free excitons in GaN, obtained from thick HVPE grown layers. The exchange splitting constant is found to be about 0.6 meV, a more accurate value than previous suggestions. The PL signatures of shallow donors and acceptors, i.e. the bound excitons, are discussed and tentatively identified. Intrinsic point defects are discussed in terms of stability and experimental signatures. Quantum well structures in the InGaN/GaN and GaN/AlGaN systems are briefly discussed, with emphasis on localization of carriers and excitons. © 2002 Published by Elsevier Science B.V.
|
|
19. |
- Monemar, Bo, et al.
(author)
-
Time-resolved spectroscopy of excitons bound at shallow neutral donors in HVPE GaN
- 2006
-
In: Physica. B, Condensed matter. - : Elsevier BV. - 0921-4526 .- 1873-2135. ; 376, s. 482-485
-
Journal article (peer-reviewed)abstract
- Time-resolved photo luminescence (TRPL) data for temperatures 2-150 K are presented for two thick HVPE samples grown in two different laboratories. The samples both have residual O and Si shallow donor concentrations in the 10(16)cm(-3) range. The radiative decay time for neutral donor-bound excitons (DBEs) related to these donors is found to be about 300 ps. The decay of the DBEs at longer decay times is found to be related to feeding from the free exciton-polariton states. At elevated temperatures the decay of the DBE is very similar to the free exciton decay. (c) 2006 Elsevier B.V. All rights reserved.
|
|
20. |
|
|
21. |
- Paskov, Plamen, et al.
(author)
-
Auger processes in InAs self-assembled quantum dots
- 2000
-
In: Physica. E, Low-Dimensional systems and nanostructures. - 1386-9477 .- 1873-1759. ; 6:1, s. 440-443
-
Journal article (peer-reviewed)abstract
- An experimental evidence of Auger-like excitation processes in InAs/GaAs quantum dots is demonstrated. Photoluminescence spectra of resonantly excited dots exhibit a rich satellite structure below the ground-state emission band. The energy position and the intensity distribution of the satellites are analyzed and an interpretation of the satellites as due to shake-up processes of the interacting careers in the higher quantum dot states is suggested.
|
|
22. |
- Paskov, Plamen, et al.
(author)
-
Magnetoluminescence of highly excited InAs/GaAs self-assembled quantum dots
- 2000
-
In: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 62:11, s. 7344-7349
-
Journal article (peer-reviewed)abstract
- We present magnetoluminescence measurements of InAs/GaAs self-assembled quantum dots (QD's) at different excitation intensities. By applying high excitation intensities, the magnetic field evolution of the excited-state emission of QD's is revealed. A splitting of the states with a nonzero magnetic momentum is observed and the in-plane reduced electron-hole mass is determined. The experimental value is found to be in a good agreement with the theoretical predictions based on the eight-band k·p model including both strain effect and band nonparabolicity. The density dependence of the diamagnetic shift of the ground-state emission is also studied providing evidence for screening of the Coulomb interaction in QD's.
|
|
23. |
- Paskov, Plamen, 1959-, et al.
(author)
-
Optical properties of nonpolar a-plane GaN layers
- 2006
-
In: Superlattices and Microstructures. - : Elsevier BV. - 0749-6036 .- 1096-3677. ; 40:4-6 SPEC. ISS., s. 253-261
-
Journal article (peer-reviewed)abstract
- We have studied optical properties of nonpolar a-plane GaN layers grown on r-plane sapphire by metalorganic chemical vapor deposition and hydride vapor phase epitaxy using different nucleation schemes. Several emission bands, which are not typical for c-plane GaN, are observed in the photoluminescence spectra and their excitation-intensity, temperature, and polarization dependencies are examined. In addition, the spatial distribution of the emissions was examined by cathodoluminescence imaging and relations of the different emissions with particular structural features in the layers are revealed. The results are discussed with emphasis on the origin of the emission line and particular recombination mechanisms. © 2006 Elsevier Ltd. All rights reserved.
|
|
24. |
- Paskov, Plamen, 1959-, et al.
(author)
-
Optical up-conversion processes in InAs quantum dots
- 2000
-
In: the 25th International Conference on the Physics of Semiconductors ICPS-25,2000. ; , s. 2080-2083
-
Conference paper (peer-reviewed)abstract
- Up-converted photoluminescence (UPL) in InAs/GaAs self-assembled quantum dots (QDs) is reported. With a resonant excitation of QDs we observe an efficient emission from the GaAs barrier. The excitation spectrum of the UPL shows that the signal disappears if the excitation energy is tuned below the absorption band of the QDs. The intensity of UPL exhibits an almost quadratic dependence on the excitation intensity. The observed effect is explained by a two-step two-photon absorption process involving quantum dot states as intermediate states.
|
|
25. |
- Paskov, Plamen, 1959-, et al.
(author)
-
Optical up-conversion processes in InAs quantum dots
- 2001
-
In: Japanese Journal of Applied Physics. - 0021-4922 .- 1347-4065. ; 40:3 B, s. 2080-2083
-
Journal article (peer-reviewed)abstract
- Up-converted photoluminescence (UPL) in InAs/GaAs self-assembled quantum dots (QDs) is reported. With a resonant excitation of QDs we observe an efficient emission from the GaAs barrier. The excitation spectrum of the UPL shows that the signal disappears if the excitation energy is tuned below the absorption band of the QDs. The intensity of UPL exhibits an almost quadratic dependence on the excitation intensity. The observed effect is explained by a two-step two-photon absorption process involving quantum dot states as intermediate states. ⌐ 2001 The Japan Society of Applied Physics.
|
|