1. |
- Hedegaard, Jakob, et al.
(author)
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Comprehensive Transcriptional Analysis of Early-Stage Urothelial Carcinoma
- 2016
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In: Cancer Cell. - : Elsevier BV. - 1535-6108 .- 1878-3686. ; 30:1, s. 27-42
-
Journal article (peer-reviewed)abstract
- Non-muscle-invasive bladder cancer (NMIBC) is a heterogeneous disease with widely different outcomes. We performed a comprehensive transcriptional analysis of 460 early-stage urothelial carcinomas and showed that NMIBC can be subgrouped into three major classes with basal-and luminal-like characteristics and different clinical outcomes. Large differences in biological processes such as the cell cycle, epithelial-mesenchymal transition, and differentiation were observed. Analysis of transcript variants revealed frequent mutations in genes encoding proteins involved in chromatin organization and cytoskeletal functions. Furthermore, mutations in well-known cancer driver genes (e.g., TP53 and ERBB2) were primarily found in high-risk tumors, together with APOBEC-related mutational signatures. The identification of subclasses in NMIBC may offer better prognostication and treatment selection based on subclass assignment.
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2. |
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3. |
- Aine, Mattias, et al.
(author)
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Molecular analyses of triple-negative breast cancer in the young and elderly
- 2021
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In: Breast cancer research : BCR. - : Springer Science and Business Media LLC. - 1465-5411 .- 1465-542X. ; 23:1
-
Journal article (peer-reviewed)abstract
- BACKGROUND: Breast cancer in young adults has been implicated with a worse outcome. Analyses of genomic traits associated with age have been heterogenous, likely because of an incomplete accounting for underlying molecular subtypes. We aimed to resolve whether triple-negative breast cancer (TNBC) in younger versus older patients represent similar or different molecular diseases in the context of genetic and transcriptional subtypes and immune cell infiltration.PATIENTS AND METHODS: In total, 237 patients from a reported population-based south Swedish TNBC cohort profiled by RNA sequencing and whole-genome sequencing (WGS) were included. Patients were binned in 10-year intervals. Complimentary PD-L1 and CD20 immunohistochemistry and estimation of tumor-infiltrating lymphocytes (TILs) were performed. Cases were analyzed for differences in patient outcome, genomic, transcriptional, and immune landscape features versus age at diagnosis. Additionally, 560 public WGS breast cancer profiles were used for validation.RESULTS: Median age at diagnosis was 62 years (range 26-91). Age was not associated with invasive disease-free survival or overall survival after adjuvant chemotherapy. Among the BRCA1-deficient cases (82/237), 90% were diagnosed before the age of 70 and were predominantly of the basal-like subtype. In the full TNBC cohort, reported associations of patient age with changes in Ki67 expression, PIK3CA mutations, and a luminal androgen receptor subtype were confirmed. Within DNA repair deficiency or gene expression defined molecular subgroups, age-related alterations in, e.g., overall gene expression, immune cell marker gene expression, genetic mutational and rearrangement signatures, amount of copy number alterations, and tumor mutational burden did, however, not appear distinct. Similar non-significant associations for genetic alterations with age were obtained for other breast cancer subgroups in public WGS data. Consistent with age-related immunosenescence, TIL counts decreased linearly with patient age across different genetic TNBC subtypes.CONCLUSIONS: Age-related alterations in TNBC, as well as breast cancer in general, need to be viewed in the context of underlying genomic phenotypes. Based on this notion, age at diagnosis alone does not appear to provide an additional layer of biological complexity above that of proposed genetic and transcriptional phenotypes of TNBC. Consequently, treatment decisions should be less influenced by age and more driven by tumor biology.
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4. |
- Almazidou, Maria, et al.
(author)
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Maria-mottagningarna i Stockholm, Göteborg och Malmö - Ungdomar i öppenvård år 2013
- 2014
-
Reports (other academic/artistic)abstract
- Trestad2 är en nationell satsning där de tre städerna Stockholm, Göteborg och Malmö samarbetar för att minska användandet av cannabis bland ungdomar. Inom ramen för projektet har det skapats en modell för att identifiera och följa trender i de tre storstäderna vad gäller droganvändning och psykosocial situation för ungdomar som påbörjar behandling för missbruksproblem. Framtagandet av relevanta indikatorer har skett i nära samarbete mellan praktiker och forskare utifrån en sammanvägning av forskningsmässiga, metodologiska och kliniskt betydelsefulla utgångspunkter. Underlaget utgörs av uppgifter om 788 ungdomar som inledde öppenvårdsbehandling vid någon av städernas Maria-mottagningar under år 2013 och har inhämtats med intervjumetoden UngDOK.Sammanställningen av indikatorer visar att flickor utgör cirka en fjärdedel av det totala antalet ungdomar som påbörjar öppenvård för problem med alkohol eller narkotika. Ungdomarnas medianålder när vårdkontakten inleds är 17 år och mer än hälften av ungdomarna har kommit i kontakt med Maria-mottagningarna via eget eller nätverkets initiativ. Nästan två tredjedelar av ungdomarna uppger att de har eller har haft omfattande problem under sin skolgång och cirka en tiondel av ungdomarna varken studerar, arbetar eller praktiserar. Drygt tre fjärdedelar av ungdomarna anger cannabis som sin primära drog, men nästan hälften av dem har även en riskfylld alkoholkonsumtion. Den genomsnittliga debutåldern för den primära drogen är 15 år. Ungefär en fjärdedel av ungdomarna har tidigare fått vård och behandling för alkohol- eller narkotikaproblem. Förekomsten av besvärliga uppväxtvillkor är hög hos ungdomarna och över hälften av dem har erfarenheter av att ha växt upp med våld, psykiska problem och/eller missbruk i familjen. Drygt en tredjedel av samtliga ungdomar har eller har haft kontakt med den psykiatriska vården.Vissa skillnader mellan de tre städernas Maria-mottagningar kan identifieras. Ungdomarna som påbörjar kontakt med mottagningen i Stockholm verkar ha problem av något lindrigare art jämfört med Göteborg och Malmö och utgör mindre andelar både när det gäller komplicerande bakgrundsfaktorer och nuvarande problembeteenden. Det finns även mindre skillnader i åldersstrukturen i de tre städerna, där Stockholm har fler ungdomar under 18 år medan både Göteborg och Malmö har fler som är över 18 år. Det finns även vissa könsskillnader genom att flickorna i samtliga tre städer tycks ha en tyngre problematik i jämförelse med pojkarna. Flickorna saknar i högre grad sysselsättning, anger oftare problem i skolan, har haft svårare uppväxtvillkor och har i större utsträckning haft kontakt med psykiatrin i jämförelse med pojkarna.Att sammanställa och rapportera deskriptiva indikatorer om individer som påbörjar behandling för alkohol- och narkotikaproblem kan ha flera fördelar. En sådan är att informationen kan ligga till grund för en ökad förståelse av ungdomars alkohol- och narkotikaanvändning och dess omfattning. Även om rapportens uppgifter inte är heltäckande, beskriver den en större population av svenska ungdomar med en problematisk användning av alkohol och droger. Föreliggande rapport är således en första ansats till att ge en sammanfattande bild av de ungdomar som påbörjar behandling vid Maria-mottagningarnas öppenvård i Stockholm, Göteborg och Malmö.
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5. |
- Andersson, Anna, et al.
(author)
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Gene expression profiling of leukemic cell lines reveals conserved molecular signatures among subtypes with specific genetic aberrations
- 2005
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In: Leukemia. - : Springer Science and Business Media LLC. - 1476-5551 .- 0887-6924. ; 19:6, s. 1042-1050
-
Journal article (peer-reviewed)abstract
- Hematologic malignancies are characterized by fusion genes of biological/clinical importance. Immortalized cell lines with such aberrations are today widely used to model different aspects of leukemogenesis. Using cDNA microarrays, we determined the gene expression profiles of 40 cell lines as well as of primary leukemias harboring 11q23/MLL rearrangements, t(1;19)[TCF3/PBX1], t(12;21)[ETV6/RUNX1], t(8;21)[RUNX1/CBFA2T1], t(8;14) [IGH@/MYC], t(8;14)[TRA@/MYC], t(9;22)[BCR/ABL1], t(10;11) [PICALM/MLLT10], t(15;17)[PML/RARA], or inv(16)[CBFB/MYH11]. Unsupervised classification revealed that hematopoietic cell lines of diverse origin, but with the same primary genetic changes, segregated together, suggesting that pathogenetically important regulatory networks remain conserved despite numerous passages. Moreover, primary leukemias cosegregated with cell lines carrying identical genetic rearrangements, further supporting that critical regulatory pathways remain intact in hematopoietic cell lines. Transcriptional signatures correlating with clinical subtypes/primary genetic changes were identified and annotated based on their biological/molecular properties and chromosomal localization. Furthermore, the expression profile of tyrosine kinase-encoding genes was investigated, identifying several differentially expressed members, segregating with primary genetic changes, which may be targeted with tyrosine kinase inhibitors. The identified conserved signatures are likely to reflect regulatory networks of importance for the transforming abilities of the primary genetic changes and offer important pathogenetic insights as well as a number of targets for future rational drug design.
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6. |
- Astromskas, Gvidas, et al.
(author)
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Temperature dependence of GaSb overgrowth of tungsten on GaSb (001) substrates using MOVPE
- 2008
-
In: 20th International Conference on Indium Phosphide and Related Materials, 2008. IPRM 2008. - 1092-8669. ; , s. 354-356
-
Conference paper (peer-reviewed)abstract
- We demonstrate GaSb overgrowth over tungsten patterns and that selective area epitaxy is achievable in the W/GaSb system. By controlling the facet growth at low temperatures, it is possible to embed a metal grating in a thin layer.
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7. |
- Astromskas, Gvidas, et al.
(author)
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Thin InAs membranes and GaSb buffer layers on GaAs(001) substrates
- 2012
-
In: Journal of Vacuum Science and Technology B. - : American Vacuum Society. - 1520-8567. ; 30:5
-
Journal article (peer-reviewed)abstract
- Thin InAs layers and membranes are fabricated on GaAs substrates using GaSb buffer layers grown by MOVPE. The quality of the GaSb buffer layers is optimized and epitaxial InAs layers are grown on GaSb layers of various thickness. The best GaSb buffer layers are obtained for a nucleation temperature of 450 degrees C and a subsequent growth temperature of 570 degrees C with a V/III ratio of 3, as confirmed by both the structural (high-resolution XRD, AFM) and electrical (Hall) measurements. Furthermore, a clear relationship between the structural quality of the GaSb and InAs layers is established. Finally, free-standing InAs structures are fabricated where Hall measurements reveal a mobility that depends on the film thickness.
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8. |
- Athle, Robin, et al.
(author)
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Effects of TiN Top Electrode Texturing on Ferroelectricity in Hf1-xZrxO2
- 2021
-
In: ACS applied materials & interfaces. - : American Chemical Society (ACS). - 1944-8244 .- 1944-8252. ; 13:9, s. 11089-11095
-
Journal article (peer-reviewed)abstract
- Ferroelectric memories based on hafnium oxide are an attractive alternative to conventional memory technologies due to their scalability and energy efficiency. However, there are still many open questions regarding the optimal material stack and processing conditions for reliable device performance. Here, we report on the impact of the sputtering process conditions of the commonly used TiN top electrode on the ferroelectric properties of Hf1-xZrxO2. By manipulating the deposition pressure and chemistry, we control the preferential orientation of the TiN grains between (111) and (002). We observe that (111) textured TiN is superior to (002) texturing for achieving high remanent polarization (Pr). Furthermore, we find that additional nitrogen supply during TiN deposition leads to >5× greater endurance, possibly by limiting the scavenging of oxygen from the Hf1-xZrxO2 film. These results help explain the large Pr variation reported in the literature for Hf1-xZrxO2/TiN and highlights the necessity of tuning the top electrode of the ferroelectric stack for successful device implementation.
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9. |
- Athle, Robin, et al.
(author)
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Ferroelectric Tunnel Junction Memristors for In-Memory Computing Accelerators
-
In: Advanced Intelligent Systems. - 2640-4567.
-
Journal article (peer-reviewed)abstract
- Neuromorphic computing has seen great interest as leaps in artificial intelligence (AI) applications have exposed limitations due to heavy memory access, with the von Neumann computing architecture. The parallel in-memory computing provided by neuromorphic computing has the potential to significantly improve latency and power consumption. Key to analog neuromorphic computing hardware are memristors, providing non-volatile multistate conductance levels, high switching speed, and energy efficiency. Ferroelectric tunnel junction (FTJ) memristors are prime candidates for this purpose, but the impact of the particular characteristics for their performance upon integration into large crossbar arrays, the core compute element for both inference and training in deep neural networks, requires close investigation. In this work, a W/HfxZr1−xO2/TiN FTJ with 60 programmable conductance states, a dynamic range (DR) up to 10, current density >3 A m−2 at V read = 0.3 V and highly nonlinear current–voltage (I–V) characteristics (>1100) is experimentally demonstrated. Using a circuit macro-model, the system level performance of a true crossbar array is evaluated and a 92% classification accuracy of the modified nation institute of science and technology (MNIST) dataset is achieved. Finally, the low on conductance in combination with the highly nonlinear I–V characteristics enable the realization of large selector-free crossbar arrays for neuromorphic hardware accelerators.
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10. |
- Athle, Robin, et al.
(author)
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Impact of Temperature-Induced Oxide Defects on HfxZr1−xO2 Ferroelectric Tunnel Junction Memristor Performance
- 2023
-
In: IEEE Transactions on Electron Devices. - 0018-9383. ; 70:3, s. 1412-1416
-
Journal article (peer-reviewed)abstract
- In this work, we evaluate the importance of the postmetallization annealing (PMA) temperature on the performance of HfxZr1−xO2-based ferroelectric tunnel junctions (FTJs). Our results indicate a significant difference in tunneling electroresistance (TER) ratio and endurance, depending on the PMA temperature despite negligible variations in remanent polarization. We conclude that the minimization of conductive oxide defect states is central to achieve high performance. Through carefully optimized PMA conditions, we demonstrate FTJs with a TER = 3 and low mean cycle-to-cycle variation of < 1.5% combined with at least 16 separable conductance states providing a 4-bit resolution analog FTJ.
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11. |
- Athle, Robin, et al.
(author)
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Improved Endurance of Ferroelectric HfxZr1–xO2 Integrated on InAs Using Millisecond Annealing
- 2022
-
In: Advanced Materials Interfaces. - : Wiley. - 2196-7350. ; 9:27
-
Journal article (peer-reviewed)abstract
- Ferroelectric HfxZr1–xO2 (HZO) is typically achieved by crystallization of an amorphous thin film via rapid thermal processing (RTP) at time scales of seconds to minutes. For integration on III–V semiconductors, this approach can severely degrade the sensitive HZO/III–V interface. To evaluate whether a reduced thermal budget can improve the interface quality, millisecond duration thermal anneals are utilized using a flash lamp annealer (FLA) on HZO/InAs capacitors. Through thorough electrical characterization such as polarization hysteresis, endurance, and capacitance-voltage measurements, as well as synchrotron-based chemical interface characterization, the FLA and RTP treatments are compared and the FLA results are found in lower interface defect density and higher endurance, but also have generally lower remanent polarization (Pr) compared to RTP. Additionally, ways to achieve high Pr and low interface defect density using multiple lower energy flashes, as well as by pre-crystallization during the ALD growth step are investigated. Using FLA, Pr exceeding 20 µC cm−2 is achieved, with extended endurance properties compared to RTP treatment and a considerably decreased defect density, indicative of a higher quality HZO/InAs interface. This work presents valuable insight into the successful integration of ferroelectric HZO on low thermal budget III–V semiconductors.
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12. |
- Athle, Robin, et al.
(author)
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Top Electrode Engineering for Freedom in Design and Implementation of Ferroelectric Tunnel Junctions Based on Hf1- xZrxO2
- 2022
-
In: ACS Applied Electronic Materials. - : American Chemical Society (ACS). - 2637-6113. ; 4:3, s. 1002-1009
-
Journal article (peer-reviewed)abstract
- Ferroelectric tunnel junctions (FTJs) based on ultrathin HfO2 have great potential as a fast and energy-efficient memory technology compatible with complementary metal oxide semiconductors. FTJs consist of a ferroelectric film sandwiched between two distinct electrodes, the properties of which are intricately linked to the electrical properties of the FTJs. Here we utilize a W crystallization electrode (CE) to achieve a high and reproducible remanent polarization, combined with a metal replacement process in which the W is carefully removed and replaced by another top electrode (TE). In this way we separate the ferroelectric film properties from the device design and can thereby evaluate the effect of the TE work function (WF) and conduction band electron density (ne) on the tunneling electroresistance (TER) and device reliability. We compare FTJs designed with a TiN bottom electrode and W, Cr, or Ni TE and find that the use of high electron density metals such as Ni or Cr as TE allows for an improved TER, albeit at the cost of reliability due to a large built-in electric field. To bypass this effect, a bilayer Cr/Ni TE is implemented, which allows for a high TER and minimal built-in field, leading to excellent retention and endurance beyond 108 cycles. The results presented here thus highlight a process flow for reliable design and implementation of FTJs.
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13. |
- Berdnikov, Yury, et al.
(author)
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Broadening of length distributions of Au-catalyzed InAs nanowires
- 2016
-
In: State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2016: Proceedings of the 5th International Conference "State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects". - : Author(s). - 9780735414051 ; 1748
-
Conference paper (peer-reviewed)abstract
- We investigate kinetic broadening effects on the length distributions of gold-catalyzed InAs nanowires having different diameters. It is shown that the length distributions acquire bimodal shape when the longest nanowires exceed the diffusion length of indium adatoms on the nanowire sidewalls. Later on, the length distributions recover unimodal shapes. We develop a theoretical model that is capable of describing the observed behaviors by accounting for the diffusion-induced character of the vapor-liquid-solid growth.
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14. |
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15. |
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16. |
- Borg, Mattias
(author)
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Antimonide Heterostructure Nanowires - Growth, Physics and Devices
- 2012
-
Doctoral thesis (other academic/artistic)abstract
- Abstract in UndeterminedThis thesis investigates the growth and application of antimonide heterostructure nanowires for low-power electronics. In the first part of the thesis, GaSb, InSb and InAsSb nanowire growth is presented, and the distinguishing features of the growth are described. It is found that the presence of Sb results in more than 50 at. % group-III concentration in the Au seed particle on top of the nanowires. It is further concluded that the effective V/III ratio inside the seed particle is reduced compared to the outside. This enables the suppression of radial growth with remaining high axial growth rate. Furthermore, the low effective V/III ratio may affect the crystal structure formation, which is pure Zinc-blende in all investigated Sb-based nanowires. The strong segregating properties of Sb results in a strong Sb memory effect, and a difficulty to nucleate Sb-based nanowires directly on substrates.The second part of the thesis deals with the growth and application of GaSb/InAs(Sb) nanowires for tunnel device applications. The GaSb/InAs(Sb) nanowire heterojunction has a defect-free crystal structure with an extremely abrupt heterojunction due to an inherent delay before the initiation of InAs(Sb) growth. The Sb carry-over from the GaSb growth step into the InAs growth leads to a high Sb background in the InAs(Sb) segment. The diameter of the heterojunction can be reduced below 30 nm by an in-situ annealing treatment, in which material is selectively etched from the region near the heterojunction.The performance of GaSb/InAs(Sb) tunnel diodes is modeled and measured on fabricated single nanowire devices. The diodes exhibit peak current levels of 67 kA/cm^{2} , peak-to-valley current ratio between 2 and 3 at room temperature and a tunnel current at V_{D} = -0.5 V of 1.7 MA/cm^{2} . The expected performance of GaSb/InAs(Sb) tunnel field-effect transistors is discussed and preliminary measurement data on top-gated devices with 300 nm gate length is also presented.
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17. |
- Borg, Mattias, et al.
(author)
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Autonomy in PhD-education – Supervising for Independence
- 2016
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In: LTHs 9:e Pedagogiska Inspirationskonferens. ; , s. 9-13
-
Conference paper (peer-reviewed)abstract
- According to the Swedish higher ordinance of education the development of autonomy of PhD students is of high importance. Graduates should be able to formulate new ideas and to independently assess and evaluate scientific results. Therefore it is interesting to investigate how the relationship between student and supervisor impacts the development of autonomy. In this work, we have evaluated the impact of the supervision relationship by a supervisor/studentalignment test (N=25) where both students and their supervisors perform a self-evaluation of the student’s level of autonomy and the supervisor’s supervision style. The test results show that the autonomy is greater for students with longer experience and also more aligned with the level of autonomy as perceived by their supervisors. The misalignment between the assessment done by students and supervisors decreases with age and time spent as a PhD student. However, we find that the misalignment increases when supervisors have many concurrent PhD students. We observe no statistical differences with respect to gender or nationality.
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18. |
- Borg, Mattias, et al.
(author)
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Characterization of GaSb nanowires grown by MOVPE
- 2008
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In: Journal of Chrystal Growth. - : Elsevier BV. - 0022-0248. ; 310:23, s. 5119-5122
-
Conference paper (peer-reviewed)abstract
- We report the growth and characterization of GaSb nanowires grown by MOVPE. The structural properties of the nanowires are investigated by the means of transmission electron microscopy, X-ray diffraction and single nanowire photoluminescence. The measurements confirm a high material quality in the GaSb nanowires. Also, a back-gated nanowire transistor structure is used to extract values for the polarity and resistivity of the GaSb. Finally, a simple kinetic model is presented to explain the non-linear time dependence of the GaSb nanowire growth. (C) 2008 Elsevier B.V. All rights reserved.
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19. |
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20. |
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21. |
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22. |
- Borg, Mattias, et al.
(author)
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Enhanced Sb incorporation in InAsSb nanowires grown by metalorganic vapor phase epitaxy
- 2011
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In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 98:11
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Journal article (peer-reviewed)abstract
- We demonstrate metalorganic vapor phase epitaxy of InAs1-xSbx nanowires (x=0.08-0.77) for applications in high-speed electronics and long-wavelength optical devices. The composition of the InAsSb nanowires and InAsSb epilayers on the same sample is independently determined using lab-setup high resolution x-ray diffraction, by making use of the size-dependent in-plane broadening of the nanowire Bragg peak. We find that the incorporation of Sb into the nanowires is significantly higher than for planar epitaxy under the same growth conditions. Thermodynamic calculations indicate that this is due to a dramatically decreased effective V/III ratio at the particle/nanowire interface. (C) 2011 American Institute of Physics. (C) [doi: 10.1063/1.3566980]
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23. |
- Borg, Mattias, et al.
(author)
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Facet-selective group-III incorporation in InGaAs template assisted selective epitaxy
- 2019
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In: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 30:8
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Journal article (peer-reviewed)abstract
- InGaAs is a potential candidate for Si replacement in upcoming advanced technological nodes because of its excellent electron transport properties and relatively low interface defect density in dielectric gate stacks. Therefore, integrating InGaAs devices with the established Si platforms is highly important. Using template-assisted selective epitaxy (TASE), InGaAs nanowires can be monolithically integrated with high crystal quality, although the mechanisms of group III incorporation in this ternary material have not been thoroughly investigated. Here we present a detailed study of the compositional variations of InGaAs nanostructures epitaxially grown on Si(111) and Silicon-on-insulator substrates by TASE. We present a combination of XRD data and detailed EELS maps and find that the final Ga/In chemical composition depends strongly on both growth parameters and the growth facet type, leading to complex compositional sub-structures throughout the crystals. We can further conclude that the composition is governed by the facet-dependent chemical reaction rates at low temperature and low V/III ratio, while at higher temperature and V/III ratio, the incorporation is transport limited. In this case we see indications that the transport is a competition between Knudsen flow and surface diffusion.
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24. |
- Borg, Mattias, et al.
(author)
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GaAs/GaSb nanowire heterostructures grown by MOVPE
- 2008
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In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248. ; 310:18, s. 4115-4121
-
Journal article (peer-reviewed)abstract
- We report Au-assisted growth of GaAs/GaSb nanowire heterostructures on GaAs(1 1 1)B-substrates by metal-organic vapor phase epitaxy. The growth is studied at various precursor molar fractions and temperatures, in order to optimize the growth conditions for the GaSb nanowire segment. In contrast to most other III-V nanowire systems, the GaSb nanowire growth is Group V-limited under most conditions. We found that depending on the TMSb molar fraction, the seed particle is either supersaturated AuGa or AuGa2 during GaSb growth. The high Ga content in the particle gives a characteristic diameter increase between the GaAs and GaSb segment. From TEM and XEDS measurements we conclude that the GaSb nanowire growth occurs along either the AuGa-GaSb or AuGa2-GaSb pseudo-binaries of the Au-Ga-Sb ternary phase diagram. Finally, the GaSb nanowires exhibit untapered radial growth on the {1 (1) over bar 0} side facets. (C) 2008 Elsevier B.V. All rights reserved.
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25. |
- Borg, Mattias, et al.
(author)
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Geometric model for metalorganic vapour phase epitaxy of dense nanowire arrays
- 2013
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In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248. ; 366, s. 15-19
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Journal article (peer-reviewed)abstract
- We propose a geometric model to estimate the contribution of substrate surface diffusion to growth of dense nanowire arrays using metalorganic vapour phase epitaxy. It is shown that the nanowire mantle area becomes the most significant collector of growth material when the nanowire diameter is large and the inter-nanowire pitch is small. It is concluded that this growth regime is important for the array geometries typically used for optoelectronic and photovoltaic applications of nanowires. The growth rate under these conditions is also not constant with time, due to the growing nanowire mantle area. This result was confirmed by experiments in which dense arrays of InAs nanowires were grown and the nanowire growth rate was measured as a function of time. (C) 2013 Elsevier B.V. All rights reserved.
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26. |
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27. |
- Borg, Mattias, et al.
(author)
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InAs/GaSb Heterostructure Nanowires for Tunnel Field-Effect Transistors.
- 2010
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In: Nano Letters. - : American Chemical Society (ACS). - 1530-6992 .- 1530-6984. ; 10:Online August 24, 2010, s. 4080-4085
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Journal article (peer-reviewed)abstract
- InAs/GaSb nanowire heterostructures with thin GaInAs inserts were grown by MOVPE and characterized by electrical measurements and transmission electron microscopy. Down-scaling of the insert thickness was limited because of an observed sensitivity of GaSb nanowire growth to the presence of In. By employing growth interrupts in between the InAs and GaInAs growth steps it was possible to reach an insert thickness down to 25 nm. Two-terminal devices show a diode behavior, where temperature-dependent measurements indicate a heterostructure barrier height of 0.5 eV, which is identified as the valence band offset between the InAs and GaSb. Three-terminal transistor structures with a top-gate positioned at the heterointerface show clear indications of band-to-band tunnelling.
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28. |
- Borg, Mattias, et al.
(author)
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Influence of doping on the electronic transport in GaSb/InAs(Sb) nanowire tunnel devices
- 2012
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In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 101:4
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Journal article (peer-reviewed)abstract
- The effect of various doping profiles on the electronic transport in GaSb/InAs(Sb) nanowire tunnel diodes is investigated. Zn-doping of the GaSb segment increases both the peak current density and the current level in reverse bias. Top-gated diodes exhibit peak current modulation with a threshold voltage which can be controlled by Zn-doping the InAs(Sb) segment. By intentionally n-doping the InAs(Sb) segment degenerate doping on both sides of the heterojunction can be achieved, as well as tunnel diodes with peak current of 420 kA/cm(2) at V-DS = 0.16V and a record-high current density of 3.6 MA/cm(2) at V-DS = -0.5V. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4739082]
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29. |
- Borg, Mattias, et al.
(author)
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MOVPE Growth and Structural Characterization of Extremely Lattice-Mismatched InP-InSB Nanowire Heterostructures
- 2009
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In: 2009 IEEE 21st International Conference On Indium Phosphide & Related Materials (IPRM). - 1092-8669. ; , s. 249-252
-
Conference paper (peer-reviewed)abstract
- We present a growth study and structural characterization of InP-InSb nanowire heterostructures. In contrast to planar epitaxy, this heterostructure can be realized in nanowires without the formation of dislocations, despite an extreme lattice-mismatch (10.4%). We obtain high crystal quality in the InSb nanowires, confirmed by a narrow 111 reflection peak measured by XRD. Additionally, the diameter dependence of the nanowire growth rate was investigated. An original competition between surface growth and nanowire growth is found, which can be controlled by varying the nanowire surface coverage. Finally, HRTEM and X-EDS investigations reveal that the InSb nanowire is always defect-free zinc-blende, and that the InP-InSb heterointerface is free from misfit dislocations, although single twin planes are common.
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30. |
- Borg, Mattias, et al.
(author)
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Synthesis and properties of antimonide nanowires
- 2013
-
In: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 24:20
-
Research review (peer-reviewed)abstract
- Antimonide semiconductors are suitable for low-power electronics and long-wavelength optoelectronic applications. In recent years research on antimonide nanowires has become a rapidly growing field, and nano-materials have promising applications in fundamental physics research, for tunnel field-effect transistors, and long-wavelength detectors. In this review, we give an overview of the field of antimonide nanowires, beginning with a description of the synthesis of these nano-materials. Here we summarize numerous reports on antimonide nanowire growth, with the aim to give an overall picture of the distinctive properties of antimonide nanowire synthesis. Secondly, we review the data on the physical properties and emerging applications for antimonide nanowires, focusing on applications in electronics and optics.
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31. |
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32. |
- Caroff, Philippe, et al.
(author)
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InAs film grown on Si(111) by Metalorganic Vapor Phase Epitaxy
- 2008
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In: Journal of Physics: Conference Series. - : IOP Publishing. - 1742-6588 .- 1742-6596. ; 100, s. 042017-042017
-
Conference paper (peer-reviewed)abstract
- We report the successful growth of high quality InAs films directly on Si( 111) by Metal Organic Vapor Phase Epitaxy. A nearly mirror-like and uniform InAs film is obtained at 580 C for a thickness of 2 mu m. We measured a high value of the electron mobility of 5100 cm(2)/Vs at room temperature. The growth is performed using a standard two-step procedure. The influence of the nucleation layer, group V flow rate, and layer thickness on the electrical and morphological properties of the InAs film have been investigated. We present results of our studies by Atomic Force Microscopy, Scanning Electron Microscopy, electrical Hall/van der Pauw and structural X-Ray Diffraction characterization.
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33. |
- Caroff, Philippe, et al.
(author)
-
InSb heterostructure nanowires: MOVPE growth under extreme lattice mismatch.
- 2009
-
In: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 20:49
-
Journal article (peer-reviewed)abstract
- We demonstrate the growth of InSb-based nanowire heterostructures by metalorganic vapour phase epitaxy and use it to integrate InSb on extremely lattice-mismatched III-V nanowire templates made of InAs, InP, and GaAs. Influence of temperature, V/III ratio, and diameter are investigated in order to investigate the growth rate and morphology. The range of growth temperatures used for InSb nanowire growth is very similar to that used for planar growth due to the nature of the precursor decomposition. This makes optimization of growth parameters very important, and more difficult than for most other nanowire III-V materials. Analysis of the InSb nanowire epitaxial quality when grown on InAs, InP, and GaAs, along with InSb segment and particle compositions are reported. This successful direct integration of InSb nanowires, on nanowire templates with unprecedented strain levels show great promise for fabrication of vertical InSb devices.
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34. |
- Delker, Collin J., et al.
(author)
-
1/f Noise Sources in Dual-Gated Indium Arsenide Nanowire Transistors
- 2012
-
In: IEEE Transactions on Electron Devices. - 0018-9383. ; 59:7, s. 1980-1987
-
Journal article (peer-reviewed)abstract
- 1/f noise is studied in dual-gated InAs nanowire transistors consisting of an omega top gate with high-k atomic layer deposited dielectric and silicon dioxide to substrate back gate. Noise spectra at varying gate bias combinations are compared from devices with differing top-gate lengths to separate the noise contributions of the top-gated channel from the ungated access portion, including the metal-nanowire contacts. For a given device geometry, it is possible to bias the device into four different regimes where the resistance and the noise amplitude can each be independently dominated by either the channel or the access/contact regions. When the device is fully in the on state, the access/contact regions dominate both resistance and noise. When the device is operating near or below threshold, the channel dominates resistance and noise. For the lowest amount of overall 1/f noise, most of the nanowire should be covered by the top gate, minimizing the access region length.
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35. |
- Dey, Anil, et al.
(author)
-
15 nm diameter InAs nanowire MOSFETs
- 2011
-
In: [Host publication title missing]. - 1548-3770. ; , s. 21-22
-
Conference paper (peer-reviewed)abstract
- InAs is an attractive channel material for III–V nanowire MOSFETs and early prototype high performance nanowire transistors have been demonstrated1. As the gate length is reduced, the nanowire diameter must be scaled quite aggressively in order to suppress short-channel effects2. However, a reduction in transconductance (gm) and drive current (ION) could be expected due to increased surface scattering for thin wires. We present data for the device properties of thin InAs nanowires, with diameters in the 15 nm range, and investigate possible improvements of the performance focusing on transistor applications. In order to boost ION, the source and drain resistance need to be reduced. Several doping sources were therefore evaluated in the study, among them selenium (Se), tin (Sn) and sulphur (S) to form n-i-n structures. We report very high current densities, up to 33 MA/cm2, comparable to modern HEMTs3, and a normalized transconductance of 1.8 S/mm for a nanowire with an intrinsic segment of nominally 150 nm and a diameter of 15 nm.
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36. |
- Dey, Anil, et al.
(author)
-
GaSb nanowire pFETs for III-V CMOS
- 2013
-
In: IEEE Device Research Conference. Proceedings. - 1548-3770. ; , s. 13-14
-
Conference paper (peer-reviewed)
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37. |
- Dey, Anil, et al.
(author)
-
High Current Density InAsSb/GaSb Tunnel Field Effect Transistors
- 2012
-
In: Device research conference. - 1548-3770. ; , s. 205-206
-
Conference paper (peer-reviewed)abstract
- Steep-slope devices, such as tunnel field-effect transistors (TFETs), have recently gained interest due to their potential for low power operation at room temperature. The devices are based on inter-band tunneling which could limit the on-current since the charge carriers must tunnel through a barrier to traverse the device. The InAs/GaSb heterostructure forms a broken type II band alignment which enables inter-band tunneling without a barrier, allowing high on-currents. We have recently demonstrated high current density (Ion,reverse = 17.5 mA/µm) nanowire Esaki diodes and in this work we investigate the potential of InAs/GaSb heterostructure nanowires to operate as TFETs. We present device characterization of InAs 0.85 Sb 0.15 /GaSb nanowire TFETs, which exhibit record-high on-current levels.
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38. |
- Dey, Anil, et al.
(author)
-
High-Current GaSb/InAs(Sb) Nanowire Tunnel Field-Effect Transistors
- 2013
-
In: IEEE Electron Device Letters. - 0741-3106. ; 34:2, s. 211-213
-
Journal article (peer-reviewed)abstract
- We present electrical characterization of GaSb/InAs(Sb) nanowire tunnel field-effect transistors. The broken band alignment of the GaSb/InAs(Sb) heterostructure is exploited to allow for interband tunneling without a barrier, leading to high ON-current levels. We report a maximum drive current of 310 μA/μm at Vds = 0.5 V. Devices with scaled gate oxides display transconductances up to gm = 250 mS/mm at Vds = 300 mV, which are normalized to the nanowire circumference at the axial heterojunction.
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39. |
- Dey, Anil, et al.
(author)
-
High-performance 15 nm diameter InAs nanowire Ω-gate MOSFETs
- 2012
-
Conference paper (peer-reviewed)abstract
- In this paper we present 15 nm InAs nanowire lateral MOSFETs with an Ω-gate. The nanowires are grown from size-selected Au-aerosols by means of metal-organic vapor phase epixtaxy (MOVPE). In order to reduce the source and drain resistances, n-type dopants were introduced in the bottom and top parts of the nanowire forming a n-i-n structure. We report experimental data for 15 nm InAs nanowire MOSFETs, LG = 150 nm, with a normalized transconducatance gm = 0.7 S/mm (normalized to the circumference) and a current density Je = 24 MA/cm, comparable to modern high electron mobility transistors (HEMTs)
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40. |
- Dey, Anil, et al.
(author)
-
High-Performance InAs Nanowire MOSFETs
- 2012
-
In: IEEE Electron Device Letters. - 0741-3106. ; 33:6, s. 791-793
-
Journal article (peer-reviewed)abstract
- In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.
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41. |
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42. |
- Dey, Anil, et al.
(author)
-
Single InAs/GaSb Nanowire Low-Power CMOS Inverter
- 2012
-
In: Nano Letters. - : American Chemical Society (ACS). - 1530-6992 .- 1530-6984.
-
Journal article (peer-reviewed)abstract
- III − V semiconductors have so far predom- inately been employed for n-type transistors in high-frequency applications. This development is based on the advantageous transport properties and the large variety of heterostructure combinations in the family of III − V semiconductors. In contrast, reports on p-type devices with high hole mobility suitable for complementary metal − oxide − semiconductor (CMOS) circuits for low-power operation are scarce. In addition, the di ffi culty to integrate both n- and p-type devices on the same substrate without the use of complex bu ff er layers has hampered the development of III − V based digital logic. Here, inverters fabricated from single n-InAs/p-GaSb hetero- structure nanowires are demonstrated in a simple processing scheme. Using undoped segments and aggressively scaled high- κ dielectric, enhancement mode operation suitable for digital logic is obtained for both types of transistors. State-of-the-art on- and o ff -state characteristics are obtained and the individual long-channel n- and p-type transistors exhibit minimum subthreshold swings of SS = 98 mV/dec and SS = 400 mV/dec, respectively, at V ds = 0.5 V. Inverter characteristics display a full signal swing and maximum gain of 10.5 with a small device-to-device variability. Complete inversion is measured at low frequencies although large parasitic capacitances deform the waveform at higher frequencies.
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43. |
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44. |
- Dick Thelander, Kimberly, et al.
(author)
-
Controlling the Abruptness of Axial Heterojunctions in III-V Nanowires: Beyond the Reservoir Effect
- 2012
-
In: Nano Letters. - : American Chemical Society (ACS). - 1530-6992 .- 1530-6984. ; 12:6, s. 3200-3206
-
Journal article (peer-reviewed)abstract
- Heterostructure nanowires have many potential applications due to the avoidance of interface defects by lateral strain relaxation. However, most heterostructure semiconductor nanowires suffer from persistent interface compositional grading, normally attributed to the dissolution of growth species in the common alloy seed particles. Although progress has been made for some material systems, most binary material combinations remain problematic due to the interaction of growth species in the alloy. In this work we investigate the formation of interfaces in InAs-GaAs heterostructures experimentally and theoretically and demonstrate a technique to attain substantially sharper interfaces. We show that by pulsing the Ga source during heterojunction formation, In is pushed out before GaAs growth initiates, greatly reducing In carry-over. This procedure will be directly applicable to any nanowire system with finite nonideal solubility of growth species in the alloy seed particle and greatly improve the applicability of these structures in future devices.
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45. |
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46. |
- Dubrovskii, Vladimir G., et al.
(author)
-
Length Distributions of Nanowires Growing by Surface Diffusion
- 2016
-
In: Crystal Growth & Design. - : American Chemical Society (ACS). - 1528-7483 .- 1528-7505. ; 16:4, s. 2167-2172
-
Journal article (peer-reviewed)abstract
- We present experimental data on the time and radius-dependent length distributions of Au-catalyzed InAs nanowires grown by metal organic vapor phase epitaxy. We show that these distributions are not as sharp as commonly believed. Rather, they appear to be much broader than Poissonian from the very beginning and spread quickly as the nanowires grow. We develop a model that attributes the observed broadening to the diffusion-induced character of growth. In the initial growth stage, the nanowires are fed from their entire length, leading to a Polya-like length distribution whose standard deviation is proportional to the mean length. After the nanowire length exceeds the adatom diffusion length, the growth acquires a Poissonian character in which the standard deviation scales as a square root of the mean length. We explain why wider nanowires have smaller length dispersion and speculate on the length distributions in Au-catalyzed versus self-catalyzed growth methods.
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47. |
- Egard, Mikael, et al.
(author)
-
60 GHz Wavelet Generator for Impulse Radio Applications
- 2009
-
In: European Microwave Conference, 2009. EuMC 2009. - 9781424447480 ; , s. 1908-1911, s. 234-237
-
Conference paper (peer-reviewed)abstract
- A wavelet generator producing 100 ps short pulses at 60 GHz is presented. The wavelet generator consists of a gated tunnel diode (GTD) integrated in parallel with an inductor. This forms a negative differential conductance (NDC) oscillator with the ability to switch the NDC property on and off, which makes it possible to generate short pulses. In the experiments described, the wavelet generator drives a 50 Omega load and delivers 206 mV(pp) when generating 97 ps short pulses at 60 GHz. It Is demonstrated that it is possible to generate pulses of different length and phase. An explanation of the almost instantaneously startup and decay lapse of the oscillator, including generation of signals with opposite phase, is presented. This novel circuit may find use in ultra-wideband impulse radio communication.
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48. |
- Egard, Mikael, et al.
(author)
-
Frequency Modulation in mm-Wave InGaAs MOSFET/RTD Wavelet Generators
- 2013
-
In: 2013 International Conference on Indium Phosphide and Related Materials (IPRM). - 1092-8669. ; , s. 1-2
-
Conference paper (peer-reviewed)abstract
- Co-integration of an InGaAs MOSFET and an RTD is performed to realize a wavelet generator. The large transconductance of the MOSFET (1.9 mS/mu m) is used to switch the current in an oscillator circuit and coherent wavelets down to 41 ps are generated in the frequency domain of 50 to 100 GHz. The lowest power consumption measured is 1.9 pJ/pulse. It is found that the supply bias can be used to modulate the center frequency of the wavelets.
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49. |
- Egard, Mikael, et al.
(author)
-
High-Frequency Performance of Self-Aligned Gate-Last Surface Channel In0.53Ga0.47As MOSFET
- 2012
-
In: IEEE Electron Device Letters. - 0741-3106. ; 33:3, s. 369-371
-
Journal article (peer-reviewed)abstract
- We have developed a self-aligned L-g = 55 nm In-0.53 Ga-0.47 As MOSFET incorporating metal-organic chemical vapor deposition regrown n(++) In0.6Ga0.4As source and drain regions, which enables a record low on-resistance of 199 Omega mu m. The regrowth process includes an InP support layer, which is later removed selectively to the n(++) contact layer. This process forms a high-frequency compatible device using a low-complexity fabrication scheme. We report on high-frequency measurements showing f(max) of 292 GHz and f(t) of 244 GHz. These results are accompanied by modeling of the device, which accounts for the frequency response of gate oxide border traps and impact ionization phenomenon found in narrow band gap FETs. The device also shows a high drive current of 2.0 mA/mu m and a high extrinsic transconductance of 1.9 mS/mu m. These excellent properties are attributed to the use of a gate-last process, which does not include high temperature or dry-etch processes.
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50. |
- Egard, Mikael, et al.
(author)
-
High Transconductance Self-Aligned Gate-Last Surface Channel In0.53Ga0.47As MOSFET
- 2011
-
In: 2011 IEEE International Electron Devices Meeting (IEDM). - 9781457705052
-
Conference paper (peer-reviewed)abstract
- In this paper we present a 55 nm gate length In0.53Ga0.47As MOSFET with extrinsic transconductance of 1.9 mS/mu m and on-resistance of 199 Omega mu m. T he self-aligned MOSFET is formed using metalorganic chemical vapor deposition regrowth of highly doped source and drain access regions. The fabricated 140 nm gate length devices shows a low subthreshold swing of 79 mV/decade, which is attributed to the described low temperature gate-last process scheme.
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