| 1. |
- Boschker, J. E., et al.
(author)
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In-plane structural order of domain engineered La0.7Sr0.3MnO3 thin films
- 2013
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In: Philosophical Magazine. - : Informa UK Limited. - 1478-6435 .- 1478-6443. ; 93:13, s. 1549-1562
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Journal article (peer-reviewed)abstract
- We present a detailed structural study of tensile-strained La0.7Sr0.3MnO3 thin films. We use the substrate miscut to control the number of rhombohedral variants in the films and study the in-plane order and structural distortions. Using high-resolution X-ray diffraction, we demonstrate that step-edge induced lattice modulations occur in 4-variant films, whereas periodic twinning is the dominant in-plane order for 2-variant films. We show that the in-plane twinning angle is almost completely relaxed. However, the relaxation of shear strain by the out-of-plane twinning angle and the monoclinic distortion is only partial. Furthermore, the film thickness dependence of the domain width reveals that domain formation is a universal mechanism for shear strain relaxation. Finally, we show that the structural response to the transition from the paramagnetic to the ferromagnetic phase of La0.7Sr0.3MnO3 at 345K is smaller in 4-variant films compared to 2-variant films.
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| 2. |
- Grepstad, J. K., et al.
(author)
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As capping of MBE-grown compound semiconductors; novel opportunities to interface science and device fabrication
- 1994
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In: Physica Scripta. - 0031-8949. ; 1994:T54, s. 216-225
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Journal article (peer-reviewed)abstract
- In situ condensation of an amorphous cap of the high vapour pressure element (i.e. As, Sb) has been found to provide effective protection of molecular beam epitaxy grown compound semiconductor surfaces against ambient contamination. Most work reported so far relates to arsenic-capped AlGaAs. Detailed investigation with surface sensitive structural (RHEED, LEED) and chemical (XPS) probes confirms that the protective cap is conveniently removed by annealing in ultrahigh vaccum environments at a temperature in excess of similar 350 °C. Clean AlxGa1-xAs(001) surfaces with different atomic reconstructions and corresponding (Al)Ga: As composition ratios are now routinely prepared by this technique, and thus offers an ideal testing ground for compound semiconductor surface and interface research. Reconstruction-dependent reactivity at metal/GaAs(001) interfaces is demonstrated, using surface sensitive synchrotron radiation photoelectron spectroscopy. Exploiting the protection offered by the As (Sb) cap for device fabrication purposes (e.g. in selective area epitaxy), demands a suitable method of pattern definition in the amorphous arsenic layer. The cap is shown to be chemically stable versus exposure to standard photolithographic processing chemicals, including photoresist, developer, and acetone (the photoresist solvent). However, the temperature required for thermal decapping is grossly inappropriate for photoresist curing. A novel technique of reactive decapping in a beam of hydrogen radicals (H‒) is shown to be effective at room temperature. This innovation makes pattern definition in the As cap compatible with standard photolithography, and test structures with similar 5 μm linewidth is demonstrated. Scanning electron micrographs unveil the presence of arsenic cap residues along the photoresist mask edges. Moreover, trace amounts of surface gallium oxide and carbon impurities were found with core-level photoelectron spectroscopy. The technique thus needs further refinement, before being useful in fabrication of compound semiconductor device structures.
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