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  • Ao, Xianyu, et al. (author)
  • Two-stage design method for realization of photonic bandgap structures with desired symmetries by interference lithography
  • 2004
  • In: Optics Express. - 1094-4087. ; 12:6, s. 978-983
  • Journal article (peer-reviewed)abstract
    • Interference lithography for the fabrication of photonic crystals is considered. A two-stage design method for realization of photonic bandgap structures with desired symmetries is developed. An optimal photonic crystal with a large bandgap is searched by adjusting some parameters while keeping some basic symmetry of the unit cell unchanged. A nonlinear programming method is then used to find the optimal electric field vectors of the laser beams and realize the desired interference pattern. The present method is useful for a rational and systematical design of new photonic bandgap structures.
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Type of publication
journal article (1)
Type of content
peer-reviewed (1)
Author/Editor
Ao, Xianyu (1)
He, Sailing (1)
University
Royal Institute of Technology (1)
Language
English (1)
Research subject (UKÄ/SCB)
Natural sciences (1)
Year
2004 (1)

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