SwePub
Sök i SwePub databas

  Extended search

Träfflista för sökning "id:"swepub:oai:research.chalmers.se:a499f363-14be-481f-a7e8-8397d4f0afff" "

Search: id:"swepub:oai:research.chalmers.se:a499f363-14be-481f-a7e8-8397d4f0afff"

  • Result 1-1 of 1
Sort/group result
   
EnumerationReferenceCoverFind
1.
  • Raeissi, Bahman, 1979, et al. (author)
  • Multiparameter Admittance Spectroscopy as a Diagnostic Tool for Interface States at Oxide/Semiconductor Interfaces
  • 2010
  • In: IEEE Transactions on Electron Devices. - 1557-9646 .- 0018-9383. ; 57:7, s. 1702-1705
  • Journal article (peer-reviewed)abstract
    • Multiparameter admittance spectroscopy (MPAS) measurements have been performed on Al/HfO2/SiOx/Si structures before and after post metallization annealing (PMA). Contour plots of conductance data as a function of the logarithm of inverted signal frequency and applied voltage as obtained by MPAS are compared with standard capacitance versus voltage (C–V) data demonstrating the advantage of MPAS as a diagnostic tool. MPAS reveals more detailed properties of oxide/semiconductor interface states and renders measured data for better perceptiveness.
  •  
Skapa referenser, mejla, bekava och länka
  • Result 1-1 of 1
Type of publication
journal article (1)
Type of content
peer-reviewed (1)
Author/Editor
Engström, Olof, 1943 (1)
Raeissi, Bahman, 197 ... (1)
Piscator, Johan, 197 ... (1)
University
Chalmers University of Technology (1)
Language
English (1)
Research subject (UKÄ/SCB)
Natural sciences (1)
Engineering and Technology (1)
Year
2010 (1)

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Close

Copy and save the link in order to return to this view