11. |
- Yakimova, Rositsa, 1942-, et al.
(author)
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Surface functionalization and biomedical applications based on SiC
- 2007
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In: Journal of Physics D. - 0022-3727 .- 1361-6463. ; 40:20, s. 6435-6442
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Journal article (peer-reviewed)abstract
- The search for materials and systems, capable of operating long term under physiological conditions, has been a strategy for many research groups during the past years. Silicon carbide (SiC) is a material, which can meet the demands due to its high biocompatibility, high inertness to biological tissues and to aggressive environment, and the possibility to make all types of electronic devices. This paper reviews progress in biomedical and biosensor related research on SiC. For example, less biofouling and platelet aggregation when exposed to blood is taken advantage of in a variety of medical implantable materials while the robust semiconducting properties can be explored in surface functionalized bioelectronic devices. © 2007 IOP Publishing Ltd.
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12. |
- Yazdi, Gholamreza, 1966-, et al.
(author)
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Aligned AlN nanowires and microrods by self-patterning
- 2007
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In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 90:12, s. 123103-
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Journal article (peer-reviewed)abstract
- Self-patterned AlN microrods and nanowires were grown on 4H-SiC substrate by a physical vapor transport method. AlN hexagonal pyramids were found to be nucleation sites for the evolution of the observed morphological forms. The average diameter and length of the nanowires are about 200 nm and 90 µm, respectively. The density of microrods corresponds to the concentration of the pyramids, while the nanowires are less compact. Low-temperature cathodoluminescence spectra of microrods show band gap emission of AlN at 208 nm, which confirms that they are AlN single crystals. A formation mechanism of the AlN structures is suggested.
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13. |
- Yazdi, Gholamreza, 1966-, et al.
(author)
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Employing discontinuous and continuous growth modes for preparation of AlN nanostructures on SiC substrates
- 2007
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In: ECSCRM 2006, Newcastle, UK. - : Trans Tech Publications, Switzerland. ; , s. 1031-1034
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Conference paper (peer-reviewed)abstract
- In this report we present results on growth and characterization of AlN wires and thinfilms on SiC substrates. We have employed PVT technique in close space geometry for AlNdeposition on SiC off oriented substrates, most of which were prepared to have scratch-free smoothas-grown surface by SiC sublimation epitaxy. By manipulating the surface kinetics we have beenable to determine growth conditions yielding discontinuous or continuous morphologiescorresponding to nanowires and thin films, respectively. A particular feature of the latterexperiments is the fast temperature ramp up at the growth initiation. The AlN surface morphologywas characterized by optical, AFM and XRD tools, which showed good crystal quality independentof the growth mode.
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14. |
- Yazdi, Gholamreza, 1966-, et al.
(author)
-
Fabrication of free-standing AlN crystals by controlled microrod growth
- 2008
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In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 300:5, s. 935-939
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Journal article (peer-reviewed)abstract
- The aim of this study was to propose a growth procedure for preparation of crack-free thick aluminum nitride (AlN) layers that can be easily separated from the substrate. The overall process is based on the physical vapor transport method employing a seed and a source material. In this case, the substrate is an epitaxial 4H-SiC layer and the growth of AlN is initiated at etch pits formed during the ramp up time prior to establishing growth temperature. Development of hexagonal pyramids on which arrays of microrods are formed is the core of the growth procedure. Free-standing wafers having 10 mm diameter and about 120 μm thick have been fabricated.
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15. |
- Yazdi, Gholamreza, 1966-, et al.
(author)
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Formation of needle-like and columnar structures of AlN
- 2007
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In: Journal of Crystal Growth. - : Elsevier BV. - 0022-0248 .- 1873-5002. ; 300:1, s. 130-135
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Journal article (peer-reviewed)abstract
- The present study focused on understanding the formation of needle-like and columnar structures by investigating the initial nucleation of aluminium nitride (AlN) on SiC substrates with SEM, AFM, and XRD. The grown AlN consisted of high concentration (8×104 cm−2) hexagonal hillocks (HHs) that originate from threading dislocations in the substrate. The KOH etching technique has been used to examine the origin and formation process of HHs and defect reduction in the grown AlN crystals. A model is introduced to explain the AlN HH formation. The SEM result shows that the AlN columnar structure was formed by merging of needles, which are grown exactly on completed AlN HHs, followed by a lateral growth.
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16. |
- Yazdi, Gholamreza, 1966-
(author)
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Growth and Characterization of AlN : From Nano Structures to Bulk Material
- 2008
-
Doctoral thesis (other academic/artistic)abstract
- Aluminum nitride (AlN) exhibits a large direct band gap, 6.2 eV, and is thus suitable forsolid state white-light-emitting devices. It is capable in spintronics because of its high Curietemperature if doped with transition metals. AlN can also be used as a buffer layer for growth ofdevice-grade GaN as well as for application in sensors, surface acoustic wave devices, and hightemperatureelectronics. AlN shows excellent field-emission performance in vacuummicroelectronic devices due to its small electron affinity value, which is from negative to 0.6 eV.In this sense, nanostructured AlN, such as AlN nanowires and nanorods, is important forextending our knowledge on the potential of nanodevice applications. For growth of bulk AlN thesublimation- recondensation (a kind of physical vapor transport growth) method is the mostsuccessful and promising crystal growth technique.In thesis the physical vapor transport (PVT) principle has been implemented for synthesisof AlN on 4H-SiC in sublimation epitaxy close space configuration. It has been shown that theAlN crystal morphology is responsive to the growth conditions given by temperature (1650-1900oC) and nitrogen pressure (200-800 mbar) and each morphology kind (platelet-like, needles, columnar structure, continuous layers, and free-standing quasi bulk material) occurs within anarrow window of growth parameters. Controlled operation conditions for PVT growth of wellaligned perfectly oriented arrays of AlN highly symmetric hexagonal microrods have beenelaborated and the mechanism of microrod formation has been elucidated. Special patterned SiCsubstrates have been created which act as templates for the AlN selective area growth. Themicrorods revealed an excellent feature of boundary free coalescence with growth time,eventually forming ~120 μm thick AlN layer which can be easily detached from the SiC substratedue to a remarkable performance of structural evolution. It was discovered that the locally grownAlN microrods emerge from sharp tipped hexagonal pyramids, which consist of the rare 2H-SiCpolytype and a thin AlN layer on the surface. Two unique consequences appear from the finding,the first is that the 2H-SiC polytype facilitates the nucleation of wurtzite AlN, and the second isthat the bond between the low angle apex of the pyramids and the AlN layer is very week, thusallowing an easy separation to yield free standing wafers. AlN nanowires with an aspect ratioas high as 600 have been grown with a high growth rate. Again, they have perfect alignmentalong the c-axis of the wurtzite structure with small tilt given by the orientation of the SiCsubstrate. The nanowires possess a single crystal structure with high perfection, since neitherdislocations nor stacking faults were revealed.The proposed growth concept can be further explored to enlarge the free standing AlNwafers up to a size provided by commercially available SiC four inch wafers. Also, AlN wafersfabricated by the present method may be used as seeds for large boule growth. AlN nanowires, asobtained in this study, can be used for creating a piezoelectric generator and field emitters withhigh efficiency.
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17. |
- Yazdi, Gholamreza, 1966-, et al.
(author)
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Growth and morphology of AlN crystals
- 2006
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In: Physica Scripta. - 0031-8949 .- 1402-4896. ; T126, s. 127-130
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Journal article (peer-reviewed)abstract
- This study focused on growth dependencies, morphological forms and initial nucleation of aluminium nitride (AlN) crystals. Epitaxial layers of AlN have been grown on 4H-SiC substrates by sublimation recondensation in a radio frequency (RF) heated graphite furnace. Both AlN nuclei size and growth rate increased as temperature was increased and decreased as the pressure was increased. The results of these effects are different kinds of surface morphology. We have observed three modes of AlN single crystals: plate-like, columnar and needle-like. Optical microscopy and scanning electron microscopy (SEM) along with atomic force microscopy (AFM) were used to characterize the crystal surface morphology. Cathodoluminescence (CL) and x-ray diffraction (XRD) were applied to determine crystal quality and crystallographic orientation of the grown crystals.
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18. |
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19. |
- Yazdi, Gholamreza R., 1966-, et al.
(author)
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Defect-free Single Crystal AlN Nanowires by Physical Vapor Transport Growth
-
Other publication (other academic/artistic)abstract
- Growth by vapor-solid mechanism of AlN nanowires with a diameter in the range of 40-500nm and a length reaching 100 μm, resulting in a max aspect ratio of 600, is reported. Theobjects are obtained at 1750 oC and 850 mbar nitrogen pressure on 4H-SiC patternedsubstrates by sublimation epitaxy, which is a version of the physical vapor transport techniqueand provides a high growth rate. The nanowires are hexagonally shaped and perfectly alignedalong the 0001 direction with a small tilt given by the substrate vicinality. It is observed thatunder nitrogen excess a preferential growth along the c-axis of the wurtzite structure takesplace, and switches to lateral growth below some critical value of nitrogen pressure.Investigations by SEM, TEM, CL and Raman spectroscopy measurements were carried out. Itis shown that the nanowires consist of wurtzitic AlN with defect free crystal structure.Possible applications have been depicted.
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