↓ Direkt till sidans innehåll
↓ Direkt till sidans sekundära innehåll (sidomenyn)

Träfflista för sökning "WFRF:(Hahn S. R.) srt2:(1995-1999)"

Search: WFRF:(Hahn S. R.) > (1995-1999)

Result 1-7 of 7

Sort/group result

Sort by: Hits per page:

Enumeration	Reference	Cover	Find
1.	Weber, J, et al. (author) Neutralization serotypes of human immunodeficiency virus type 1 field isolates are not predicted by genetic subtype. The WHO Network for HIV Isolation and Characterization 1996 In: Journal of virology. - 0022-538X. ; 70:11, s. 7827-7832 Journal article (peer-reviewed)
2.	KELLER, R, et al. (author) Pathways of tumour cell killing by activated macrophages: both tumour cell membrane and nucleus can be the primary target 1995 In: Cell death and differentiation. - 1350-9047. ; 2:2, s. 141-150 Journal article (peer-reviewed)
3.	Hahn, H, et al. (author) Mutations of the human homolog of Drosophila patched in the nevoid basal cell carcinoma syndrome 1996 In: Cell. - 0092-8674. ; 85:6, s. 841-851 Journal article (peer-reviewed)
4.	Kammerer, R, et al. (author) Biliary glycoprotein (CD66a), a cell adhesion molecule of the immunoglobulin superfamily, on human lymphocytes: structure, expression and involvement in T cell activation 1998 In: European journal of immunology. - 0014-2980. ; 28:11, s. 3664-3674 Journal article (peer-reviewed)
5.	Hong, J., et al. (author) Plasma chemistries for high density plasma etching of SiC 1999 In: Journal of Electronic Materials. - Charlottesville, VA, USA. - 0361-5235 .- 1543-186X. ; 28:3, s. 196-201 Journal article (peer-reviewed)abstract A variety of different plasma chemistries, including SF6, Cl2, ICI, and IBr, have been examined for dry etching of 6H-SiC in high ion density plasma tools (inductively coupled plasma and electron cyclotron resonance). Rates up to 4500 angstromsÂ·min-1 were obtained for SF6 plasmas, while much lower rates (â‰€800 angstromsÂ·min-1) were achieved with Cl2, ICI, and IBr. The F2-based chemistries have poor selectivity for SiC over photoresist masks (typically 0.4-0.5), but Ni masks are more robust, and allow etch depths â‰¥10 ÎŒm in the SiC. A micromachining process (sequential etch/deposition steps) designed for Si produces relatively low etch rates (<2,000 angstromsÂ·min-1) for SiC.
6.	Mottola, S, et al. (author) Physical model of near-Earth asteroid 6489 Golevka (1991 JX) from optical and infrared observations 1997 In: ASTRONOMICAL JOURNAL. - : AMER INST PHYSICS. - 0004-6256. ; 114:3, s. 1234-1245 Journal article (other academic/artistic)abstract In 1995 asteroid 6489 Golevka (1991 JX) had a close encounter with the Earth at a distance of 0.034 AU, providing a good opportunity for a detailed study of a small Solar System object. In this paper we report the results of an extensive international obs
7.	Mottola, S, et al. (author) The slow rotation of 253 Mathilde 1995 In: PLANETARY AND SPACE SCIENCE. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0032-0633. ; 43:12, s. 1609-1613 Journal article (peer-reviewed)abstract CCD photometry of the NEAR mission fly-by target 253 Mathilde is presented. Measurements taken during 52 nights of observations, from February to June 1995, allow a rotation period of 17.406 +/- 0.010 days and a lightcurve amplitude of 0.45 +/- 0.02 mag t

Skapa referenser, mejla, bekava och länka

Permalink

Result 1-7 of 7

Refine your search

Type of publication: journal article (7)

Type of content: peer-reviewed (6); other academic/artistic (1)

Author/Editor: Hahn, S (2); Mottola, S. (2); Erikson, A. (2); Hahn, G. (2); Harris, AW (2); Albert, J. (1); show more...; Zhang, L. (1); Weber, J. (1); Magnusson, P (1); Gao, F. (1); Kaleebu, P (1); Cho, H. (1); Hong, J (1); Licandro, J. (1); Östling, Mikael (1); Newberry, A (1); Goudsmit, J (1); Holmberg, E. (1); Erb, P (1); Dopazo, J (1); Toftgard, R (1); George, R (1); Piironen, J (1); Korber, B (1); FENYO, EM (1); DEAN, M (1); Gerrard, B (1); Leffell, DJ (1); Goldstein, AM (1); Vorechovsky, I (1); Zaphiropoulos, PG (1); Keller, R (1); Zetterling, Carl-Mik ... (1); Shanley, S (1); von Kleist, S (1); Lagerkvist, CI (1); Nagata, S (1); Holmes, H (1); Esparza, J (1); Unden, AB (1); Bjorndal, A (1); Schlegel, J (1); Pearton, S. J. (1); Mullins, JI (1); Yue, L. (1); Hays, D. C. (1); DAHLGREN, M (1); Lahulla, JF (1); Kwiatkowski, T. (1); Hahn, BH (1); show less...

University: Karolinska Institutet (4); Uppsala University (2); Royal Institute of Technology (1)

Language: English (7)

Research subject (UKÄ/SCB): Natural sciences (2); Engineering and Technology (1)

Year

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

Copyright © LIBRIS - National Library Systems
LIBRIS.kb.se

pil uppåt

Close

Copy and save the link in order to return to this view