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- Eidemüller,, et al.
(author)
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Breast cancer risk among Swedish hemangioma patients and possible consequences of radiation-induced genomic instability.
- 2009
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In: Mutation research. - 0027-5107.
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Journal article (peer-reviewed)abstract
- Breast cancer incidence among 17,158 female Swedish hemangioma patients was analyzed with empirical excess relative risk models and with a biologically-based model of carcinogenesis. The patients were treated in infancy mainly by external application of radium-226. The mean and median absorbed doses to the breast were 0.29 and 0.04Gy, and a total of 678 breast cancer cases have been observed. Both models agree very well in the risk estimates with an excess relative risk and excess absolute risk at the age of 50 years, about the mean age of breast cancer incidence, of 0.25Gy(-1)(95% CI 0.14; 0.37) and 30.7 [Formula: see text] (95% CI 16.9; 42.8), respectively. Models incorporating effects of radiation-induced genomic instability were developed and applied to the hemangioma cohort. The biologically-based description of the radiation risk was significantly improved with a model of genomic instability at an early stage of carcinogenesis.
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| 3. |
- Flink, Axel, et al.
(author)
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Influence of Si on the Microstructure of Arc Evaporated (Ti,Si)N Thin Films : Evidence for Cubic Solid Solutions and their Thermal Stability
- 2005
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In: Surface and Coatings Technology. - : Elsevier BV. - 0257-8972. ; 200:5-6, s. 1535-1542
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Journal article (peer-reviewed)abstract
- Ti1−xSixN (0 ≤ x ≤ 0.14) thin solid films were deposited onto cemented carbide (WC-Co) substrates by arc evaporation. X-ray diffraction and transmission electron microscopy showed that all films were of NaCl-structure type phase. The as-deposited films exhibited a competitive columnar growth mode where the structure transits to a feather-like nanostructure with increasing Si content. Films with 0 ≤ x ≤ 0.01 had a 111 crystallographic preferred orientation which changed to an exclusive 200 texture for 0.05 ≤ x ≤ 0.14. X-ray photoelectron spectroscopy revealed the presence of Si–N bonding, but no amorphous Si3N4. Band structure calculations performed using a full potential linear muffin tin orbital method showed that for a given NaCl-structure Ti1−xSixN solid solution, a phase separation into cubic SiN and TiN is energetically favorable. The microstructure was maintained for the Ti0.86Si0.14N film annealed at 900 °C, while recrystallization in the cubic state took place at 1100 °C annealing during 2 h. The Si content influenced the film hardness close to linearly, by combination of solid-solution hardening in the cubic state and defect hardening. For x = 0 and x = 0.14, nanoindentation gave a hardness of 31.3 ± 1.3 GPa and 44.7 ± 1.9 GPa, respectively. The hardness was retained after annealing at 900 °C, while it decreased to below 30 GPa for 1100 °C following recrystallization and W and Co interdiffusion.
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| 4. |
- Flink, Axel, et al.
(author)
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The location and effects of Si in (Ti1-xSix)N-y thin films
- 2009
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In: JOURNAL OF MATERIALS RESEARCH. - : Springer Science and Business Media LLC. - 0884-2914 .- 2044-5326. ; 24:8, s. 2483-2498
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Journal article (peer-reviewed)abstract
- (Ti1-xSix)N-y (0 andlt;= x andlt;= 0.20; 0.99 andlt;= y(x) andlt;= 1.13) thin films deposited by arc evaporation have been investigated by analytical transmission electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, and nanoindentation. Films with x andlt;= 0.09 are single-phase cubic (Ti,Si)N solid solutions with a dense columnar microstructure. Films with x andgt; 0.09 haven a featherlike microstructure consisting of cubic TiN:Si nanocrystallite bundles separated by metastable SiNz with coherent-to-semicoherent interfaces and a dislocation density of as much as 10(14) cm(-2) is present. The films exhibit retained composition and hardness between 31 and 42 GPa in annealing experiments to 1000 degrees C due to segregation of SiN, to the grain boundaries. During annealing at 1100-1200 degrees C, this tissue phase thickens and transforms to amorphous SiNz. At the same time, Si and N diffuse out of the films via the grain boundaries and TiN recrystallize.
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| 9. |
- Sjölén, Jacob, et al.
(author)
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Structure and mechanical properties of arc evaporated Ti–Al–O–N thin films
- 2007
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In: Surface & Coatings Technology. - : Elsevier BV. - 0257-8972 .- 1879-3347. ; 201:14, s. 6392-6403
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Journal article (peer-reviewed)abstract
- The structure, mechanical properties, and machining performance of arc evaporated Ti–Al–O–N coatings have been investigated for an Al0.66Ti0.34 target composition and O2/(O2+N2) gas flow-ratio varied between 0 to 24%. The coating structure was analysed using SEM, EDX, XRD, XPS, TEM, and STEM. Mechanical properties were analysed using nanoindentation and the deformation behaviour was analysed by probing the nanoindentation craters. The coatings performances in cutting tests were evaluated in a turning application in low carbon steel (DIN Ck45). It is shown that the addition of oxygen into the arc deposition process leads to the formation of a dual layer structure. It consists of an initial cubic NaCl-structure solid solution phase formed closest to the substrate, containing up to 35 at.% oxygen (O/O+N), followed by steady-state growth of a nanocomposite compound layer comprised of Al2O3, AlN, TiN, and Ti(O,N). The addition of oxygen increases the ductility of the coatings, which improves the performances in cutting tests. At high levels of oxygen, (>13 at.%), however, the performance is dramaticallyreduced as a result of increased crater wear.
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