| 1. |
- Korelis, Panagiotis T., et al.
(author)
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Highly amorphous Fe90Zr10 thin films, and the influence of crystallites on the magnetism
- 2010
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In: Thin Solid Films. - : Elsevier BV. - 0040-6090 .- 1879-2731. ; 519:1, s. 404-409
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Journal article (peer-reviewed)abstract
- A method for depositing highly amorphous, iron-rich Fe100-xZrx thin films on to room temperature substrates is presented. The method involves co-depositing Fe and Zr on to an amorphous AlZr layer. Experimental proof that the structures are completely amorphous is given by transmission electron microscopy and polarized neutron reflectometry. The reflectometry measurements also give an indication of the impact that Fe crystallite impurities have on the magnetic structure and properties of amorphous FeZr. The results are consistent with previous investigations on bulk samples, which showed that crystalline impurities make the magnetic structure more non-collinear.
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| 2. |
- Prinz, Jan, et al.
(author)
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Combined light and electron scattering for exploring hydrogen in thin metallic films
- 2010
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In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 97:25, s. 251910-
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Journal article (peer-reviewed)abstract
- We present a method, combining optical transmission with electrical resistance, to study the hydrogen uptake in thin transition metal films. The change in optical transmission is used to determine the hydrogen concentration, while the change in resistance serves as an indicator for the ordering of hydrogen. We identify phase boundaries and regions of high and low orders as well as changes in the ordering temperature. As a demonstration of this approach we compare the hydrogen uptake of 50 and 10 nm single-crystal vanadium films. The ordered phase is found to be extended to higher temperatures in the thinner sample.
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| 3. |
- Soroka, Inna L., et al.
(author)
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Structural stability and oxidation resistance of amorphous Zr-Al alloys
- 2010
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In: Journal of Nuclear Materials. - : Elsevier BV. - 0022-3115 .- 1873-4820. ; 401:1-3, s. 38-45
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Journal article (peer-reviewed)abstract
- We investigated the structural stability and oxidation resistance of Zr-Al films upon annealing in air. The concentration of Zr was varied from 0 to 100 at.%, with a step of 10 at.%. The films were fabricated using ultra-high vacuum based magnetron sputtering. The as-deposited films with Zr content from 17.3 at.% to 70.7 at.% were found to be X-ray amorphous at room temperature. When exposed to air a thin oxide layer, typically less than 6 nm, is formed. The thickness of the oxide layers increases when the samples are annealed in air and most of these are found to be fully oxidized at 700 degrees C with the formation of crystalline and amorphous oxides on the top of crystalline and amorphous metal films, respectively. The amorphous oxide layers are found to be dense, with well defined thicknesses. An experimental non-equilibrium phase diagram is provided, covering the whole concentration range of the Zr-Al system. (C) 2010 Elsevier B.V. All rights reserved.
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