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1.	Macak, K, et al. (author) Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering 1998 In: J Vac Sci Technol A. ; 16:3, s. 1286-1292 Journal article (peer-reviewed)
2.	Olsson, MK, et al. (author) High rate reactive de magnetron sputter deposition of Al2O3 films 1998 In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS. - : AMER INST PHYSICS. - 0734-2101. ; 16:2, s. 639-643 Journal article (other academic/artistic)abstract Aluminum oxide films were produced by reactive de magnetron sputtering of Al in Ar+O-2. The composition of the films was characterized by Rutherford backscattering measurements. Stoichiometric films possessed excellent optical properties with a refractive

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Author/Editor: Helmersson, U (2); Macak, K (2); Nyberg, Tomas (1); Berg, Sören (1); Hjorvarsson, B (1); Macak, P. (1); show more...; Olsson, M K (1); Olsson, MK (1); show less...

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