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Träfflista för sökning "WFRF:(Rorsman Niklas) srt2:(2000-2004)"

Search: WFRF:(Rorsman Niklas) > (2000-2004)

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  • Andersson, Kristoffer, 1976, et al. (author)
  • Resistive SiC-MESFET mixer
  • 2002
  • In: IEEE Microwave and Wireless Components Letters. - : Institute of Electrical and Electronics Engineers (IEEE). - 1531-1309 .- 1558-1764. ; 12:4, s. 119-121
  • Journal article (peer-reviewed)abstract
    • A single-ended silicon carbide resisitve MESFET mixer with minimum conversion loss (CL) of 10.2 dB and an input third order intercept point of 35.7 dB at 3.3 GHz was designed and characterized. A lumped-element, large-signal model was used for modeling the device. The drain-source resistance was measured by taking the real part of the output port impedence. Analysis suggested that the optimum gate bias for minimum CL was -6.7 V.
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  • Dynefors, Kristina, 1977, et al. (author)
  • research and development of SiC Static Induction transistor
  • 2003
  • In: GHz2003 conference, Linköping 2003.
  • Conference paper (other academic/artistic)abstract
    • A fabrication process for SiC Static Induction Transistors (SITs) is developed and tested. Simulated and measured results of the device are presented. The complete fabrication process involves only 5 lithography steps, due to the self-aligned process used for mesa, ohmic contacts and gates. This makes the process fast and minimize the risk of process errors. Only optical lithography is used in the process, why dimensions are not optimised. Mesa widths of 2, 3, 4 and 5 µm are processed. Since the process is scalable, better performance can be expected with smaller widths achieved by the use electron beam lithography. Preliminary results indicate FET operation with a maximum current density of 110 mA/mm.
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  • Lundh, Ros-Marie, et al. (author)
  • Processing of RF-MEMS Switches
  • 2004
  • In: MEMSWAVE, June 30-July 2, 2004, Uppsala, Sweden.
  • Conference paper (peer-reviewed)
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  • Result 1-10 of 15

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