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- Borg, Mattias, et al.
(author)
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InAs/GaSb Heterostructure Nanowires for Tunnel Field-Effect Transistors.
- 2010
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In: Nano Letters. - : American Chemical Society (ACS). - 1530-6992 .- 1530-6984. ; 10:Online August 24, 2010, s. 4080-4085
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Journal article (peer-reviewed)abstract
- InAs/GaSb nanowire heterostructures with thin GaInAs inserts were grown by MOVPE and characterized by electrical measurements and transmission electron microscopy. Down-scaling of the insert thickness was limited because of an observed sensitivity of GaSb nanowire growth to the presence of In. By employing growth interrupts in between the InAs and GaInAs growth steps it was possible to reach an insert thickness down to 25 nm. Two-terminal devices show a diode behavior, where temperature-dependent measurements indicate a heterostructure barrier height of 0.5 eV, which is identified as the valence band offset between the InAs and GaSb. Three-terminal transistor structures with a top-gate positioned at the heterointerface show clear indications of band-to-band tunnelling.
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- Borg, Mattias, et al.
(author)
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Influence of doping on the electronic transport in GaSb/InAs(Sb) nanowire tunnel devices
- 2012
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In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 101:4
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Journal article (peer-reviewed)abstract
- The effect of various doping profiles on the electronic transport in GaSb/InAs(Sb) nanowire tunnel diodes is investigated. Zn-doping of the GaSb segment increases both the peak current density and the current level in reverse bias. Top-gated diodes exhibit peak current modulation with a threshold voltage which can be controlled by Zn-doping the InAs(Sb) segment. By intentionally n-doping the InAs(Sb) segment degenerate doping on both sides of the heterojunction can be achieved, as well as tunnel diodes with peak current of 420 kA/cm(2) at V-DS = 0.16V and a record-high current density of 3.6 MA/cm(2) at V-DS = -0.5V. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4739082]
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- Dey, Anil, et al.
(author)
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High Current Density InAsSb/GaSb Tunnel Field Effect Transistors
- 2012
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In: Device research conference. - 1548-3770. ; , s. 205-206
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Conference paper (peer-reviewed)abstract
- Steep-slope devices, such as tunnel field-effect transistors (TFETs), have recently gained interest due to their potential for low power operation at room temperature. The devices are based on inter-band tunneling which could limit the on-current since the charge carriers must tunnel through a barrier to traverse the device. The InAs/GaSb heterostructure forms a broken type II band alignment which enables inter-band tunneling without a barrier, allowing high on-currents. We have recently demonstrated high current density (Ion,reverse = 17.5 mA/µm) nanowire Esaki diodes and in this work we investigate the potential of InAs/GaSb heterostructure nanowires to operate as TFETs. We present device characterization of InAs 0.85 Sb 0.15 /GaSb nanowire TFETs, which exhibit record-high on-current levels.
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- Dey, Anil, et al.
(author)
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High-Current GaSb/InAs(Sb) Nanowire Tunnel Field-Effect Transistors
- 2013
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In: IEEE Electron Device Letters. - 0741-3106. ; 34:2, s. 211-213
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Journal article (peer-reviewed)abstract
- We present electrical characterization of GaSb/InAs(Sb) nanowire tunnel field-effect transistors. The broken band alignment of the GaSb/InAs(Sb) heterostructure is exploited to allow for interband tunneling without a barrier, leading to high ON-current levels. We report a maximum drive current of 310 μA/μm at Vds = 0.5 V. Devices with scaled gate oxides display transconductances up to gm = 250 mS/mm at Vds = 300 mV, which are normalized to the nanowire circumference at the axial heterojunction.
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| 9. |
- Dey, Anil, et al.
(author)
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High-Performance InAs Nanowire MOSFETs
- 2012
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In: IEEE Electron Device Letters. - 0741-3106. ; 33:6, s. 791-793
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Journal article (peer-reviewed)abstract
- In this letter, we present a 15-nm-diameter InAs nanowire MOSFET with excellent on and off characteristics. An n-i-n doping profile was used to reduce the source and drain resistances, and an Al2O3/HfO2 bilayer was introduced in the high-k process. The nanowires exhibit high drive currents, up to 1.25 A/mm, normalized to the nanowire circumference, and current densities up to 34 MA/cm2 (VD = 0.5 V). For a nominal LG = 100 nm, we observe an extrinsic transconductance (gm) of 1.23 S/mm and a subthreshold swing of 93 mV/decade at VD = 10 mV.
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- Ek, Martin, et al.
(author)
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Formation of the axial heterojunction in GaSb/InAs(Sb) nanowires with high crystal quality
- 2011
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In: Crystal Growth & Design. - : American Chemical Society (ACS). - 1528-7483 .- 1528-7505. ; 11:10, s. 4588-4593
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Journal article (peer-reviewed)abstract
- Switching of the group-III element in III-V nanowire heterostructures is difficult due to the high solubility of group-III atoms in the Au seed particle. In addition, switching from Sb to a different group-V element has not been achieved in binary materials, largely due to its high solubility in Au. In MOVPE growth the use of Sb precursors presents further complications due to reactor background contamination. In this paper we demonstrate growth of GaSb/InAs(Sb) nanowire heterostructures with potential applications in tunneling devices, and study the processes occurring during the transition from GaSb to InAs growth. We show how the heterostructure can be grown with a sharp transition by taking advantage of a growth stop, which occurs naturally as the Au seed particle is emptied of Ga and filled with In. The remaining Sb background in the reactor during the InAs growth results in a finite Sb incorporation into this segment. This has the advantage of suppressing stacking faults in the InAs(Sb) segment, making the entire heterostructure a single zincblende crystal.
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