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LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00002189naa a2200361 4500
001oai:DiVA.org:kth-143306
003SwePub
008140319s2013 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-1433062 URI
040 a (SwePub)kth
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a kon2 swepub-publicationtype
100a Fischer, Andreas C.u KTH,Mikro- och nanosystemteknik4 aut0 (Swepub:kth)u1pfkzjx
2451 0a 3D printing of silicon micro and nano structures by ion implantation, silicon deposition, and selective silicon etching
264 1c 2013
338 a print2 rdacarrier
500 a QC 20140320
520 a A method for additive layer-by-layer fabrication of arbitrarily shaped 3D silicon micro and nano structures is reported. The fabrication is based on alternating steps of chemical vapor deposition of silicon and local implantation of gallium ions by focused ion beam (FIB) writing. In a final step, the defined 3D structures are formed by etching the silicon in potassium hydroxide (KOH), in which the local ion implantation provides the etching selectivity. The proposed technology could change and greatly simplify the fabrication of many MEMS, NEMS, and silicon photonic devices without requiring a fully equipped semiconductor cleanroom. This layer-by-layer fabrication method is in principle also viable for the implementation of 3D structures in semiconductors other than silicon.
653 a 3D printing
653 a Focused ion beam
653 a Ion implantation
653 a Layered fabrication
653 a Microstructures
653 a Nanostructures
653 a Silicon
700a Niklaus, Franku KTH,Mikro- och nanosystemteknik4 aut0 (Swepub:kth)u1bcu8r2
700a Gylfason, Kristinn Björgvinu KTH,Mikro- och nanosystemteknik4 aut0 (Swepub:kth)u1v3y7u7
700a Stemme, Göranu KTH,Mikro- och nanosystemteknik4 aut0 (Swepub:kth)u1oyebfq
710a KTHb Mikro- och nanosystemteknik4 org
773t Technical Paper - Society of Manufacturing Engineers
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-143306

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