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Electrical properties of high-k LaLuO3 gate oxide for SOI MOSFETs

Gomeniuk, Y. Y. (author)
Gomeniuk, Y. V. (author)
Nazarov, A. N. (author)
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Hurley, P. K. (author)
Cherkaoui, K. (author)
Monaghan, S. (author)
Hellström, Per-Erik (author)
KTH
Gottlob, H. D. B. (author)
Schubert, J. (author)
Lopes, J. M. J. (author)
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 (creator_code:org_t)
2011
2011
English.
In: 6th International Workshop on Semiconductor-on-Insulator Materials and Devices. - 9783037851784 ; , s. 87-93
  • Conference paper (peer-reviewed)
Abstract Subject headings
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  • The paper presents the results of electrical characterization of MOS capacitors and SOI MOSFETs with novel high-? LaLuO3 dielectric as a gate oxide. The energy distribution of interface state density at LaLuO 3/Si interface is presented and typical maxima of 1.2×10 11 eV-1cm-2 was found at about 0.25 eV from the silicon valence band. The output and transfer characteristics of the n- and p-MOSFET (channel length and width were 1 μm and 50 μm, respectively) are presented. The front channel mobility appeared to be 126 cm2V -1s-1 and 70 cm2V-1s-1 for n- and p-MOSFET, respectively. The front channel threshold voltages as well as the density of states at the back interface are presented.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)

Keyword

Channel mobility
High-k oxide
Interface states density
LaLuO3
Lanthanum lutetium oxide
Molecular beam deposition MBD
MOSFET
SOI
Threshold voltage
Transconductance
High-k oxides
LaLuO<sub>3</sub>
MOS-FET
Characterization
Chemical modification
Electric properties
Gates (transistor)
Insulating materials
Lanthanum oxides
MOS capacitors
Semiconductor devices
MOSFET devices

Publication and Content Type

ref (subject category)
kon (subject category)

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