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Wafer Scale Graphene Transfer for Back End of the Line Device Integration

Smith, Anderson (author)
KTH,Integrerade komponenter och kretsar
Vaziri, Sam (author)
KTH,Integrerade komponenter och kretsar
Rodriguez, Saul (author)
KTH,Integrerade komponenter och kretsar
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Östling, Mikael (author)
KTH,Integrerade komponenter och kretsar
Lemme, M. C. (author)
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 (creator_code:org_t)
2014
2014
English.
In: INT CONF ULTI INTEGR. - 2330-5738. ; , s. 29-32
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • We report on a wafer scale fabrication of graphene based field effect transistors (GFETs) for use in future radio frequency (RF) and sensor applications. The process is also almost entirely CMOS compatible and uses a scalable graphene transfer method that can be incorporated in standard CMOS back end of the line (BEOL) process flows. Such a process can be used to integrate high speed GFET devices and graphene sensors with silicon CMOS circuits.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

Keyword

graphene
transistors
graphene transfer
wafer scale
GFET
more than Moore
Moore's Law

Publication and Content Type

ref (subject category)
art (subject category)

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Smith, Anderson
Vaziri, Sam
Rodriguez, Saul
Östling, Mikael
Lemme, M. C.
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ENGINEERING AND TECHNOLOGY
ENGINEERING AND ...
and Electrical Engin ...
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INT CONF ULTI IN ...
By the university
Royal Institute of Technology

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