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Effect of substrate roughness on the magnetic properties of thin fcc Co films

Steinmuller, S. J. (author)
Vaz, C. A. F. (author)
Ström, Valter (author)
KTH,Materialvetenskap,University of Cambridge, United Kingdom
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Moutafis, C. (author)
Tse, D. H. Y. (author)
Gürtler, C. M. (author)
Kläui, M. (author)
Bland, J. A. C. (author)
Cui, Z. (author)
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 (creator_code:org_t)
2007
2007
English.
In: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 76:5, s. 054429-
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • We present a study of the influence of substrate roughness on the magnetic properties of thin fcc Co films (7 and 17 nm thick) grown on Cu(001)/Si(001). A significant decrease in cubic anisotropy with increasing film roughness was observed with Brillouin light scattering and magneto-optical Kerr effect magnetometry. In addition, the rougher samples showed a substantial broadening of the spin wave peaks. Both effects were found to be more pronounced for the thinner Co layers. Our observations are discussed in the framework of a theoretical model which takes into account the morphology of the Co films as measured by atomic force microscopy. While roughness effects are usually discussed in the context of Néel's "orange-peel" model, we propose a qualitatively different effect in this work whereby the magnetization follows coherently the substrate morphology ("undulating" state) resulting in the absence of magnetic surface charges. This magnetic configuration gives rise to a reduction in the magnetic anisotropy of epitaxial thin films, which is in good qualitative agreement with the experimental observations.

Subject headings

NATURVETENSKAP  -- Fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

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