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Formation of nickel...
Formation of nickel germanides from Ni layers with thickness below 10 nm
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- Jablonka, Lukas (author)
- Uppsala universitet,Fasta tillståndets elektronik
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- Kubart, Tomas, 1977- (author)
- Uppsala universitet,Fasta tillståndets elektronik
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- Primetzhofer, Daniel (author)
- Uppsala universitet,Tillämpad kärnfysik
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- Abedin, Ahmad (author)
- KTH,Integrerade komponenter och kretsar,KTH Royal Inst Technol, Sch Informat & Commun Technol, SE-16440 Kista, Sweden.
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- Hellström, Per-Erik, 1970- (author)
- KTH,Skolan för informations- och kommunikationsteknik (ICT),KTH Royal Inst Technol, Sch Informat & Commun Technol, SE-16440 Kista, Sweden.
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- Östling, Mikael (author)
- KTH,Integrerade komponenter och kretsar,KTH Royal Inst Technol, Sch Informat & Commun Technol, SE-16440 Kista, Sweden.
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- Jordan-Sweet, Jean (author)
- IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA.
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- Lavoie, Christian (author)
- IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA.
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- Zhang, Shi-Li (author)
- Uppsala universitet,Fasta tillståndets elektronik
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- Zhang, Zhen, 1979- (author)
- Uppsala universitet,Fasta tillståndets elektronik
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(creator_code:org_t)
- A V S AMER INST PHYSICS, 2017
- 2017
- English.
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In: Journal of Vacuum Science & Technology B. - : A V S AMER INST PHYSICS. - 1071-1023 .- 1520-8567. ; 35:2
- Related links:
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https://doi.org/10.1...
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https://urn.kb.se/re...
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Abstract
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- The authors have studied the reaction between a Ge (100) substrate and thin layers of Ni ranging from 2 to 10 nm in thickness. The formation of metal-rich Ni5Ge3 was found to precede that of the monogermanide NiGe by means of real-time in situ x-ray diffraction during ramp-annealing and ex situ x-ray pole figure analyses for phase identification. The observed sequential growth of Ni5Ge3 and NiGe with such thin Ni layers is different from the previously reported simultaneous growth with thicker Ni layers. The phase transformation from Ni5Ge3 to NiGe was found to be nucleationcontrolled for Ni thicknesses < 5 nm, which is well supported by thermodynamic considerations. Specifically, the temperature for the NiGe formation increased with decreasing Ni (rather Ni5Ge3) thickness below 5 nm. In combination with sheet resistance measurement and microscopic surface inspection of samples annealed with a standard rapid thermal processing, the temperature range for achieving morphologically stable NiGe layers was identified for this standard annealing process. As expected, it was found to be strongly dependent on the initial Ni thickness.
Subject headings
- NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Publication and Content Type
- ref (subject category)
- art (subject category)
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- By the author/editor
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Jablonka, Lukas
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Kubart, Tomas, 1 ...
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Primetzhofer, Da ...
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Abedin, Ahmad
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Hellström, Per-E ...
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Östling, Mikael
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show more...
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Jordan-Sweet, Je ...
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Lavoie, Christia ...
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Zhang, Shi-Li
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Zhang, Zhen, 197 ...
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show less...
- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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and Materials Chemis ...
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
- Articles in the publication
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Journal of Vacuu ...
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Journal of Vacuu ...
- By the university
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Royal Institute of Technology
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Uppsala University