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Kinetics of residua...
Kinetics of residual doping in 4H-SiC epitaxial layers grown in vacuum
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- Kakanakova-Georgieva, Anelia, 1970- (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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- Yakimova, Rositsa (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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- Gueorguiev, G. K. (author)
- Departamento De Fisica Da Universidade, 3004-516 Coimbra, Portugal
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- Linnarsson, Margareta K. (author)
- KTH,Mikroelektronik och informationsteknik, IMIT,Solid State Electronics, Royal Institute of Technology, P.O. Box E229, S-164 40 Kista, Sweden
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- Syväjärvi, Mikael (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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- Janzén, Erik (author)
- Linköpings universitet,Tekniska högskolan,Halvledarmaterial
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(creator_code:org_t)
- 2002
- 2002
- English.
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In: Journal of Crystal Growth. - 0022-0248 .- 1873-5002. ; 240:04-mar, s. 501-507
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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https://urn.kb.se/re...
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Abstract
Subject headings
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- Investigation on residual Al, B, and N co-doping of 4H-SiC epitaxial layers is reported. The layers were produced by sublimation epitaxy in Ta growth cell environment at different growth temperatures and characterized by secondary ion mass spectrometry. The vapor interaction with Ta was considered through calculations of cohesive energies of several Si-, Al-, B-, and N-containing vapor molecules and also of diatomic Ta-X molecules. An analysis of kinetic mechanisms responsible for impurity incorporation is performed. Among residuals, B exhibits a stronger incorporation dependence on temperature and growth at lower temperatures can favor B decrease in the layers. Under the growth conditions in this study (Ta environment and presence of attendant Al and N), B incorporation is assisted by Si2C vapor molecule. Boron tends to occupy carbon sites at higher temperatures, i.e. higher growth rates.
Keyword
- doping
- impurities
- vapor phase epitaxy
- inorganic compounds
- semiconducting materials
- sublimation epitaxy
- ta-container
- crystals
- TECHNOLOGY
Publication and Content Type
- ref (subject category)
- art (subject category)
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