onr:"swepub:oai:DiVA.org:kth-21649"
Search: onr:"swepub:oai:DiVA.org:kth-21649" > High-performance ep...
- 1 of 1
- Previous record
- Next record
- To hitlist
High-performance epitaxial Na0.5K0.5NbO3 thin films by magnetron sputtering
-
- Blomqvist, Mats (author)
- KTH,Mikroelektronik och informationsteknik, IMIT,Department of Condensed Matter Physics, Royal Institute of Technology, Stockholm, Sweden
-
- Koh, Jung-Hyuk (author)
- KTH,Mikroelektronik och informationsteknik, IMIT,Department of Condensed Matter Physics, Royal Institute of Technology, Stockholm, Sweden
-
- Khartsev, Sergiy (author)
- KTH,Mikroelektronik och informationsteknik, IMIT,Department of Condensed Matter Physics, Royal Institute of Technology, Stockholm, Sweden
- show more...
- show less...
- (creator_code:org_t)
- AIP Publishing, 2002
- 2002
- English.
- In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 81:2, s. 337-339
- Journal article (peer-reviewed)
Abstract
Subject headings
Close
- Epitaxial Na0.5K0.5NbO3 (NKN) thin films have been grown on LaAlO3 substrates by rf magnetron sputtering of a stoichiometric, high-density, ceramic target. X-ray diffraction analysis showed c-axis oriented cube-on-cube growth. Micrometer size interdigital capacitor (IDC) structures were defined on the surface of the NKN film using photolithography. The electrical characterization at 1 MHz showed dissipation factor tan delta of 0.010, tunability 16.5% at 200 kV/cm and dielectric permittivity epsilon(r)=470. The frequency dispersion of epsilon(r) between 1 kHz and 1 MHz was 8.5% and the IDCs showed very good insulating properties with leakage current density on the order of 30 nA/cm(2) at 400 kV/cm. The polarization loop exhibits weak ferroelectric hysteresis with maximum polarization 23.5 muC/cm(2) at 600 kV/cm. These results are promising for tunable microwave devices based on rf sputtered NKN thin films.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
Keyword
- interdigital capacitors
- Functional materials
- Funktionella material
- Engineering Materials
Publication and Content Type
- ref (subject category)
- art (subject category)
Find in a library
- Applied Physics Letters (Search for host publication in LIBRIS)
To the university's database
- 1 of 1
- Previous record
- Next record
- To hitlist
Find more in SwePub
- By the author/editor
- Blomqvist, Mats
- Koh, Jung-Hyuk
- Khartsev, Sergiy
- Grishin, Alexand ...
- Andréasson, Joha ...
- Grishin, Alex
- About the subject
-
- ENGINEERING AND TECHNOLOGY
- ENGINEERING AND ...
- and Materials Engine ...
- and Other Materials ...
- Articles in the publication
- Applied Physics ...
- By the university
- Royal Institute of Technology
- Luleå University of Technology
Search outside SwePub
- Extend your search to:
- Google Book Search
- Google Scholar
Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.
- Copyright © LIBRIS - National Library Systems
- LIBRIS.kb.se
